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公开(公告)号:US20090060691A1
公开(公告)日:2009-03-05
申请号:US12199270
申请日:2008-08-27
申请人: Shinji WAKABAYASHI
发明人: Shinji WAKABAYASHI
IPC分类号: H01L21/67
CPC分类号: H01L21/67772
摘要: A substrate receiving apparatus is capable of reducing the size of a substrate processing system. The substrate receiving apparatus is connected to a vacuum processing apparatus. The vacuum processing apparatus performs processing on a substrate. A connecting portion of the substrate receiving apparatus is connected to a container. The container houses a holding member holding a plurality of the substrates. A communication control portion controls a communication between an internal space in the substrate receiving apparatus and the interior of the container, and isolates the internal space from the interior. A holding member transferring-in portion takes the holding member out of the container and transfers the holding member into the internal space. A pressure control portion changes the internal space between an atmospheric pressure and a vacuum by controlling the pressure in the internal space isolated from the interior of the container.
摘要翻译: 基板接收装置能够减小基板处理系统的尺寸。 基板接收装置连接到真空处理装置。 真空处理装置对基板进行处理。 基板接收装置的连接部分连接到容器。 容器容纳保持多个基板的保持构件。 通信控制部分控制基板接收装置的内部空间与容器的内部之间的通信,并将内部空间与内部隔离。 保持构件转移部将保持构件从容器中取出并将保持构件传送到内部空间。 压力控制部分通过控制与容器内部隔离的内部空间中的压力来改变大气压力和真空之间的内部空间。
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公开(公告)号:US20100236718A1
公开(公告)日:2010-09-23
申请号:US12723950
申请日:2010-03-15
申请人: Shinji WAKABAYASHI
发明人: Shinji WAKABAYASHI
CPC分类号: H01L21/67778 , H01J37/32743 , H01J37/32788 , H01L21/67745
摘要: In a substrate processing apparatus, a processing module includes a processing unit for performing a predetermined processing on a substrate accommodated in a processing chamber, and a transfer module includes a transfer chamber having a loading/unloading port for mounting thereon a carrier accommodating therein the substrate in a plural number and a transfer mechanism for transferring the substrates between the processing module and the carrier mounted on the loading/unloading port in the transfer chamber. Further, a substrate accommodation unit includes a substrate accommodation chamber communicating with the transfer chamber via a transfer opening and accommodating therein the substrates arranged vertically, a vertically movable gate provided at the transfer opening, the gate separating the substrate accommodation chamber from the transfer chamber and a gas supply unit for supplying a gas into the substrate accommodation chamber. The substrates processed by the processing unit are accommodated in the substrate accommodation chamber.
摘要翻译: 在基板处理装置中,处理模块包括用于对容纳在处理室中的基板进行预定处理的处理单元,并且转移模块包括具有装载/卸载端口的传送室,用于在其上安装容纳在其中的载体 多个传送机构和用于在处理模块和安装在传送室中的装载/卸载端口上的载体之间传送基板的传送机构。 此外,基板容纳单元包括:基板容纳室,其经由传送开口与传送室连通,并且容纳其中垂直布置的基板;设置在传送开口处的可垂直移动的栅极;将该基板容纳室与传送室分开的闸门;以及 气体供给单元,其用于将气体供给到基板容纳室。 由处理单元处理的基板容纳在基板容纳室中。
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公开(公告)号:US20090060697A1
公开(公告)日:2009-03-05
申请号:US12190139
申请日:2008-08-12
申请人: Shinji WAKABAYASHI
发明人: Shinji WAKABAYASHI
IPC分类号: B66B7/00
CPC分类号: H01L21/67766 , H01L21/67733 , H01L21/67769 , H01L21/67775 , Y10S414/14
摘要: A container changing system able to prevent deterioration in the working rate of substrate processing apparatuses and deterioration in the amount of production of semiconductor devices. A second mounting portion is arranged between a carrier of a container conveying unit and a first mounting portion of a substrate processing apparatus with respect to a lifting direction of a container. The second mounting portion is configured to freely advance and withdraw to/from a lifting path of the container. A container lifting unit is arranged between the carrier and the second mounting portion with respect to the lifting direction. In the container lifting unit, a base portion is configured to freely advance and withdraw to/from the lifting path, a second holder is provided below the base portion and can hold the container, and a second lifter is arranged between the base portion and the second holder and configured to lift up/down the second holder between the base portion and the first mounting portion when the second holder is located opposed to the first mounting portion.
摘要翻译: 一种容器改变系统,能够防止基板处理装置的加工速度的劣化和半导体装置的生产量的劣化。 第二安装部分相对于容器的提升方向布置在容器输送单元的托架和基板处理设备的第一安装部分之间。 第二安装部构造成能够自由地前进和离开容器的提升路径。 容器提升单元相对于提升方向布置在托架和第二安装部分之间。 在容器提升单元中,基部被配置为自由地前进和离开提升路径,第二保持器设置在基部下方并且可以容纳容器,并且第二提升器布置在基部和 第二保持器,并且构造成当第二保持器位于与第一安装部相对的位置时,在第二保持器的基部与第一安装部之间升降。
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公开(公告)号:US20090116938A1
公开(公告)日:2009-05-07
申请号:US12264393
申请日:2008-11-04
申请人: Shinji WAKABAYASHI
发明人: Shinji WAKABAYASHI
IPC分类号: F16K15/02 , H01L21/677
CPC分类号: F16K15/03 , F16K35/00 , H01L21/67126 , H01L21/67772 , Y10T137/7903
摘要: A check valve is installed in a line having a fluid path for preventing generation of a back flow in the fluid path. The check valve includes a cylindrical member in which a part of the fluid path is formed; a valve body installed in the cylindrical member and rotatable between a blocking position for blocking the fluid path and an opening position for opening the fluid path; a rotary shaft which is installed horizontally to divide the valve body into a large area and a small area and allows the valve body to rotate thereabout; and a locking member for locking the valve body in the blocking position. The small area has a larger mass than that of the large area.
摘要翻译: 止回阀安装在具有用于防止在流体路径中产生回流的流体路径的管线中。 止回阀包括其中形成有流体路径的一部分的圆柱形构件; 阀体,安装在所述圆筒形构件中,并且可在用于阻塞所述流体路径的阻挡位置和用于打开所述流体路径的打开位置之间旋转; 水平安装的旋转轴将阀体分成较大的区域和小的区域,并允许阀体在其周围旋转; 以及用于将阀体锁定在阻挡位置的锁定构件。 小区域的质量大于大面积。
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公开(公告)号:US20090060692A1
公开(公告)日:2009-03-05
申请号:US12200054
申请日:2008-08-28
申请人: Shinji WAKABAYASHI
发明人: Shinji WAKABAYASHI
IPC分类号: H01L21/67
CPC分类号: H01L21/67265 , H01L21/67766
摘要: A substrate positional misalignment detection system capable of detecting positional misalignment of a substrate without moving a detector in the case of using a bottom opening pod having a main body, a lid and a cassette holding wafers. A recursive reflection type sensor adapted to emit and receive light in an upward/downward direction is provided in a supporting unit adapted to support the lid and move up and down the lid together with the cassette. A recursive reflection plate adapted to reflect the emitted light is provided on the ceiling portion of the main body. A light transmitting window is provided in the lid. The recursive reflection type sensor, the light transmitting window, and the recursive reflection plate are aligned linearly in the upward/downward direction. The light emitted by the recursive reflection type sensor is not blocked by the substrate held in a predetermined storage position by the cassette.
摘要翻译: 在使用具有主体,盖和盒保持晶片的底部开口盒的情况下,能够检测基板的位置偏移而不移动检测器的基板位置偏移检测系统。 适于在向上/向下方向发射和接收光的递归反射型传感器设置在适于支撑盖并与盒一起上下移动盖的支撑单元中。 适于反射发射光的递归反射板设置在主体的天花板部分上。 在盖中设置透光窗。 循环反射型传感器,透光窗和递归反射板在向上/向下方向线性对齐。 由递归反射型传感器发射的光不被由盒子保持在预定存储位置的基板阻挡。
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