公开(公告)号：US4525276A

公开(公告)日：1985-06-25

申请号：US210545

申请日：1980-11-26

申请人： Shozo Toda ,  Kenji Yasuda ,  Shozo Kokubo

发明人： Shozo Toda ,  Kenji Yasuda ,  Shozo Kokubo

IPC分类号： B01D17/02 ,  B01D31/00

CPC分类号： B01D17/0214

摘要： The inventive liquid separator of laboratory use can overcome the problems in the conventional separatory funnels used for liquid-liquid phase separation. The inventive apparatus comprises (a) a first bottle-like vessel with a mouth, (b) a second bottle-like vessel with a mouth connected with the first vessel at the mouths with air-tightness but disconnectable therefrom, (c) a porous membrane partitioning the first and the second vessels and made, preferably, of a sintered body of a water-repellent plastic resin such as a fluorocarbon polymer, and (d) an air-passage tubing opening at the ends in the first and the second vessels. When a two-phase mixture of an aqueous liquid and an organic liquid is taken in the first vessel positioned above the second vessel, the organic liquid can pass through the porous membrane to be transferred into the second vessel but the aqueous liquid is retained in the first vessel by virtue of the water-repellency of the fluorocarbon polymer. The air-passage tubing serves as an air escape from the second vessel to the first so as not to disturb the down-flow of the liquid through the porous membrane.

摘要翻译： 本发明的实验室用液体分离器可以克服用于液 - 液相分离的常规分离漏斗中的问题。 本发明的装置包括（a）具有口部的第一瓶状容器，（b）第二瓶状容器，其口部具有口气连接的第一容器，气口具有气密性，但可与其断开;（c）多孔 膜分隔第一和第二容器，并且优选地由诸如氟碳聚合物的防水塑料树脂的烧结体制成，以及（d）在第一和第二容器的端部处开口的空气通道管 。 当在位于第二容器上方的第一容器中取出水性液体和有机液体的两相混合物时，有机液体可以通过多孔膜以转移到第二容器中，但水性液体保留在 第一容器借助氟碳聚合物的拒水性。 空气通道管用作从第二容器到第一容器的空气逸出，以便不干扰通过多孔膜的液体的下流。

公开(公告)号：US4277525A

公开(公告)日：1981-07-07

申请号：US133092

申请日：1980-03-24

申请人： Muneo Nakayama ,  Toshihiro Nishimura ,  Hisashi Nakane ,  Shozo Toda ,  Yoshio Hotta ,  Mitsuaki Minato

发明人： Muneo Nakayama ,  Toshihiro Nishimura ,  Hisashi Nakane ,  Shozo Toda ,  Yoshio Hotta ,  Mitsuaki Minato

IPC分类号： C08G77/00 ,  C08G77/02 ,  C08G77/06 ,  C09D183/00 ,  C09D183/02 ,  C09D183/04 ,  C09D183/14 ,  B05D3/02

CPC分类号： C09D183/14 ,  C09D183/02 ,  C09D183/04

摘要： Liquid compositions suitable for providing silica-based coating films on to various substrate surfaces are prepared by the reaction of an alkoxy-containing silane, a lower carboxylic acid and an alcohol in the presence of a reaction accelerator which is an organic acid different from the above mentioned lower carboxylic acid. The reaction proceeds very smoothly even in the absence of any halogen-containing compounds, and the resultant liquid coating compositions are free from the problem of corrosion due to the presence of a halogen-containing ingredient.

摘要翻译： 适用于在各种基材表面上提供二氧化硅基涂膜的液体组合物是通过含有烷氧基的硅烷，低级羧酸和醇在与上述不同的有机酸的反应促进剂存在下反应来制备的 提到的低级羧酸。 即使不存在任何含卤素化合物，反应也非常顺利，所得到的液体涂料组合物由于含卤素成分的存在而没有腐蚀的问题。

公开(公告)号：US4904571A

公开(公告)日：1990-02-27

申请号：US219638

申请日：1988-07-15

申请人： Tsuyoshi Miyashita ,  Shigeru Ohtawa ,  Hiroyuki Tohda ,  Shozo Toda ,  Hisashi Nakane

发明人： Tsuyoshi Miyashita ,  Shigeru Ohtawa ,  Hiroyuki Tohda ,  Shozo Toda ,  Hisashi Nakane

IPC分类号： G03C11/00 ,  G03F7/42 ,  H05K3/00

CPC分类号： G03F7/425 ,  H05K3/0073

摘要： A remover solution for photoresist comprising (a) a solvent which is typically water, (b) an inorganic or organic alkaline compound such as sodium and potassium hydroxides, and (c) a borohydride compound such as sodium and lithium borohydrides and organic amine borane compounds. When used for removing patterned photoresist layer in the manufacturing process of, for example, electronic circuit board substrates. The method gives quite satisfactory results without discoloration or denaturation of the copper surface and solder surface, consequently leading to the production of high-quality products.

公开(公告)号：US4694040A

公开(公告)日：1987-09-15

申请号：US902029

申请日：1986-08-25

申请人： Akira Hashimoto ,  Toshihiro Nishimura ,  Muneo Nakayama ,  Hisashi Nakane ,  Shozo Toda

发明人： Akira Hashimoto ,  Toshihiro Nishimura ,  Muneo Nakayama ,  Hisashi Nakane ,  Shozo Toda

IPC分类号： C08G77/00 ,  C08G77/06 ,  C09D183/04 ,  C09D183/14 ,  C08K5/05

CPC分类号： C09D183/14

摘要： The invention provides a novel means for providing a highly heat-resistant and corrosion-resistant coating film on the surface of a substrate such as a semiconductor silicon wafer or glass plate by coating the surface with a liquid coating composition which is a solution of an oligomeric organopolysiloxane as a partial dehydration-condensation product of a monohydrocarbylsilane triol RSi(OH).sub.3, optionally, with admixture of a dihydrocarbylsilane diol R.sub.2 Si(OH).sub.2, R being a monovalent hydrocarbon group, e.g. methyl or phenyl, in an organic solvent followed by baking of the coated substrate to convert the coating layer into a cured resin film.

摘要翻译： 本发明提供了一种用于通过用液体涂料组合物涂覆表面而在诸如半导体硅晶片或玻璃板的基材的表面上提供高耐热和耐腐蚀的涂膜的新颖方法，该液体涂料组合物是低聚物 作为单烃基硅烷三醇RSi（OH）3的部分脱水缩合产物的有机聚硅氧烷，任选地与二烃基硅烷二醇R2Si（OH）2的混合物，R是一价烃基，例如 甲基或苯基，然后烘烤涂布的基材，将涂层转化为固化的树脂膜。

公开(公告)号：US4245154A

公开(公告)日：1981-01-13

申请号：US919856

申请日：1978-06-28

申请人： Akira Uehara ,  Hiroyuki Kiyota ,  Hisashi Nakane ,  Shozo Toda

发明人： Akira Uehara ,  Hiroyuki Kiyota ,  Hisashi Nakane ,  Shozo Toda

IPC分类号： H01L21/302 ,  H01J37/32 ,  H01L21/3065 ,  G02B5/14

CPC分类号： H01J37/32935

摘要： An improved apparatus for plasma treatment of silicon semiconductor wafers is proposed in which the end point of the plasma etching or ashing can be readily detected by monitoring with an optical fiberscope penetrating the wall of the plasma reaction chamber with one terminal located inside the plasma reaction chamber with a condenser lens attached thereto and the other terminal located outside the plasma reaction chamber at a distanced position free from the influence of the high frequency electric field inherent to plasma generation which otherwise interferes with the photoelectric recording by the photocell connected to the outer terminal of the optical fiberscope.

摘要翻译： 提出了一种用于硅半导体晶片的等离子体处理的改进装置，其中等离子体蚀刻或灰化的终点可以通过利用位于等离子体反应室内的一个端子穿透等离子体反应室的壁的光纤穿透镜进行监测来容易地检测 其上安装有聚光透镜，而另一个端子位于等离子体反应室外部的距离位置，不受等离子体产生固有的高频电场的影响，否则会干扰连接到外部端子的光电池的光电记录 光纤镜。