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公开(公告)号：US08795932B2
公开(公告)日：2014-08-05
申请号：US13531479
申请日：2012-06-22
申请人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang , Hung-Hsin Chen
发明人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang , Hung-Hsin Chen
CPC分类号： G03F7/203 , G03F1/00 , G03F7/0007
摘要： A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.
摘要翻译： 一种制造偏光滤色器的方法，其中提供透明基底并涂覆有光致抗蚀剂层。 然后可以制备波形掩模，并且可以将周期性波形表面放置成与光致抗蚀剂层接触，用初始曝光工艺处理光致抗蚀剂层。 可以向波形掩模施加外力，并且透明基板或波形掩模旋转预定的程度。 可以用二次曝光工艺处理光致抗蚀剂层，其中显影光致抗蚀剂层以获得光致抗蚀剂图案层。 金属层可以用光致抗蚀剂图案层涂覆在透明基板上。 然后可以去除光致抗蚀剂图案层和光致抗蚀剂图案层上的金属层的部分，使得剩余的金属层形成周期性孔基底。
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公开(公告)号：US20130244145A1
公开(公告)日：2013-09-19
申请号：US13531479
申请日：2012-06-22
申请人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang , Hung-Hsin Chen
发明人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang , Hung-Hsin Chen
CPC分类号： G03F7/203 , G03F1/00 , G03F7/0007
摘要： A method of fabricating a polarized color filter wherein a transparent substrate is provided and coated with a photoresist layer. A wave-shaped mask may then be prepared and a periodic wave-shaped surface may be placed in contact with the photoresist layer, treating the photoresist layer with a primary exposure process. An external force may be applied to the wave-shaped mask, and the transparent substrate or wave-shaped mask by be rotated by a predetermined degree. The photoresist layer may be treated with a secondary exposure process, wherein the photoresist layer is developed in order to obtain a photoresist pattern layer. A metal layer may be coated on the transparent substrate with the photoresist pattern layer. The photoresist pattern layer and the portion of the metal layer on the photoresist pattern layer may then be removed such that the remaining metal layer forms a periodic hole substrate.
摘要翻译： 一种制造偏光滤色器的方法，其中提供透明基底并涂覆有光致抗蚀剂层。 然后可以制备波形掩模，并且可以将周期性波形表面放置成与光致抗蚀剂层接触，用初始曝光工艺处理光致抗蚀剂层。 可以向波形掩模施加外力，并且透明基板或波形掩模旋转预定的程度。 可以用二次曝光工艺处理光致抗蚀剂层，其中显影光致抗蚀剂层以获得光致抗蚀剂图案层。 金属层可以用光致抗蚀剂图案层涂覆在透明基板上。 然后可以去除光致抗蚀剂图案层和光致抗蚀剂图案层上的金属层的部分，使得剩余的金属层形成周期性孔基底。
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公开(公告)号：US20130065161A1
公开(公告)日：2013-03-14
申请号：US13422921
申请日：2012-03-16
申请人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
发明人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
IPC分类号： G03F1/38
摘要： A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
摘要翻译： 公开了一种用于制造纳米级结构的波形掩模。 波形掩模包括具有上表面和下表面的弹性透明基底和设置在弹性体透明基底的上表面上的可透光薄膜层。 弹性体透明基板的上表面和透光薄膜层为周期波形，弹性透明基板的下表面为板状。
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4.发明授权Method of fabricating wave-shaped mask for photolithography and exposure method of fabricating nano-scaled structure using the wave-shaped mask 有权用于光刻的波形掩模的制造方法以及使用波形掩模制造纳米级结构的曝光方法公开(公告)号：US08748061B2
公开(公告)日：2014-06-10
申请号：US13424119
申请日：2012-03-19
申请人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
发明人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
IPC分类号： G03F1/00
摘要： A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.
摘要翻译： 公开了制造波形掩模的方法。 制造波形掩模的方法包括以下步骤：提供包括上表面和下表面的弹性体透明基底，向弹性体透明基底施加稳定的力，以使弹性体透明基底变形，形成可透光的薄膜层 在弹性体透明基材的上表面上，并且去除施加到弹性体透明基材上的力，由此弹性体透明基材的上表面和可透光薄膜层是周期波形， 弹性体透明基材为板状。
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5.发明申请公开(公告)号：US20130065162A1
公开(公告)日：2013-03-14
申请号：US13424119
申请日：2012-03-19
申请人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
发明人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
摘要： A method of fabricating wave-shaped mask is disclosed. The method of fabricating wave-shaped mask comprises the steps of providing an elastomeric transparent substrate comprising an upper surface and a lower surface, applying a stable force to the elastomeric transparent substrate for deforming the elastomeric transparent substrate, forming a light-penetrable thin film layer on the upper surface of the elastomeric transparent substrate, and removing the force applying to the elastomeric transparent substrate, whereby the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape and the lower surface of the elastomeric transparent substrate is in a plate shape.
摘要翻译： 公开了制造波形掩模的方法。 制造波形掩模的方法包括以下步骤：提供包括上表面和下表面的弹性体透明基底，向弹性体透明基底施加稳定的力，以使弹性体透明基底变形，形成可透光的薄膜层 在弹性体透明基材的上表面上，并且去除施加到弹性体透明基材上的力，由此弹性体透明基材的上表面和可透光薄膜层是周期波形， 弹性体透明基材为板状。
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公开(公告)号：US08795928B2
公开(公告)日：2014-08-05
申请号：US13422921
申请日：2012-03-16
申请人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
发明人： Si-Chen Lee , Fang-Tzu Chuang , Yu-Wei Jiang
摘要： A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape.
摘要翻译： 公开了一种用于制造纳米级结构的波形掩模。 波形掩模包括具有上表面和下表面的弹性透明基底和设置在弹性体透明基底的上表面上的可透光薄膜层。 弹性体透明基板的上表面和透光薄膜层为周期波形，弹性透明基板的下表面为板状。
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