公开(公告)号：US06534221B2

公开(公告)日：2003-03-18

申请号：US09277497

申请日：1999-03-26

申请人： Sing H. Lee ,  Michael S. Jin ,  Miles L. Scott

发明人： Sing H. Lee ,  Michael S. Jin ,  Miles L. Scott

IPC分类号： G03F900

CPC分类号： G03F7/0005 ,  G03F1/50 ,  G03F7/001

摘要： A method for fabricating a mask for patterning a radiation sensitive layer in a lithographic printer is disclosed. An attenuating (absorptive or reflective) layer is coated over a substantially transparent base substrate such that after processing a two-dimensional spatially varying attenuating pattern is created with a continuously or discretely varying transmission or reflection function. In accordance with the present invention the two-dimensional attenuating pattern is formed by e-beam patterning of radiation sensitive layer to create a three-dimensional surface relief pattern. This pattern is transferred to the attenuating layer by an anisotropic etch, typically a directional reactive plasma etch. The attenuation of this radiation absorbing or reflecting layer varies with layer thickness. In one embodiment of this invention the attenuation of the mask would vary spatially in a continuous manner. In a second embodiment the attenuation of the mask (either reflective or absorptive) would vary spatially in discrete steps. One application of the mask created by this invention would be used to replicate a three-dimensional surface relief onto a second substrate by lithographic means. The replicated surface relief pattern could be used to store information, act as a mold for the formation of complex micro parts and to control etching of complex surfaces in micro optics, microelectronics and MEMS devices. The mask can be used as a phase shift mask to print high resolution profiles for the fabrication of microelectronics or to store and preserve images.

摘要翻译： 公开了一种制造用于图案化平版印刷机中的辐射敏感层的掩模的方法。 衰减（吸收或反射）层涂覆在基本透明的基底基底上，使得在处理之后，以连续或离散变化的透射或反射功能产生二维空间变化的衰减图案。 根据本发明，通过辐射敏感层的电子束图案形成二维衰减图案以产生三维表面浮雕图案。 该图案通过各向异性蚀刻（通常为定向反应等离子体蚀刻）转移到衰减层。 该辐射吸收或反射层的衰减随层厚度而变化。 在本发明的一个实施例中，掩模的衰减将以连续的方式在空间上变化。 在第二实施例中，掩模（反射或吸收）的衰减将在离散步骤中在空间上变化。 通过本发明创建的掩模的一个应用将用于通过光刻装置将三维表面浮雕复制到第二基板上。 复制的表面浮雕图案可用于存储信息，用作形成复杂微零件的模具，并控制微光学，微电子和MEMS器件中复杂表面的蚀刻。 该掩模可用作相移掩模以打印用于制造微电子学的高分辨率轮廓或用于存储和保存图像。

公开(公告)号：US06524755B2

公开(公告)日：2003-02-25

申请号：US09804590

申请日：2001-03-12

申请人： Michael S. Jin ,  Sing H. Lee ,  James A. Reynolds

发明人： Michael S. Jin ,  Sing H. Lee ,  James A. Reynolds

IPC分类号： G03F900

CPC分类号： G03F1/32 ,  G03F1/30 ,  G03F1/36 ,  G03F1/38 ,  G03F1/80 ,  Y10T428/30

摘要： Multilayer film stacks and gray scale processing methods are employed for fabricating phase-shifting masks (PSMs) utilized in lithography. Desired optical transmission and phase-shifting functions of the mask are achieved by controlling the optical properties and thickness of constituent film layers. The mask can be tuned for optimal performance at various wavelengths to an extent beyond that obtainable using a single layer film to control both attenuation and phase shifting of incident light. The processing methods exploit multi-level electron beam or optical beam lithography techniques, and the etch selectivity afforded by selection of appropriate materials for the film stack, to obtain improved yields and reduced processing costs for fabrication of PSMs. In particular, diamond-like carbon (DLC) materials formed by ion beam deposition and having a stress of 1 GPa or less are utilized as etch stop layers.

公开(公告)号：US07184098B2

公开(公告)日：2007-02-27

申请号：US10782045

申请日：2004-02-19

申请人： Charles D. Pencil ,  Michael S. Jin

发明人： Charles D. Pencil ,  Michael S. Jin

IPC分类号： H04N5/21 ,  H04N5/268

CPC分类号： G09G3/20 ,  G09G3/3685 ,  G09G2310/027 ,  G09G2310/0275 ,  G09G2310/0297 ,  G09G2320/0233 ,  G09G2352/00

摘要： A system and method for reducing periodic intensity variation in a video image includes applying input signals representing video image data to multiple circuit components by sequentially shifting the input signals through the circuit components to produce output signals that match corresponding input signals. Matching the output signals to the input signals overcomes the effect of inherent differences in characteristics of analog circuit components. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or the meaning of the claims.

摘要翻译： 用于减少视频图像中的周期性强度变化的系统和方法包括通过将输入信号顺序地移动通过电路部件来产生表示视频图像数据的多个电路组件的输入信号，以产生匹配相应输入信号的输出信号。 将输出信号与输入信号进行匹配克服了模拟电路组件特性固有差异的影响。 要强调的是，该摘要被提供以符合要求摘要的规则，这将允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。