公开(公告)号：US06524755B2

公开(公告)日：2003-02-25

申请号：US09804590

申请日：2001-03-12

申请人： Michael S. Jin ,  Sing H. Lee ,  James A. Reynolds

发明人： Michael S. Jin ,  Sing H. Lee ,  James A. Reynolds

IPC分类号： G03F900

CPC分类号： G03F1/32 ,  G03F1/30 ,  G03F1/36 ,  G03F1/38 ,  G03F1/80 ,  Y10T428/30

摘要： Multilayer film stacks and gray scale processing methods are employed for fabricating phase-shifting masks (PSMs) utilized in lithography. Desired optical transmission and phase-shifting functions of the mask are achieved by controlling the optical properties and thickness of constituent film layers. The mask can be tuned for optimal performance at various wavelengths to an extent beyond that obtainable using a single layer film to control both attenuation and phase shifting of incident light. The processing methods exploit multi-level electron beam or optical beam lithography techniques, and the etch selectivity afforded by selection of appropriate materials for the film stack, to obtain improved yields and reduced processing costs for fabrication of PSMs. In particular, diamond-like carbon (DLC) materials formed by ion beam deposition and having a stress of 1 GPa or less are utilized as etch stop layers.

公开(公告)号：US06534221B2

公开(公告)日：2003-03-18

申请号：US09277497

申请日：1999-03-26

申请人： Sing H. Lee ,  Michael S. Jin ,  Miles L. Scott

发明人： Sing H. Lee ,  Michael S. Jin ,  Miles L. Scott

IPC分类号： G03F900

CPC分类号： G03F7/0005 ,  G03F1/50 ,  G03F7/001

摘要： A method for fabricating a mask for patterning a radiation sensitive layer in a lithographic printer is disclosed. An attenuating (absorptive or reflective) layer is coated over a substantially transparent base substrate such that after processing a two-dimensional spatially varying attenuating pattern is created with a continuously or discretely varying transmission or reflection function. In accordance with the present invention the two-dimensional attenuating pattern is formed by e-beam patterning of radiation sensitive layer to create a three-dimensional surface relief pattern. This pattern is transferred to the attenuating layer by an anisotropic etch, typically a directional reactive plasma etch. The attenuation of this radiation absorbing or reflecting layer varies with layer thickness. In one embodiment of this invention the attenuation of the mask would vary spatially in a continuous manner. In a second embodiment the attenuation of the mask (either reflective or absorptive) would vary spatially in discrete steps. One application of the mask created by this invention would be used to replicate a three-dimensional surface relief onto a second substrate by lithographic means. The replicated surface relief pattern could be used to store information, act as a mold for the formation of complex micro parts and to control etching of complex surfaces in micro optics, microelectronics and MEMS devices. The mask can be used as a phase shift mask to print high resolution profiles for the fabrication of microelectronics or to store and preserve images.

摘要翻译： 公开了一种制造用于图案化平版印刷机中的辐射敏感层的掩模的方法。 衰减（吸收或反射）层涂覆在基本透明的基底基底上，使得在处理之后，以连续或离散变化的透射或反射功能产生二维空间变化的衰减图案。 根据本发明，通过辐射敏感层的电子束图案形成二维衰减图案以产生三维表面浮雕图案。 该图案通过各向异性蚀刻（通常为定向反应等离子体蚀刻）转移到衰减层。 该辐射吸收或反射层的衰减随层厚度而变化。 在本发明的一个实施例中，掩模的衰减将以连续的方式在空间上变化。 在第二实施例中，掩模（反射或吸收）的衰减将在离散步骤中在空间上变化。 通过本发明创建的掩模的一个应用将用于通过光刻装置将三维表面浮雕复制到第二基板上。 复制的表面浮雕图案可用于存储信息，用作形成复杂微零件的模具，并控制微光学，微电子和MEMS器件中复杂表面的蚀刻。 该掩模可用作相移掩模以打印用于制造微电子学的高分辨率轮廓或用于存储和保存图像。

公开(公告)号：US6107000A

公开(公告)日：2000-08-22

申请号：US766139

申请日：1996-12-17

申请人： Sing H. Lee ,  Walter Daschner

发明人： Sing H. Lee ,  Walter Daschner

IPC分类号： G03F1/54 ,  G03C5/00

CPC分类号： G03F1/54

摘要： A method for producing micro-elements, such as micro-lenses and computer generated holograms using a gray scale mask formed of a high energy beam sensitive glass plate which may be darkened by direct writing of an electron beam to record a gray scale pattern corresponding to a predetermined depth level to be etched into a photoresist coated substrate. The high energy beam sensitive glass may have a base glass composition which is provided with an ion exchanged surface layer containing a high concentration of silver ions. High energy beam sensitive glass plates are exposed to various electron beam charge densities at relatively low acceleration voltages and over relatively small grid spacings to provide a wide range of gray levels. Photoresist coated substrates are exposed through the gray scale mask and subsequently etched by chemically assisted ion beam milling to produce high efficiency micro-lenses and similar micro-elements having high surface resolution.

摘要翻译： 一种使用由高能量敏感玻璃板形成的灰度掩模的微型透镜和计算机产生的全息图的微量元件的制造方法，其可以通过直接写入电子束而变暗，以记录对应于 要蚀刻到光刻胶涂覆的基底中的预定深度水平。 高能量敏感玻璃可以具有基底玻璃组合物，其具有含有高浓度银离子的离子交换表面层。 高能量敏感玻璃板在相对较低的加速电压和相对小的栅格间距下暴露于各种电子束电荷密度，以提供宽范围的灰度级。 光刻胶涂覆的基材通过灰度掩模曝光，随后通过化学辅助离子束研磨蚀刻，以产生具有高表面分辨率的高效微透镜和类似的微元件。

公开(公告)号：US5242707A

公开(公告)日：1993-09-07

申请号：US632033

申请日：1990-12-21

申请人： Sadik C. Esener ,  Sing H. Lee ,  Subramania Krishnakumar ,  Volkan H. Ozguz ,  Chi Fan

发明人： Sadik C. Esener ,  Sing H. Lee ,  Subramania Krishnakumar ,  Volkan H. Ozguz ,  Chi Fan

IPC分类号： C23C14/08 ,  C23C14/50 ,  G02F1/055 ,  H01L21/84

CPC分类号： C23C14/505 ,  C23C14/088 ,  G02F1/0551 ,  H01L21/84

摘要： A system and method are disclosed for producing electro-optic components with transparent, ferroelectric PLZT (perovskite) film characteristics, without lead diffusion. In particular, the fabrication of PLZT-on-sapphire electro-optic components for devices such as spatial light modulators, integrated infrared detectors, and optoelectronic integrated circuits is disclosed, permitting integration of such devices with semiconductor devices having the same substrate, such as silicon-on-sapphire circuits. The system comprises a PLZT film deposition apparatus, a silicon dioxide deposition apparatus, an annealing apparatus, and an optional plasma etching apparatus. During film deposition, material from a PLZT target (source) of suitable (9/65/35) composition is deposited on the substrate and is epitaxially grown on the R-plane (1102) of the substrate, forming a non-ferroelectric, pyrochloric film. The substrate and film are then placed in a silicon dioxide (SiO.sub.2) deposition chamber where SiO.sub.2 is deposited as an insulating layer covering (capping) the film. The substrate, with film and SiO.sub.2 layer, is then placed in an annealing apparatus, at a selected temperature above 550.degree. C. for a selected period of time, to transform the non-ferroelectric, pyrochloric film into a ferroelectric, perovskite film of (9/65/35) composition. The SiO.sub.2 layer may then be removed by conventional etching.

摘要翻译： 公开了一种用于生产具有透明的铁电PLZT（钙钛矿）膜特性的电光元件而不引线扩散的系统和方法。 特别地，公开了用于诸如空间光调制器，集成红外检测器和光电集成电路的器件的PLZT-蓝宝石电光元件的制造，允许这样的器件与具有相同衬底的半导体器件（诸如硅 - 蓝宝石电路。 该系统包括PLZT膜沉积设备，二氧化硅沉积设备，退火设备和可选的等离子体蚀刻设备。 在膜沉积期间，将来自适合（9/65/35）组成的PLZT靶（源）的材料沉积在衬底上并在衬底的R平面（1102）上外延生长，形成非铁电，高氯酸 电影。 然后将衬底和膜放置在二氧化硅（SiO 2）沉积室中，其中SiO 2沉积为覆盖（封盖）膜的绝缘层。 然后将具有膜和SiO 2层的衬底在选定的温度高于550℃的退火设备中放置一段选定的时间，以将非铁电的高氯酸盐膜转变成铁电体的钙钛矿膜（ 9/65/35）组成。 然后可以通过常规蚀刻去除SiO 2层。

公开(公告)号：US4035062A

公开(公告)日：1977-07-12

申请号：US645500

申请日：1975-12-30

申请人： James C. Administrator of the National Aeronautics and Space Administration, with respect to an invention of Fletcher ,  Sing H. Lee ,  Arnold R. Shulman

发明人： James C. Administrator of the National Aeronautics and Space Administration, with respect to an invention of Fletcher ,  Sing H. Lee ,  Arnold R. Shulman

IPC分类号： G02B17/00 ,  G03B21/00 ,  G03B27/72 ,  G02B5/08 ,  G02B5/18

CPC分类号： G03B27/727 ,  G02B17/004 ,  G03B21/00

摘要： The contrast produced from a photographic transparency is controlled by placing the transparency between a pair of partially reflecting mirrors forming walls of an optical cavity. Mirrors are used to trap a collimated laser beam illuminating the transparency so that at least a portion of the beam energy is passed through the transparency plural times. The distance that the light beam travels between the mirrors is controlled as a function of the wavelength of the beam energy to control the phase of light interference in the beam passing through the transparency, thereby controlling the intensity of the beam derived from the mirror downstream of the transparency. The contrast of the transparency is increased or decreased, depending upon whether constructive or destructive interference for the beam energy is provided by the mirror spacing. For a negative input transparency a low to high contrast projected negative or positive image can be obtained.

摘要翻译： 通过将透明度放置在形成光腔的壁的一对部分反射镜之间来控制由照相透明度产生的对比度。 反射镜用于捕获照射透明度的准直激光束，使得至少一部分光束能量多次穿过透明物。 光束在反射镜之间行进的距离被控制为光束能量的波长的函数，以控制通过透明度的光束中的光干涉的相位，从而控制从镜子的下游的光束的强度 透明度。 透明度的对比度增加或减少，这取决于是否通过反射镜间距提供对束能的建设性或相消干涉。 对于负输入透明度，可以获得低到高对比度投影的负像素或正像。