公开(公告)号：US6064807A

公开(公告)日：2000-05-16

申请号：US653121

申请日：1996-05-24

申请人： Soichiro Arai ,  Junichi Kai ,  Hiroshi Yasuda ,  Shunsuke Hueki ,  Yoshihisa Oae

发明人： Soichiro Arai ,  Junichi Kai ,  Hiroshi Yasuda ,  Shunsuke Hueki ,  Yoshihisa Oae

IPC分类号： G21K5/04 ,  G06F17/10 ,  G21C5/00 ,  H01L21/027

CPC分类号： H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/20221

摘要： The present invention relates to an exposure method of a multi-beam type in which a stage mounting a sample to be exposed is continuously moved in a first direction, and charged-particle beams are controlled so as to form a desired beam shape as a whole, and in which a pattern is formed on the sample by deflecting the charged-particle beams by a main deflector and a sub deflector. Patterns to be drawn are divided into pattern data on a cell stripe basis which corresponds to an area which can be exposed when the sub deflector scans the charged-particle beams one time. The pattern data on the cell stripe basis is stored into a memory. Then, position data indicative of cell stripes is stored, in an exposure sequence, together with address information concerning the memory in which the pattern data is stored. The deflection amount data relating to the main deflector and the sub deflector is calculated from the position data. Patterns are drawn on the wafer by using the pattern data and the deflection amount data.

摘要翻译： 本发明涉及一种多光束类型的曝光方法，其中安装要暴露的样品的载物台在第一方向上连续移动，并且带电粒子束被整体地形成期望的波束形状 ，并且其中通过由主偏转器和副偏转器偏转带电粒子束而在样品上形成图案。 要绘制的图案被划分为细胞条纹基础上的图形数据，其对应于当次偏转器一次扫描带电粒子束时可以暴露的区域。 基于单元条带的图案数据被存储到存储器中。 然后，指示单元条纹的位置数据与曝光图案数据的存储器的地址信息一起被存储在曝光序列中。 根据位置数据计算与主偏转器和副偏转器有关的偏转量数据。 通过使用图案数据和偏转量数据在晶片上绘制图案。