Inverted metamorphic multijunction solar cell

    公开(公告)号:US11011660B1

    公开(公告)日:2021-05-18

    申请号:US16037378

    申请日:2018-07-17

    摘要: A method of manufacturing an inverted metamorphic multijunction solar cell by providing a growth semiconductor substrate with a top surface having a doping in the range of 1×1018 to 1×1020 charge carriers/cm3; depositing a window layer for a top (light facing) subcell subsequently to be formed directly on the top surface of the growth substrate; depositing a sequence of layers of semiconductor material forming a solar cell directly on the window layer; providing a surrogate substrate on the top surface of the sequence of layers of semiconductor material, and removing a portion of the semiconductor substrate so that only the high doped surface portion of the substrate, having a thickness in the range of 0.5 μm to 10 μm, remains.

    INVERTED METAMORPHIC MULTIJUNCTION SOLAR CELL

    公开(公告)号:US20220238747A1

    公开(公告)日:2022-07-28

    申请号:US17161351

    申请日:2021-01-28

    摘要: A method of manufacturing a solar cell comprising: providing a growth substrate depositing on the growth substrate an epitaxial sequence of layers of semiconductor material forming at least a first and second solar subcells depositing a semiconductor contact layer on top of the second solar subcell depositing a reflective metal layer over said semiconductor contact layer such that the reflectivity of the reflective metal layer is greater than 80% in the wavelength range 850 to 2000 nm depositing a contact metal layer composed on said reflective metal layer mounting and bonding a supporting substrate on top of the contact metal layer and removing the growth substrate.