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188 条记录 (耗时 0.028 秒)

    Optical monitoring and control of two layers of liquid immersion media
    2.
    发明授权
    Optical monitoring and control of two layers of liquid immersion media 失效
    两层液浸介质的光学监测与控制

    公开(公告)号：US07065427B1

    公开(公告)日：2006-06-20

    申请号：US10979367

    申请日：2004-11-01

    申请人： Srikanteswara Dakshina-Murthy ,  Bhanwar Singh ,  Ramkumar Subramanian ,  Bharath Rangarajan ,  Khoi A. Phan

    发明人： Srikanteswara Dakshina-Murthy ,  Bhanwar Singh ,  Ramkumar Subramanian ,  Bharath Rangarajan ,  Khoi A. Phan

    IPC分类号： G06F19/00 ,  G02B7/00 ,  H01L21/00

    CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70591

    摘要： A multi-layer immersion medium monitoring system for a lithographic process monitors characteristics of an immersion medium of a semiconductor manufacturing process. The multi-layer immersion medium includes at least a first liquid of a first density (or viscosity) and a second liquid of a lower density (or viscosity), both of which are interspersed between a final optical component and a semiconductor layer. The higher density layer is provided to reduce turbulence in the immersion medium during the lithographic processes. A scatterometry system monitors optical characteristics of the multi-layer immersion medium to effectuate control of a lithographic process.

    摘要翻译： 用于光刻工艺的多层浸渍介质监测系统监测半导体制造工艺的浸渍介质的特性。 多层浸渍介质至少包括第一密度（或粘度）的第一液体和较低密度（或粘度）的第二液体，它们都分散在最终的光学部件和半导体层之间。 提供更高密度的层以在光刻过程中减少浸没介质中的湍流。 散射测量系统监测多层浸没介质的光学特性，以实现光刻工艺的控制。

    Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK)
    3.
    发明授权
    Mask having sidewall absorbers to enable the printing of finer features in nanoprint lithography (1XMASK) 有权
    具有侧壁吸收器的面罩能够在纳米印刷光刻（1XMASK）中印刷更精细的特征，

    公开(公告)号：US07604903B1

    公开(公告)日：2009-10-20

    申请号：US10768515

    申请日：2004-01-30

    申请人： Bhanwar Singh ,  Srikanteswara Dakshina-Murthy ,  Khoi A. Phan ,  Bharath Rangarajan ,  Ramkumar Subramanian

    发明人： Bhanwar Singh ,  Srikanteswara Dakshina-Murthy ,  Khoi A. Phan ,  Bharath Rangarajan ,  Ramkumar Subramanian

    IPC分类号： G03F1/00 ,  G03F1/14

    CPC分类号： G03F1/50

    摘要： A mask is provided to be used with nanoprint lithography processes to facilitate reproduction of small features required for the production of integrated circuits. A translucent substrate is provided along with one or more three-dimensional features that include one or more vertical sidewalls. An absorbing material is deposited upon one or more of the vertical sidewalls so that light in an incident direction to an upper surface of the substrate will be absorbed by the absorbing material, resulting in light blocking features. One or more horizontal surfaces are formed upon one or more of the three-dimensional features, which allow light rays to exit a lower surface of the substrate unobstructed by the absorbing material.

    摘要翻译： 提供掩模以与纳米印刷光刻工艺一起使用，以便于再现生产集成电路所需的小特征。 提供了一个半透明衬底以及包括一个或多个垂直侧壁的一个或多个三维特征。 吸收材料沉积在一个或多个垂直侧壁上，使得在衬底的上表面的入射方向上的光将被吸收材料吸收，导致阻光特征。 一个或多个水平表面形成在三维特征中的一个或多个上，这允许光线离开衬底的下表面而不被吸收材料阻挡。

    Refractive index system monitor and control for immersion lithography
    4.
    发明授权
    Refractive index system monitor and control for immersion lithography 有权
    折射率系统监测和控制浸没光刻

    公开(公告)号：US06999254B1

    公开(公告)日：2006-02-14

    申请号：US10967845

    申请日：2004-10-18

    申请人： Khoi A. Phan ,  Bharath Rangarajan ,  Bhanwar Singh ,  Ramkumar Subramanian

    发明人： Khoi A. Phan ,  Bharath Rangarajan ,  Bhanwar Singh ,  Ramkumar Subramanian

    IPC分类号： G02B7/00

    CPC分类号： G03F7/70341

    摘要： A system and/or method are disclosed for measuring and/or controlling refractive index (n) and/or lithographic constant (k) of an immersion medium utilized in connection with immersion lithography. A known grating structure is built upon a substrate. A refractive index monitoring component facilitates measuring and/or controlling the immersion medium by utilizing detected light scattered from the known grating structure.

    摘要翻译： 公开了用于测量和/或控制与浸没式光刻相关联的浸渍介质的折射率（n）和/或光刻常数（k）的系统和/或方法。 已知的光栅结构被构建在衬底上。 折射率监测部件通过利用从已知光栅结构散射的检测光，便于测量和/或控制浸没介质。

    System and method to monitor reticle heating
    5.
    发明授权
    System and method to monitor reticle heating 有权
    监控标线加热的系统和方法

    公开(公告)号：US06809793B1

    公开(公告)日：2004-10-26

    申请号：US10050456

    申请日：2002-01-16

    申请人： Khoi A. Phan ,  Bhanwar Singh ,  Ramkumar Subramanian ,  Bharath Rangarajan

    发明人： Khoi A. Phan ,  Bhanwar Singh ,  Ramkumar Subramanian ,  Bharath Rangarajan

    IPC分类号： G03B2752

    CPC分类号： G03F7/70558 ,  G03F7/70875

    摘要： A system and method are disclosed which enable temperature of a substrate, such as mask or reticle, to be monitored and/or regulated. One or more temperature sensors are associated with the substrate to sense substrate temperature during exposure by an exposing source. The sensed temperature is used to control one or more process parameters of the exposure to help maintain the substrate at or below a desired temperature.

    摘要翻译： 公开了一种能够监测和/或调节衬底（例如掩模或掩模版）的温度的系统和方法。 一个或多个温度传感器与衬底相关联以在曝光源曝光期间检测衬底温度。 所感测的温度用于控制曝光的一个或多个工艺参数，以帮助将衬底维持在或低于所需温度。

    Using localized ionizer to reduce electrostatic charge from wafer and mask
    6.
    发明授权
    Using localized ionizer to reduce electrostatic charge from wafer and mask 有权
    使用局部电离器来减少晶片和掩模的静电电荷

    公开(公告)号：US06507474B1

    公开(公告)日：2003-01-14

    申请号：US09597126

    申请日：2000-06-19

    申请人： Bhanwar Singh ,  Ramkumar Subramanian ,  Khoi A. Phan ,  Bryan K. Choo ,  Bharath Rangarajan

    发明人： Bhanwar Singh ,  Ramkumar Subramanian ,  Khoi A. Phan ,  Bryan K. Choo ,  Bharath Rangarajan

    IPC分类号： H01T2300

    CPC分类号： G03F7/70616 ,  G03F7/70941

    摘要： One aspect of the present invention elates to a method of reducing electrostatic charges on a patterned photoresist to improve evaluation of the developed photoresist, involving the steps of evaluating the patterned photoresist to determine if electrostatic charges exist thereon; positioning an ionizer near the patterned photoresist, the ionizer generating ions thereby reducing the electrostatic charges on the patterned photoresist; and evaluating the patterned photoresist with an electron beam. Another aspect of the present invention relates to a system for reducing electrostatic charges on a patterned photoresist, containing a charge sensor for determining if electrostatic charges exist on the patterned photoresist and measuring the electrostatic charges; an ionizer positioned near the patterned photoresist having electrostatic charges thereon for reducing the electrostatic charges on the patterned photoresist; a controller for setting at least one of time of ion generation and amount of ion generation by the ionizer, the controller coupled to the charge sensor and the ionizer; and a scanning electron microscope or an atomic force microscope for evaluating the patterned photoresist having reduced electrostatic charges thereon with an electron beam.

    摘要翻译： 本发明的一个方面是提供减少图案化光致抗蚀剂上的静电电荷以改进对显影光致抗蚀剂的评估的方法，包括评估图案化光致抗蚀剂以确定静电电荷是否存在于其中的步骤; 在图案化的光致抗蚀剂附近定位电离器，离子发生器产生离子，从而减少图案化光致抗蚀剂上的静电电荷; 并用电子束评估图案化的光致抗蚀剂。 本发明的另一方面涉及一种用于减少图案化光致抗蚀剂上的静电电荷的系统，其包含用于确定图案化光致抗蚀剂上是否存在静电电荷并测量静电电荷的电荷传感器; 位于图案化的光致抗蚀剂附近的电离器，其上具有静电电荷，用于减少图案化光致抗蚀剂上的静电电荷; 用于设置离子发生时间和离子发生量中的至少一个的控制器，耦合到电荷传感器和离子发生器的控制器; 以及扫描电子显微镜或原子力显微镜，用于用电子束评估其上具有降低的静电电荷的图案化光致抗蚀剂。

    Method and system to monitor and control electro-static discharge
    10.
    发明授权
    Method and system to monitor and control electro-static discharge 失效
    监测和控制静电放电的方法和系统

    公开(公告)号：US06741445B1

    公开(公告)日：2004-05-25

    申请号：US10050458

    申请日：2002-01-16

    申请人： Khoi A. Phan ,  Bhanwar Singh ,  Bharath Rangarajan ,  Ramkumar Subramanian

    发明人： Khoi A. Phan ,  Bhanwar Singh ,  Bharath Rangarajan ,  Ramkumar Subramanian

    IPC分类号： H01T2300

    CPC分类号： H01L21/67253

    摘要： A system and methodology is provided for monitoring and controlling static charge during wafer and mask fabrication. The static charge on a target device is monitored. If the static charge becomes too high, corrective actions are taken to reduce the static charge. An antistatic solution is dispensed on the target device. The system and methodology provided reduce damage resulting from electrostatic discharge during fabrication. The system and methodology also reduce delays during fabrication by automatically controlling static charge without the need for manual intervention.

    摘要翻译： 提供了一种用于在晶片和掩模制造期间监测和控制静电荷的系统和方法。 监视目标设备上的静电荷。 如果静电荷过高，则采取纠正措施减少静电。 抗静电溶液分配在目标装置上。 所提供的系统和方法减少了制造过程中静电放电造成的损坏。 该系统和方法还通过自动控制静电而减少制造过程中的延迟，而无需人工干预。