公开(公告)号：US07575662B2

公开(公告)日：2009-08-18

申请号：US11170640

申请日：2005-06-29

申请人： Stefan Bangert ,  Wolfgang Buschbeck ,  Markus Hanika ,  Karl-Albert Keim ,  Michael Konig ,  Jorg Krempel-Hesse ,  Andreas Lopp ,  Harald Rost ,  Jurgen Schroeder ,  Tobias Stolley

发明人： Stefan Bangert ,  Wolfgang Buschbeck ,  Markus Hanika ,  Karl-Albert Keim ,  Michael Konig ,  Jorg Krempel-Hesse ,  Andreas Lopp ,  Harald Rost ,  Jurgen Schroeder ,  Tobias Stolley

IPC分类号： C23C14/35

CPC分类号： H01J37/3405 ,  C23C14/352 ,  H01J37/3455

摘要： The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.

摘要翻译： 本发明涉及一种用于操作磁控溅射阴极的方法，特别是管阴极或形成阵列的多个管阴极。 在这样的阴极中，目标通过磁场，由此感应电流流过靶，使磁场发生变形。 这导致衬底的不均匀涂覆。 通过使磁场和目标之间的相对运动交替地反转其方向，可以补偿磁场失真的影响。 这样可以使待涂覆的基底上的涂层更均匀。

公开(公告)号：US20060254905A1

公开(公告)日：2006-11-16

申请号：US11170640

申请日：2005-06-29

申请人： Stefan Bangert ,  Wolfgang Buschbeck ,  Markus Hanika ,  Karl-Albert Keim ,  Michael Konig ,  Jorg Krempel-Hesse ,  Andreas Lopp ,  Harald Rost ,  Jurgen Schroeder ,  Tobias Stolley

发明人： Stefan Bangert ,  Wolfgang Buschbeck ,  Markus Hanika ,  Karl-Albert Keim ,  Michael Konig ,  Jorg Krempel-Hesse ,  Andreas Lopp ,  Harald Rost ,  Jurgen Schroeder ,  Tobias Stolley

IPC分类号： C23C14/00

CPC分类号： H01J37/3405 ,  C23C14/352 ,  H01J37/3455

摘要： The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.