利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

32 条记录 (耗时 0.017 秒)

    Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
    1.
    发明申请
    Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination 有权
    使用多角度和多波长照明的晶圆检查系统的系统和方法

    公开(公告)号：US20060007435A1

    公开(公告)日：2006-01-12

    申请号：US11227555

    申请日：2005-09-14

    申请人： Steve Biellak ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Steve Biellak ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/88

    CPC分类号： G01N21/47 ,  G01N21/474 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8825 ,  H01L22/12

    摘要： A method for detecting an anomaly on a top surface of a substrate comprises directing a first radiation beam having a first wavelength at the top surface of the substrate at a first angle measured from normal, and directing a second radiation beam having a second wavelength at the top surface of the substrate at a second angle measured from normal, wherein the second wavelength is not equal to the first wavelength. The method then comprises detecting scattered radiation from the first radiation beam and the second radiation beam to detect the presence of particles or COPs, and to differentiate between the two. Differences in the scattered radiation detected from the first radiation beam and from the second radiation beam provide the data needed to differentiate between particles and COPs.

    摘要翻译： 用于检测衬底的顶表面上的异常的方法包括以从正常测量的第一角度引导具有第一波长的第一辐射束在衬底的顶表面处，并且将具有第二波长的第二辐射束引导到 从正常测量的第二角度的衬底的顶表面，其中第二波长不等于第一波长。 该方法然后包括检测来自第一辐射束和第二辐射束的散射辐射，以检测颗粒或COP的存在，并区分两者。 从第一辐射束和第二辐射束检测的散射辐射的差异提供了区分颗粒和COP之间所需的数据。

    System for detecting anomalies and/or features of a surface
    2.
    发明授权
    System for detecting anomalies and/or features of a surface 有权
    用于检测表面的异常和/或特征的系统

    公开(公告)号：US07869023B2

    公开(公告)日：2011-01-11

    申请号：US12123393

    申请日：2008-05-19

    申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

    Sample inspection system
    3.
    发明授权
    Sample inspection system 有权

    公开(公告)号：US07119897B2

    公开(公告)日：2006-10-10

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

    Sample inspection system
    4.
    发明申请
    Sample inspection system 有权

    公开(公告)号：US20050099621A1

    公开(公告)日：2005-05-12

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/47 ,  G01N21/95 ,  G01N21/88

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

    System for detecting anomalies and/or features of a surface
    5.
    发明授权
    System for detecting anomalies and/or features of a surface 有权
    用于检测表面的异常和/或特征的系统

    公开(公告)号：US07280199B2

    公开(公告)日：2007-10-09

    申请号：US10949078

    申请日：2004-09-24

    申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

    System for detecting anomalies and/or features of a surface
    7.
    发明授权
    System for detecting anomalies and/or features of a surface 失效
    用于检测表面的异常和/或特征的系统

    公开(公告)号：US06608676B1

    公开(公告)日：2003-08-19

    申请号：US08904892

    申请日：1997-08-01

    申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N2100

    CPC分类号： G01N21/9501

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

    System for Detecting Anomalies and/or Features of a Surface
    9.
    发明申请
    System for Detecting Anomalies and/or Features of a Surface 审中-公开
    用于检测表面异常和/或特征的系统

    公开(公告)号：US20060256327A1

    公开(公告)日：2006-11-16

    申请号：US11459586

    申请日：2006-07-24

    申请人： Mehdi Vaez-Iravani ,  Guoheng Zhao ,  Stanley Stokowski

    发明人： Mehdi Vaez-Iravani ,  Guoheng Zhao ,  Stanley Stokowski

    IPC分类号： G01N21/88

    CPC分类号： G01N21/95623 ,  G01N21/47 ,  G01N21/94 ,  G01N2201/1045

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam. For inspecting surface with a pattern thereon, the light from the surface is first passed through a spatial filter before it is imaged onto the charge-coupled devices. The spatial filter includes stripes of scattering regions that shift in synchronism with relative motion between the beam and the surface to block Fourier components from the pattern. The spatial filter may be replaced by reflective strips that selectively reflects scattered radiation to the detector, where the reflective strips also shifts in synchronism with the relative motion.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。 为了在其上检查具有图案的表面，来自表面的光首先在其被成像到电荷耦合器件之前通过空间滤光器。 空间滤波器包括散射区域的条带，其与波束和表面之间的相对运动同步地移动，以阻止来自图案的傅立叶分量。 空间滤波器可以被选择性地将散射的辐射反射到检测器的反射条替代，其中反射条也与相对运动同步地移动。