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公开(公告)号：US5654540A
公开(公告)日：1997-08-05
申请号：US516060
申请日：1995-08-17
CPC分类号： G01D5/38
摘要： Remote positioning to submicron accuracy is based on comparison of two interference gratings, the first of constant phase, and the second segmented. Positioning corresponds with equal segment-by-segment overlap of an image of one grating superimposed on the other.
摘要翻译： 远程定位到亚微米精度是基于两个干涉光栅的比较，第一个恒定相位和第二个分段。 定位对应于叠加在另一个光栅上的一个光栅的图像的逐段重叠。
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2.发明授权
公开(公告)号：US5596413A
公开(公告)日：1997-01-21
申请号：US516368
申请日：1995-08-17
CPC分类号： G03F9/70
摘要： Through-the-lens alignment during deep UV lithographic processing in the manufacture of VLSI is accomplished without shifting the mask or wafer from the exposure position. Introduction and extraction of alignment light of actinic wavelength depends on beam routing due to diffraction from an interference grating. The path of alignment light is within the focusing system but does not impinge on the focused pattern.
摘要翻译： 在制造VLSI期间的深UV光刻处理期间实现透镜对准，而不会将掩模或晶片从曝光位置移位。 介绍和提取光化波长的对准光取决于由干涉光栅的衍射引起的光束路由。 对准光的路径在聚焦系统内，但不会撞击聚焦图案。
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公开(公告)号：US20060116858A1
公开(公告)日：2006-06-01
申请号：US11328876
申请日：2006-01-10
申请人： Stuart Stanton
发明人： Stuart Stanton
IPC分类号： G06F17/50
CPC分类号： B82Y10/00 , B82Y40/00 , G05B13/04 , G05B13/048 , H01J37/304 , H01J37/3174
摘要： A process and method for projection beam lithography which utilizes an estimator, such as a Kalman filter to control electron beam placement. The Kalman filter receives predictive information from a model and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as wafer heating and beam drift. The process and method may also utilize an adaptive Kalman filter to control electron beam placement. The adaptive Kalman filter receives predictive information from a number of models and measurement information from a projection electron beam lithography tool and compensates for factors which cause beam placement error such as heating and beam drift. The Kalman filter may be implemented such that real-time process control may be achieved.
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公开(公告)号：US5631721A
公开(公告)日：1997-05-20
申请号：US449301
申请日：1995-05-24
申请人： Stuart Stanton , Gregg Gallatin , Mark Oskotsky , Frits Zernike
发明人： Stuart Stanton , Gregg Gallatin , Mark Oskotsky , Frits Zernike
IPC分类号： G03F7/20 , H01L21/027 , G03B27/72 , F21V9/04 , G02B5/18
CPC分类号： G03F7/70108 , G03F7/20 , G03F7/70158 , G03F7/70358
摘要： An illumination system for use in photolithography having an array optical element near the formation of a desired illumination field. Light or electromagnetic radiation from an illumination source is expanded and received by a multi-image optical element forming a plurality of secondary illumination sources in a plane. A condenser receives the light from the plurality of illumination sources. A array or diffractive optical element is placed on or near the focal point of the condenser. The illumination plane formed at the focal point of the condenser is within the near field diffraction pattern of the array or diffractive optical element. There is no condenser following the array or diffractive optical element. The use of the array or diffractive optical element permits the use of a condenser between the multi-image optical element and the array or diffractive optical element having a smaller numerical aperture than the emergent numerical aperture of the diffractive optical element, and generates a desired angular distribution with little dependance on the illumination source profile.
摘要翻译： 一种用于光刻的照明系统，其具有靠近所需照明场的形成的阵列光学元件。 来自照明源的光或电磁辐射由在平面中形成多个次级照明源的多图像光学元件扩展和接收。 聚光器接收来自多个照明源的光。 将阵列或衍射光学元件放置在冷凝器的焦点上或附近。 形成在聚光器的焦点处的照明平面在阵列或衍射光学元件的近场衍射图案内。 在阵列或衍射光学元件之后没有电容器。 使用阵列或衍射光学元件允许在多图像光学元件与具有比衍射光学元件的紧密数值孔径更小的数值孔径的阵列或衍射光学元件之间使用冷凝器，并且产生期望的角度 分布几乎不依赖于照明源分布。
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