公开(公告)号：US20110177437A1

公开(公告)日：2011-07-21

申请号：US13079078

申请日：2011-04-04

Applicant: Sung-soo Suh ,  Suk-joo Lee ,  Han-ku Cho ,  Yong-jin Chun ,  Sung-woo Lee ,  Young-chang Kim

Inventor： Sung-soo Suh ,  Suk-joo Lee ,  Han-ku Cho ,  Yong-jin Chun ,  Sung-woo Lee ,  Young-chang Kim

IPC: G03F1/00

CPC classification number: G03F1/36

Abstract: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.

Abstract translation: 提供了补偿掩模，使用补偿掩模的多光学系统以及使用补偿掩模来补偿三维（3-D）掩模效应的方法。 使用补偿掩模补偿3-D掩模效应的方法可以包括生成对应于用于形成微图案的正常掩模的第一内核，生成与补偿掩码相对应的第二内核，将与正常对应的第一内核混合 掩模与第二核对应于补偿掩模，并且生成对应于混合第一内核和第二内核的多光学系统内核。

公开(公告)号：US20110224945A1

公开(公告)日：2011-09-15

申请号：US13042760

申请日：2011-03-08

Applicant: Seong-bo Shim ,  Sang-wook Kim ,  Chun-suk Suh ,  Seong-woon Choi ,  Sung-woo Lee

Inventor： Seong-bo Shim ,  Sang-wook Kim ,  Chun-suk Suh ,  Seong-woon Choi ,  Sung-woo Lee

IPC: G06F19/00

CPC classification number: G03F1/36

Abstract: A method of performing etch proximity correction, taking into account an orientation-dependent component, includes providing a layout, selecting a target point on an edge of the layout, defining a proximity range from the target point, defining a probability function including a distance-dependent component, an orientation-dependent component, or both a distance-dependent component and an orientation-dependent component with respect to the proximity range, and calculating a surface integral of the probability function over the proximity range.

Abstract translation: 考虑到取决于取向的部件的蚀刻邻近校正的方法包括提供布局，在布局的边缘上选择目标点，从目标点定义接近范围，定义包括距离 - 距离的概率函数， 相关分量，取向相关分量，或相对于接近范围的距离相关分量和取向相关分量两者，以及在接近范围上计算概率函数的表面积分。

公开(公告)号：US06537837B2

公开(公告)日：2003-03-25

申请号：US09977323

申请日：2001-10-16

Applicant: Sung-woo Lee

Inventor： Sung-woo Lee

IPC: G01R3126

CPC classification number: G03F1/30 ,  G03F1/70 ,  G03F7/70283 ,  G03F7/70466

Abstract: A method of forming patterns wherein a first exposure is performed using a first alternating phase shift mask, and a second exposure is performed using a second alternating phase shift mask. Phase shift regions and non-phase shift regions of the second mask are made to correspond respectively to non-phase shift regions and phase shift regions of the first mask. Consequently, light transmitted through phase shift regions of the first mask during the first exposure, is transmitted through second non-phase shift regions of the second mask during the second exposure, so that weak light intensity is compensated for. Intensities of light passed through phase shift regions and non-phase shift regions are thus the same. Therefore, the &Dgr;CD phenomenon and the inversion phenomenon of critical dimensions between phase shift regions and non-phase shift regions with respect to different focuses, may be prevented.

Abstract translation: 一种形成图案的方法，其中使用第一交变相移掩模执行第一曝光，并且使用第二交替相移掩模执行第二曝光。 使第二掩模的相移区域和非相移区域分别对应于第一掩模的非相移区域和相移区域。 因此，在第一曝光期间通过第一掩模的相移区域透射的光在第二曝光期间通过第二掩模的第二非相移区域传输，从而补偿弱光强度。 因此通过相移区域和非相移区域的光的强度相同。 因此，可以防止相对于不同焦点的相移区域和非相移区域之间的DELTACD现象和关键尺寸的反转现象。

公开(公告)号：US07940373B2

公开(公告)日：2011-05-10

申请号：US11925014

申请日：2007-10-26

Applicant: Sung-soo Suh ,  Suk-joo Lee ,  Han-ku Cho ,  Yong-jin Chun ,  Sung-woo Lee ,  Young-chang Kim

Inventor： Sung-soo Suh ,  Suk-joo Lee ,  Han-ku Cho ,  Yong-jin Chun ,  Sung-woo Lee ,  Young-chang Kim

IPC: G03B27/52 ,  G03B27/72 ,  G03B27/32

CPC classification number: G03F1/36

Abstract: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.

Abstract translation: 提供了补偿掩模，使用补偿掩模的多光学系统以及使用补偿掩模来补偿三维（3-D）掩模效应的方法。 使用补偿掩模补偿3-D掩模效应的方法可以包括生成对应于用于形成微图案的正常掩模的第一内核，生成与补偿掩码相对应的第二内核，将与正常对应的第一内核混合 掩模与第二核对应于补偿掩模，并且生成对应于混合第一内核和第二内核的多光学系统内核。

公开(公告)号：US20080106719A1

公开(公告)日：2008-05-08

申请号：US11925014

申请日：2007-10-26

Applicant: Sung-soo Suh ,  Suk-joo Lee ,  Han-ku Cho ,  Yong-jin Chun ,  Sung-woo Lee ,  Young-chang Kim

Inventor： Sung-soo Suh ,  Suk-joo Lee ,  Han-ku Cho ,  Yong-jin Chun ,  Sung-woo Lee ,  Young-chang Kim

IPC: G03B27/54 ,  G03F1/00

CPC classification number: G03F1/36

Abstract: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.

Abstract translation: 提供了补偿掩模，使用补偿掩模的多光学系统以及使用补偿掩模来补偿三维（3-D）掩模效应的方法。 使用补偿掩模补偿3-D掩模效应的方法可以包括生成对应于用于形成微图案的正常掩模的第一内核，生成与补偿掩码相对应的第二内核，将与正常对应的第一内核混合 掩模与第二核对应于补偿掩模，并且生成对应于混合第一内核和第二内核的多光学系统内核。

公开(公告)号：US20050031121A1

公开(公告)日：2005-02-10

申请号：US10875719

申请日：2004-06-25

Applicant: Sung-woo Lee

Inventor： Sung-woo Lee

IPC: H04L9/06 ,  H04K1/06

CPC classification number: H04L9/0625 ,  H04L9/004 ,  H04L2209/12

Abstract: An encryption method and apparatus for implementing an overlapping operation, a variable clock operation, and a combination of the two operations. In the encryption method based on an overlapping operation technique, first, first through N-th fault sources effect first through N-th rounds of a first hardware engine to output a first cipher text. Thereafter, the second through (N+1)th fault sources effect first through N-th rounds of a second hardware engine, respectively, to output a second cipher text. The first and second cipher texts are compared to each other, and if the first and second cipher texts are identical, the first or second cipher text is output. The first and second hardware engines operate according to a data encryption standard (DES) algorithm. As described above, if the first and second cipher texts are identical, the first or second cipher text is output. Thus, a highly stable encryption algorithm is provided.

Abstract translation: 一种用于实现重叠操作，可变时钟操作和两个操作的组合的加密方法和装置。 在基于重叠操作技术的加密方法中，首先，第一到第N个故障源影响第一硬件引擎的第一到第N轮，以输出第一密文。 此后，第二到第（N + 1）个故障源分别影响第二硬件引擎的第一到第N轮，以输出第二密文。 将第一和第二密文相互比较，如果第一和第二密文相同，则输出第一或第二密文。 第一和第二硬件引擎根据数据加密标准（DES）算法进行操作。 如上所述，如果第一和第二密文相同，则输出第一或第二密文。 因此，提供了高度稳定的加密算法。

公开(公告)号：US09769185B2

公开(公告)日：2017-09-19

申请号：US13605383

申请日：2012-09-06

Applicant: Sung-woo Lee ,  Ji-yeon Han

Inventor： Sung-woo Lee ,  Ji-yeon Han

IPC: H04L29/06 ,  H04L12/24

CPC classification number: H04L63/1416 ,  H04L41/0681 ,  H04L41/0893 ,  H04L41/22

Abstract: A method and system for managing suspicious devices on a network. The method includes, setting based on a manager's input or selection a suspicious group corresponding to each of at least one suspicious management item for managing a plurality of devices on a network via a user interface; accessing the devices and reading information corresponding to the suspicious management item; determining whether each device is a suspicious device based on the information corresponding to the suspicious management item, and registering the device in the suspicious group if the device is determined as a suspicious device; checking whether an error of the device comprised in the suspicious group is resolved; and eliminating the device from the suspicious group if the error of the device is resolved.

公开(公告)号：US20080060986A1

公开(公告)日：2008-03-13

申请号：US11629285

申请日：2005-09-08

Applicant: Sung-woo Lee ,  In-jae Jeon

Inventor： Sung-woo Lee ,  In-jae Jeon

IPC: E03F5/14

CPC classification number: E03F5/0404 ,  E03F1/00 ,  E03F5/0401 ,  E03F5/0408 ,  E03F2005/0414 ,  Y02A30/68

Abstract: Disclosed herein is a soil inflow prevention apparatus in which an angular-rotation opening/closing plate is adapted to be inclined within a predetermined angle by virtue of opening stoppers to prevent a rear portion of the opening/closing plate from being excessively lowered in the beginning that an inflow amount of sewage increases due to rainfall, thereby preventing soil from entering an intercepting sewer in the beginning of an inflow of sewage.

Abstract translation: 这里公开了一种土壤流入防止装置，其中角形旋转开/关板适于通过打开止动件而在预定角度内倾斜，以防止开/闭板的后部开始过度降低 污水的流入量由于降雨而增加，从而在污水流入开始时防止土壤进入截流下水道。

公开(公告)号：US20060126828A1

公开(公告)日：2006-06-15

申请号：US11021351

申请日：2004-12-23

Applicant: Joong-chul Yoon ,  Sung-woo Lee

Inventor： Joong-chul Yoon ,  Sung-woo Lee

IPC: H04L9/28

CPC classification number: G06F7/726 ,  G06F7/728 ,  G06F2207/7223

Abstract: In an inverse calculation circuit, an inverse calculation method, and a storage medium encoded with a computer readable computer program code, a random number generator generates a first random number and a second random number; and an inverter receives a plurality of first bits expressing a first element of a finite field(s) as first inputs, receives a plurality of second bits expressing a second element of a finite field(s) as second inputs. In response to the first and second random numbers, the inverter outputs a plurality of third bits expressing the inverse elements of the first element. The first random number prevents a different power analysis (DPA) decryption attack, and the second random number prevents a timing decryption attack.

Abstract translation: 在逆计算电路中，逆计算方法和用计算机可读计算机程序代码编码的存储介质，随机数生成器生成第一随机数和第二随机数; 并且逆变器接收表示有限域的第一元素的多个第一比特作为第一输入，接收表示有限域的第二元素的多个第二比特作为第二输入。 响应于第一和第二随机数，逆变器输出表示第一元素的反向元素的多个第三比特。 第一个随机数防止了不同的功率分析（DPA）解密攻击，第二个随机数阻止了定时解密攻击。

公开(公告)号：US5034653A

公开(公告)日：1991-07-23

申请号：US430125

申请日：1989-11-01

Applicant: Suk-rae Cho ,  Sung-woo Lee

Inventor： Suk-rae Cho ,  Sung-woo Lee

IPC: H01J29/48 ,  H01J29/50 ,  H01J29/62

CPC classification number: H01J29/503

Abstract: An electron gun for use in a color picture tube includes electrodes forming at least one unipotential focusing lens for focusing electron beams. An electrode disposed between first and second electrodes forming a unipotential focusing lens includes first and second plate-shaped members. The first member forms, in cooperation with the first electrode, a focusing lens having an electrostatic field weaker in the vertical direction than in the lateral direction. The second member forms, in cooperation with the second electrode, a focusing lens having an electrostatic field weaker in the vertical direction than in the lateral direction. The electron gun removes halos appearing in the peripheral region of the tube screen.

Abstract translation: 用于彩色显象管的电子枪包括形成至少一个用于聚焦电子束的单电位聚焦透镜的电极。 设置在形成单能聚焦透镜的第一和第二电极之间的电极包括第一和第二板状部件。 第一构件与第一电极协作形成具有在垂直方向上比横向方向更弱的静电场的聚焦透镜。 第二构件与第二电极协作形成具有在垂直方向上比在横向方向上更弱的静电场的聚焦透镜。 电子枪除去出现在管屏的周边区域中的晕轮。