摘要:
A particle detecting method which is capable of detecting the number of low-speed particles accurately, and a storage medium storing a program for implementing the method. Intensity of scattered light generated when a light emitted into a gas stream is scattered by a particle is measured using a light receiving sensor at predetermined time intervals. A measuring time period for measuring the scattered light intensity is divided into measurement periods each defined as a predetermined time period, and a measured time point in each measurement period is selected at which a maximum value of the scattered light intensity measured is measured. The number of particles having passed by in front of the light receiving sensor is counted based on the measured time point selected in each measurement period.
摘要:
A particle detecting method which is capable of detecting the number of low-speed particles accurately, and a storage medium storing a program for implementing the method. Intensity of scattered light generated when a light emitted into a gas stream is scattered by a particle is measured using a light receiving sensor at predetermined time intervals. A measuring time period for measuring the scattered light intensity is divided into measurement periods each defined as a predetermined time period, and a measured time point in each measurement period is selected at which a maximum value of the scattered light intensity measured is measured. The number of particles having passed by in front of the light receiving sensor is counted based on the measured time point selected in each measurement period.
摘要:
A light source section outputs optical flux having two types of wavelength, which are a short wavelength and a long wavelength, while the intensity is made variable. The output from the first light intensity detecting section in irradiating the optical flux having a short wavelength is compared with the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength. A disappearance level near a point where the detected signal from the internal subject disappears is calculated. The first intensity of optical flux having a long wavelength is set to level higher than the disappearance level. Based on the output from the first light intensity detecting section obtained by the optical flux having a long wavelength of the first intensity, a subject inside the body to be detected is measured.
摘要:
A light source section outputs optical flux having two types of wavelength, which are a short wavelength and a long wavelength, while the intensity is made variable. The optical flux is made incident to a detected surface of a body to be detected at a predetermined incident angle simultaneously or alternatively. Based on a type of optical flux outputted from the light source section and an output from a first light intensity detecting section, at least the intensity of the optical flux having a long wavelength outputted from the light source section is adjusted. The output from the first light intensity detecting section in irradiating the optical flux having a short wavelength is compared with the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength. A signal that appears only in the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength is identified as a detected signal from an internal subject. The intensity of optical flux having a long wavelength is adjusted. A disappearance level near a point where the detected signal from the internal subject disappears is calculated. The first intensity of optical flux having a long wavelength is set to level higher than the disappearance level. Based on the output from the first light intensity detecting section obtained by the optical flux having a long wavelength of the first intensity, a subject inside the body to be detected is measured.
摘要:
The present invention provides an electron microscope device, comprising a scanning electron microscope 2 and an optical microscope 3, wherein the scanning electron microscope has scanning means 10 for scanning an electron beam and an electron detector 12 for detecting electron 11 issued from a specimen 8 scanned over by the electron beam, and the scanning electron microscope acquires a scanning electron image based on a detection result from the electron detector, the optical microscope has a light emitting source 13 for illuminating an illumination light, and the optical microscope illuminates the illumination light to the specimen, and acquires an optical image by receiving a reflection light from the specimen, and wherein the electron detector has a fluorescent substance layer for electron-light conversion, a wavelength filter for restricting so that all or almost all of wavelength ranges of the fluorescent light from the fluorescent substance layer passes through, and a wavelength detecting element for receiving the fluorescent light passing through the wavelength filter and performing optical-electric conversion, wherein the light amount of the illumination light in the wavelength range passing through the wavelength filter does not exceed a limit of deterioration of the scanning electron image.
摘要:
A measuring apparatus measuring a surface shape of a target includes a projection optical system to radiate a line beam on the target, an imaging device to acquire a reflected line beam reflected from the target, an optical imaging system to cause the reflected line beam to form an image on a receiving surface of the imaging device to acquire a shape of the line beam on the target, and a splitting mechanism to split the reflected line beam so as to acquire the shape of the line beam on the target at different positions in an extending direction of the line beam and guide the split reflected line beams to the imaging device. A plurality of segments are set on the receiving surface while each segment in which at least one region is set as a reception region is partitioned into a plurality of regions, and the optical imaging system causes the split reflected line beams to form images on the reception regions in the different segments, respectively.
摘要:
The present invention provides an electron microscope device 1, comprising a scanning electron microscope 2 and an optical microscope 3, wherein the scanning electron microscope has scanning means 10 for scanning an electron beam and an electron detector 12 for detecting electrons issued from a specimen 8 scanned by the electron beam, and the scanning electron microscope acquires a scanning electron image based on a detection result from the electron detector, wherein the optical microscope projects an illumination light to the specimen, receives a reflection light from the specimen and acquires an optical image, and wherein an optical axis 7 of the scanning electron microscope crosses an optical axis 6 of the optical microscope at a point of observation of the specimen, wherein the scanning means projects the electron beam for scanning with a scanning width wider than a width of a scanning area, the optical microscope projects an illumination light and acquires an optical image in an overrunning portion where the electron beam is projected beyond the scanning area, and the scanning electron microscope acquires a scanning electron image based on electrons issued when the electron beam scans over the scanning area.
摘要:
The present invention provides an electron microscope device 1, comprising a scanning electron microscope 2 and an optical microscope 3, wherein the scanning electron microscope has scanning means 10 for scanning an electron beam and an electron detector 12 for detecting electrons issued from a specimen 8 scanned by the electron beam, and the scanning electron microscope acquires a scanning electron image based on a detection result from the electron detector, wherein the optical microscope projects an illumination light to the specimen, receives a reflection light from the specimen and acquires an optical image, and wherein an optical axis 7 of the scanning electron microscope crosses an optical axis 6 of the optical microscope at a point of observation of the specimen, wherein the scanning means projects the electron beam for scanning with a scanning width wider than a width of a scanning area, the optical microscope projects an illumination light and acquires an optical image in an overrunning portion where the electron beam is projected beyond the scanning area, and the scanning electron microscope acquires a scanning electron image based on electrons issued when the electron beam scans over the scanning area.
摘要:
The present invention provides an electron microscope device, comprising a scanning electron microscope 2 provided with scanning means 10 for scanning an electron beam and an electron detector 12 for detecting an electron 11 issued from a specimen 8 where the electron beam is projected for scanning, wherein a scanning electron image is acquired based on a detection result from the electron detector, wherein the electron detector comprises a fluorescent substance layer for performing photoelectric conversion, a wavelength filter giving restriction so that all or almost all of wavelength ranges of fluorescent lights from the fluorescent substance layer can be transmitted, and a wavelength detecting element for receiving the fluorescent light transmitted through the wavelength filter and for performing photoelectric conversion.
摘要:
The surface inspection apparatus comprises a light source section for emitting a first luminous flux and a second luminous flux; a first irradiation optical system in which the first luminous flux is irradiated on the surface of an inspected object at a first irradiation angle; a second irradiation optical system in which the second luminous flux is irradiated on the surface of an inspected object at a second irradiation angle different from the first irradiation angle; a displacement section for relatively displacing an inspected object and an irradiation luminous flux of the irradiation optical system; a light receiving optical system for receiving scattered light of the first luminous flux irradiated by the first irradiation optical system and produced from an inspection object on the surface of an inspected object and scattered light of the second luminous flux irradiated by the second irradiation optical system and produced from an inspection object on the surface of an inspected object; a first light receiving section for converting scattered light of the first luminous flux received by the light receiving optical system into a first light receiving signal; a second light receiving section for converting scattered light received by the light receiving optical system into a second light receiving signal; an inspection object distribution data forming section for forming inspection object distribution data on the basis of the first light receiving signal and the second light receiving signal; and a scratch processing section for scratch-processing inspection object distribution data.