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公开(公告)号：US11533799B1
公开(公告)日：2022-12-20
申请号：US17372294
申请日：2021-07-09
发明人： Hsin-Feng Chen , Ming-Hsun Tsai , Li-Jui Chen , Shang-Chieh Chien , Heng-Hsin Liu , Cheng-Hao Lai , Yu-Huan Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Chiao-Hua Cheng
摘要： A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.
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公开(公告)号：US11553581B2
公开(公告)日：2023-01-10
申请号：US17369740
申请日：2021-07-07
发明人： Chiao-Hua Cheng , Hsin-Feng Chen , Yu-Fa Lo , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
摘要： A method for using an extreme ultraviolet radiation source is provided. The method includes assembling a first droplet generator onto a port of a vessel; ejecting a target droplet from the first droplet generator to a zone of excitation in front of a collector; emitting a laser toward the zone of excitation, such that the target droplet is heated by the laser to generate extreme ultraviolet (EUV) radiation; stopping the ejection of the target droplet; after stopping the ejection of the target droplet, disassembling the first droplet generator from the port of the vessel; after disassembling the first droplet generator from the port of the vessel, inserting a cleaning device into the vessel through the port; and cleaning the collector by using the cleaning device.
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公开(公告)号：US12096543B2
公开(公告)日：2024-09-17
申请号：US18151930
申请日：2023-01-09
发明人： Chiao-Hua Cheng , Hsin-Feng Chen , Yu-Fa Lo , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/7055 , H05G2/008
摘要： A method for using an extreme ultraviolet radiation source is provided. The method includes performing a lithography process using an extreme ultraviolet (EUV) radiation source; after the lithography processes, inserting an extraction tube into a vessel of the EUV radiation source; and cleaning a collector of the EUV radiation source by using the extraction tube.
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公开(公告)号：US11576250B1
公开(公告)日：2023-02-07
申请号：US17445430
申请日：2021-08-19
发明人： Cheng-Hao Lai , Ming-Hsun Tsai , Hsin-Feng Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
摘要： Some implementations described herein provide techniques and apparatuses for an extreme ultraviolet (EUV) radiation source that includes a backsplash-prevention system to reduce, minimize, and/or prevent the formation of tin (Sn) build-up in a tunnel structure of a collector flow ring that might otherwise be caused by the accumulation of Sn satellites. This reduces backsplash of Sn onto a collector of the EUV radiation source, increases the operational life of the collector (e.g., by increasing the time duration between cleaning and/or replacement of the collector), reduces downtime of the EUV radiation source, and/or enables the performance of the EUV radiation source to be sustained for longer time durations (e.g., by reducing, minimizing, and/or preventing the rate of Sn contamination of the collector), among other examples.
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