-
公开(公告)号：US11533799B1
公开(公告)日：2022-12-20
申请号：US17372294
申请日：2021-07-09
发明人： Hsin-Feng Chen , Ming-Hsun Tsai , Li-Jui Chen , Shang-Chieh Chien , Heng-Hsin Liu , Cheng-Hao Lai , Yu-Huan Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Yu-Fa Lo , Chiao-Hua Cheng
摘要： A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.
-
公开(公告)号：US11553581B2
公开(公告)日：2023-01-10
申请号：US17369740
申请日：2021-07-07
发明人： Chiao-Hua Cheng , Hsin-Feng Chen , Yu-Fa Lo , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
摘要： A method for using an extreme ultraviolet radiation source is provided. The method includes assembling a first droplet generator onto a port of a vessel; ejecting a target droplet from the first droplet generator to a zone of excitation in front of a collector; emitting a laser toward the zone of excitation, such that the target droplet is heated by the laser to generate extreme ultraviolet (EUV) radiation; stopping the ejection of the target droplet; after stopping the ejection of the target droplet, disassembling the first droplet generator from the port of the vessel; after disassembling the first droplet generator from the port of the vessel, inserting a cleaning device into the vessel through the port; and cleaning the collector by using the cleaning device.
-
公开(公告)号：US12066761B2
公开(公告)日：2024-08-20
申请号：US17461491
申请日：2021-08-30
发明人： Chiao-Hua Cheng , Sheng-Kang Yu , Shang-Chieh Chien , Wei-Chun Yen , Heng-Hsin Liu , Ming-Hsun Tsai , Yu-Fa Lo , Li-Jui Chen , Wei-Shin Cheng , Cheng-Hsuan Wu , Cheng-Hao Lai , Yu-Kuang Sun , Yu-Huan Chen
IPC分类号： G03F7/00
CPC分类号： G03F7/70483 , G03F7/70033 , G03F7/7085
摘要： In a method of inspecting an extreme ultraviolet (EUV) radiation source, during an idle mode, a borescope mounted on a fixture is inserted through a first opening into a chamber of the EUV radiation source. The borescope includes a connection cable attached at a first end to a camera. The fixture includes an extendible section mounted from a first side on a lead screw, and the camera of the borescope is mounted on a second side, opposite to the first side, of the extendible section. The extendible section is extended to move the camera inside the chamber of the EUV radiation source. One or more images are acquired by the camera from inside the chamber of the EUV radiation source at one or more viewing positions. The one or more acquired images are analyzed to determine an amount of tin debris deposited inside the chamber of the EUV radiation source.
-
公开(公告)号：US12096543B2
公开(公告)日：2024-09-17
申请号：US18151930
申请日：2023-01-09
发明人： Chiao-Hua Cheng , Hsin-Feng Chen , Yu-Fa Lo , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/7055 , H05G2/008
摘要： A method for using an extreme ultraviolet radiation source is provided. The method includes performing a lithography process using an extreme ultraviolet (EUV) radiation source; after the lithography processes, inserting an extraction tube into a vessel of the EUV radiation source; and cleaning a collector of the EUV radiation source by using the extraction tube.
-
公开(公告)号：US12028959B2
公开(公告)日：2024-07-02
申请号：US17875288
申请日：2022-07-27
发明人： Wei-Shin Cheng , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng , Hsiao-Lun Chang
CPC分类号： H05G2/005 , G05D7/0635 , H05G2/006
摘要： A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.
-
公开(公告)号：US11576250B1
公开(公告)日：2023-02-07
申请号：US17445430
申请日：2021-08-19
发明人： Cheng-Hao Lai , Ming-Hsun Tsai , Hsin-Feng Chen , Wei-Shin Cheng , Yu-Kuang Sun , Cheng-Hsuan Wu , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
摘要： Some implementations described herein provide techniques and apparatuses for an extreme ultraviolet (EUV) radiation source that includes a backsplash-prevention system to reduce, minimize, and/or prevent the formation of tin (Sn) build-up in a tunnel structure of a collector flow ring that might otherwise be caused by the accumulation of Sn satellites. This reduces backsplash of Sn onto a collector of the EUV radiation source, increases the operational life of the collector (e.g., by increasing the time duration between cleaning and/or replacement of the collector), reduces downtime of the EUV radiation source, and/or enables the performance of the EUV radiation source to be sustained for longer time durations (e.g., by reducing, minimizing, and/or preventing the rate of Sn contamination of the collector), among other examples.
-
公开(公告)号：US11537053B2
公开(公告)日：2022-12-27
申请号：US17450100
申请日：2021-10-06
发明人： Chiao-Hua Cheng , Yu-Kuang Sun , Wei-Shin Cheng , Yu-Huan Chen , Ming-Hsun Tsai , Cheng-Hao Lai , Cheng-Hsuan Wu , Yu-Fa Lo , Shang-Chieh Chien , Heng-Hsin Liu , Li-Jui Chen , Sheng-Kang Yu
摘要： Some implementations herein include a detection circuit and a fast and accurate in-line method for detecting blockage on a droplet generator head of an extreme ultraviolet exposure tool without impacting the flow of droplets of a target material through the droplet generator head. In some implementations described herein, the detection circuit includes a switch circuit that is configured in an open configuration, in which the switch is electrically open between two electrode elements. When an accumulation of the target material occurs across two or more electrode elements on the droplet generator head, the accumulation functions as a switch that closes the detection circuit. A controller may detect closure of the detection circuit.
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.016 秒)
