公开(公告)号：US20150140685A1

公开(公告)日：2015-05-21

申请号：US14082249

申请日：2013-11-18

Applicant: TDK Corporation

Inventor： Hisayoshi WATANABE ,  Ken FUJII ,  Takayuki NISHIZAWA ,  Masachika HASHINO

IPC: H01L43/12 ,  G03F1/00 ,  H01L43/08

CPC classification number: H01L21/0274 ,  G03F1/00 ,  G03F7/203 ,  G03F7/70633 ,  G11B5/1278 ,  G11B5/3163 ,  G11B5/3958 ,  G11B5/3967 ,  G11B5/4886 ,  H01L21/312

Abstract: A method for manufacturing a pattern multilayer body that has a plurality of pattern layers, and where a pattern is formed in each pattern layer, includes a step of forming an overlay pattern within an overlay pattern formation region, and in the step of forming the overlay pattern, a photoresist film is formed, and after a photoresist film is exposed via a main mask, a resist pattern is formed by exposing a sub mask(s). The main mask has a pattern light-shielding part that is commonly used for forming a pattern in each pattern layer, and each main light-shielding part for forming each overlay patter; and a sub mask has an opening part that is exposable to an unexposed region(s) within an overlay pattern formation region other than an unexposed region(s) on the photoresist film, which has been light-shielded by the main light-shielding part for forming a corresponding overlay pattern. This enables forming an overlay pattern that is high in position gap measurement accuracy in a direction orthogonal to the lamination direction when manufacturing a pattern multilayer body.

Abstract translation: 一种用于制造具有多个图案层并且在每个图案层中形成图案的图案多层体的方法包括在覆盖图案形成区域内形成覆盖图案的步骤，并且在形成覆盖层的步骤中 形成光致抗蚀剂膜，并且在通过主掩模曝光光致抗蚀剂膜之后，通过暴露子掩模形成抗蚀剂图案。 主掩模具有通常用于在每个图案层中形成图案的图案遮光部分和用于形成每个覆盖图案的每个主遮光部分; 并且子掩模具有可暴露于除光致抗蚀剂膜上的未曝光区域之外的覆盖图案形成区域内的未曝光区域的开口部分，其被主遮光部分遮光 用于形成对应的覆盖图案。 由此，能够在制造图案层叠体时形成与层叠方向正交的方向上的位置间隙测定精度高的覆盖图形。