摘要:
A method for manufacturing a faceplate of a semiconductor apparatus is provided. The method includes selecting a size of a tool in response to a predetermined specification of a predetermined gas parameter. The tool is used to form the holes within the faceplate. A first gas parameter of the holes of the faceplate is measured by an apparatus to determine if the measured first gas parameter of the holes of the faceplate is within the predetermined specification.
摘要:
An electric field sensor comprising: a substrate having a hole; a shielding electrode and a sensing electrode, disposed in the hole of the substrate; a piezoelectric bar having one end connected to the center of the shielding electrode, the other end fixed on the substrate. Present invention provides several electric field sensors, which have the same feature of utilizing electrodes interleaving vibration to modulate external electric field. They have IC-compatible operation voltage and small volume.
摘要:
An electric field sensor comprising: a substrate having a hole; a shielding electrode and a sensing electrode, disposed in the hole of the substrate; a piezoelectric bar having one end connected to the center of the shielding electrode, the other end fixed on the substrate. Present invention provides several electric field sensors, which have the same feature of utilizing electrodes interleaving vibration to modulate external electric field. They have IC-compatible operation voltage and small volume.
摘要:
A method and apparatus for fabricating a wafer spacing mask and a substrate support chuck. Such apparatus is a stencil containing a plurality of dual counterbored apertures that is positioned atop the substrate support chuck while material is deposited onto the stencil and through the apertures' openings onto the chuck. Upon completion of the deposition process, the stencil is removed from the workpiece support chuck leaving deposits of the material of various widths but the same heights to form the wafer spacing mask.