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公开(公告)号:US20100071210A1
公开(公告)日:2010-03-25
申请号:US12236768
申请日:2008-09-24
申请人: TIEN FAK TAN , Lun Tsuei , Shaofeng Chen , Felix Rabinovich , Dmitry Lubomirsky , Kimberly Hinckley
发明人: TIEN FAK TAN , Lun Tsuei , Shaofeng Chen , Felix Rabinovich , Dmitry Lubomirsky , Kimberly Hinckley
CPC分类号: C23C16/45565 , H01J37/3244 , Y10T29/49401
摘要: A method for manufacturing a faceplate of a semiconductor apparatus is provided. The method includes selecting a size of a tool in response to a predetermined specification of a predetermined gas parameter. The tool is used to form the holes within the faceplate. A first gas parameter of the holes of the faceplate is measured by an apparatus to determine if the measured first gas parameter of the holes of the faceplate is within the predetermined specification.
摘要翻译: 提供一种制造半导体装置的面板的方法。 该方法包括响应于预定气体参数的预定规格来选择工具的尺寸。 该工具用于在面板内形成孔。 面板的孔的第一气体参数由装置测量以确定面板的孔的测量的第一气体参数是否在预定规格内。
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公开(公告)号:US20100006032A1
公开(公告)日:2010-01-14
申请号:US12501195
申请日:2009-07-10
IPC分类号: C23C16/00
CPC分类号: C23C16/452 , C23C16/4481 , C23C16/45512 , C23C16/45591
摘要: Apparatus for use with a processing chamber are provided. In one aspect a blocker plate is provided including an annular plate having an inner portion of a first thickness and the annular plate having an aperture pattern including a center portion, a first patterned portion concentrically disposed around the center portion and comprising a first plurality of apertures having a first number of apertures, an second patterned portion concentrically disposed around the first patterned portion and comprising a second plurality of apertures having a second number of apertures greater than the first number of apertures, a perimeter portion concentrically disposed around the second patterned portion, and an outer portion comprising a raised concentric portion disposed on a perimeter of the annular plate. In another aspect, a second, third, and fourth blocker plates are provided. Additionally, a mixing apparatus and a liquid evaporating apparatus for use in a processing chamber are provided.
摘要翻译: 提供了一种用于处理室的设备。 在一个方面,提供了阻挡板,其包括具有第一厚度的内部部分的环形板,并且环形板具有包括中心部分的孔图案,第一图案化部分同心地设置在中心部分周围,并且包括第一多个孔 具有第一数量的孔,第二图案部分同心地设置在第一图案化部分周围,并且包括第二多个孔,其具有大于第一数量孔的第二数量的孔,围绕第二图案化部分同心设置的周边部分, 以及包括设置在所述环形板的周边上的升高的同心部分的外部部分。 另一方面,提供第二,第三和第四阻滞板。 此外,提供了一种用于处理室的混合装置和液体蒸发装置。
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