公开(公告)号：US11873560B2

公开(公告)日：2024-01-16

申请号：US16088102

申请日：2017-03-15

Applicant: Tokyo Electron Limited

Inventor： Katsuhito Hirose ,  Toshio Hasegawa ,  Shohei Yoshida ,  Takeshi Shinohara ,  Shinji Kawasaki

IPC: C23C16/52 ,  G05B23/02 ,  C23C16/455 ,  G05B19/048 ,  H01L21/67

CPC classification number: C23C16/52 ,  C23C16/45536 ,  C23C16/45544 ,  G05B19/048 ,  G05B23/0221 ,  H01L21/67253 ,  G05B2219/45026

Abstract: Provided is an abnormality detection system that includes a first controller configured to control a substrate processing apparatus and a second controller configured to control a device provided in the substrate processing apparatus according to an instruction from the first controller, thereby detecting an abnormality in the device. The second controller includes a storage unit configured to collect status signals for the device for a predetermined time and at a predetermined sampling interval in a predetermined cycle and accumulate the collected status signals for the device, and the first controller includes an abnormality determination unit configured to acquire the accumulated status signals for the device from the second controller at a time interval equal to or longer than the predetermined time, and determine presence or absence of an abnormality in the device.

公开(公告)号：US20200299841A1

公开(公告)日：2020-09-24

申请号：US16088102

申请日：2017-03-15

Applicant: Tokyo Electron Limited

Inventor： Katsuhito Hirose ,  Toshio Hasegawa ,  Shohei Yoshida ,  Takeshi Shinohara ,  Shinji Kawasaki

IPC: C23C16/52 ,  C23C16/455 ,  H01L21/67 ,  G05B23/02 ,  G05B19/048

Abstract: Provided is an abnormality detection system that includes a first controller configured to control a substrate processing apparatus and a second controller configured to control a device provided in the substrate processing apparatus according to an instruction from the first controller, thereby detecting an abnormality in the device. The second controller includes a storage unit configured to collect status signals for the device for a predetermined time and at a predetermined sampling interval in a predetermined cycle and accumulate the collected status signals for the device, and the first controller includes an abnormality determination unit configured to acquire the accumulated status signals for the device from the second controller at a time interval equal to or longer than the predetermined time, and determine presence or absence of an abnormality in the device.

公开(公告)号：US10815567B2

公开(公告)日：2020-10-27

申请号：US15520820

申请日：2015-09-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Katsuhito Hirose ,  Kunihiro Tada ,  Kenji Suzuki ,  Takeshi Shinohara

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/34

Abstract: A film deposition device includes a reaction gas supply part which is in communication with a process space defined between a placement part and a ceiling part. An annular gap in a plan view exists between an outer peripheral portion of the placement part and an outer peripheral portion of the ceiling part in circumferential directions of the placement part and the ceiling part. A reaction gas supplied from the reaction gas supply part into the process space via the ceiling part flows outside of the process space via the annular gap. A plurality of gas flow channels, which is used for forming gas-flow walls, is formed in the outer peripheral portion of the ceiling part which provides the annular gap.