公开(公告)号：US09159536B2

公开(公告)日：2015-10-13

申请号：US14333691

申请日：2014-07-17

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi Kaneko ,  Kazunori Funazaki ,  Yunosuke Hashimoto

IPC: H01J7/24 ,  H05B31/26 ,  H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32183 ,  H01J37/32192 ,  H01J37/32311 ,  H01J37/32935 ,  H05H2001/4682

Abstract: A plasma processing apparatus includes a processing container and a plasma generating mechanism including a high-frequency oscillator. The arrangement is configured to generate plasma within the processing container by using a high frequency wave oscillated by the high-frequency oscillator. In addition, an impedance regulator is configured to adjust impedance to be applied to the high-frequency oscillator. Further, a determining unit is configured to change the impedance to be adjusted by the impedance regulator and to determine an abnormal oscillation of the high-frequency oscillator based on (a) a component of a center frequency of a fundamental wave that is the high frequency wave oscillated by the high-frequency oscillator, and (b) a component of a peripheral frequency present at both ends of a predetermined frequency band centered around the center frequency of the fundamental wave in a state where the impedance is changed.

Abstract translation: 等离子体处理装置包括处理容器和包括高频振荡器的等离子体产生机构。 该配置被配置为通过使用由高频振荡器振荡的高频波来在处理容器内产生等离子体。 此外，阻抗调节器被配置为调节要施加到高频振荡器的阻抗。 此外，确定单元被配置为改变由阻抗调节器调节的阻抗，并且基于（a）作为高频的基波的中心频率的分量来确定高频振荡器的异常振荡 由高频振荡器振荡的波，以及（b）在阻抗变化的状态下以基波的中心频率为中心的预定频带的两端存在的外围频率的分量。

公开(公告)号：US10662531B2

公开(公告)日：2020-05-26

申请号：US14588114

申请日：2014-12-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi Kaneko ,  Yunosuke Hashimoto ,  Yohei Ishida

IPC: C23C16/511 ,  G01R23/02 ,  H01J37/32 ,  H03L7/26

Abstract: Disclosed is a plasma processing apparatus including a processing container, a plasma generation mechanism, a regulation unit, a detection unit, and a determination unit. The plasma generation mechanism includes a microwave oscillator, and generates plasma within the processing container using microwaves oscillated by the microwave oscillator. The regulation unit regulates an oscillation frequency, which corresponds to a frequency of the microwaves oscillated by the microwave oscillator, to a predetermined frequency. The detection unit detects the oscillation frequency regulated to the predetermined frequency by the regulation unit. The determination unit determines the success/failure of regulation of the oscillation frequency by the regulation unit, using the oscillation frequency detected by the detection unit, or using a parameter which is changed depending on a difference between the oscillation frequency and the predetermined frequency.

公开(公告)号：US09241397B2

公开(公告)日：2016-01-19

申请号：US14512655

申请日：2014-10-13

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi Kaneko ,  Yunosuke Hashimoto ,  Yohei Ishida

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/32192 ,  H01J37/3222 ,  H01J37/32229 ,  H01J37/32935 ,  H01J37/3299 ,  H05H2001/4607

Abstract: Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space, a distributor configured to distribute the microwaves to a plurality of waveguides using a variable distribution ratio, an antenna installed in the processing container to seal the processing space and configured to radiate the microwaves distributed to each of the plurality of waveguides by the distributor to the processing space, a monitor unit configured to monitor a power of the microwaves distributed to each of the plurality of waveguides by the distributor, and a distribution ratio control unit configured to correct the distribution ratio used for distribution of the microwaves by the distributor based on a difference between a ratio of the power of the microwaves monitored by the monitor unit and a previously designated distribution ratio.

Abstract translation: 公开了一种微波等离子体处理装置，包括：处理容器，被配置为限定处理空间，微波发生器被配置为产生用于产生引入到处理空间中的处理气体的等离子体的微波;分配器，被配置为将微波分布到多个波导 使用可变分配比率，安装在所述处理容器中的天线以密封所述处理空间并且被配置为将由所述分配器分配到所述多个波导中的每一个的微波辐射到所述处理空间;监视单元，被配置为监视所述处理空间的功率 通过分配器分配给多个波导中的每一个的微波，以及分配比率控制单元，其被配置为基于由所述分配器监视的微波的功率的比率来校正由分配器用于分配微波的分配比率 监控单元和以前指定的 分配比例。