-
公开(公告)号：US20220389584A1
公开(公告)日：2022-12-08
申请号：US17830877
申请日：2022-06-02
Applicant: TOKYO ELECTRON LIMITED
Inventor： Ryutaro SUDA , Maju Tomura , Susumu Nogami , Hideaki Yakushiji , Takahiro Murakami , Yusuke Wako
IPC: C23C16/455 , C23C16/44 , C23C16/52
Abstract: A shower head for plasma processing includes a body part having a first surface, a second surface opposite to the first surface, and a plurality of inner side surfaces. The plurality of inner side surfaces is configured to define a plurality of gas holes penetrating through the body part from the first surface to the second surface. The second surface is made of a first corrosion-resistant material.
-
2.发明授权公开(公告)号：US11798793B2
公开(公告)日：2023-10-24
申请号：US17583224
申请日：2022-01-25
Applicant: Tokyo Electron Limited
Inventor： Satoshi Ohuchida , Koki Mukaiyama , Yusuke Wako , Maju Tomura , Yoshihide Kihara
CPC classification number: H01J37/32724 , B08B3/08 , B08B5/00 , B08B13/00 , H01L21/0206 , H01L21/31138 , H01L21/31144 , H01J2237/334
Abstract: A substrate processing method includes: (a) disposing a substrate on a substrate support provided in a chamber of a substrate processing apparatus; (b) supplying a processing gas including hydrogen fluoride gas into the chamber; (c) controlling a temperature of the substrate support to a first temperature, and a pressure of the hydrogen fluoride gas in the chamber to a first pressure; and (d) controlling the temperature of the substrate support to a second temperature, and the pressure of the hydrogen fluoride gas in the chamber to a second pressure. In a graph with a horizontal axis indicating a temperature and a vertical axis indicating a pressure, the first temperature and the first pressure are positioned in a first region above an adsorption equilibrium pressure curve of hydrogen fluoride, and the second temperature and the second pressure are positioned in a second region below the adsorption equilibrium pressure curve.
-
Search Results
2
records
(took 0.01 seconds)
