公开(公告)号：US11171022B2

公开(公告)日：2021-11-09

申请号：US16278757

申请日：2019-02-19

Applicant: TOSHIBA MEMORY CORPORATION

Inventor： Hakuba Kitagawa ,  Yasuhito Yoshimizu ,  Fuyuma Ito ,  Hiroyuki Tanizaki

IPC: H01L21/67 ,  H01L21/3213

Abstract: In one embodiment, a substrate treatment apparatus includes a supporter configured to support and rotate a substrate, and a liquid supplier configured to supply a liquid to the substrate. The apparatus further includes a wall provided separately from the supporter and at least partially surrounding the supporter, and a detector provided between the supporter and the wall and configured to detect a change in the liquid.