公开(公告)号：US20200185221A1

公开(公告)日：2020-06-11

申请号：US16559518

申请日：2019-09-03

Applicant: TOSHIBA MEMORY CORPORATION

Inventor： Yasuhito YOSHIMIZU ,  Fuyuma ITO ,  Hakuba KITAGAWA ,  Yohei YAMAMOTO ,  Hisashi OKUCHI ,  Yuji YAMADA

IPC: H01L21/02 ,  B08B3/08 ,  H01L21/67

Abstract: According to an embodiment, the substrate treatment device includes a dilutor configured to dilute a first liquid containing a metal ion and exhibiting acidity. The device further includes a pH changer configured to change a pH of the first liquid before or after being diluted by the dilutor. The device further includes a substrate conditioner configured to treat the substrate using the first liquid, which is diluted by the dilutor and with the pH changed by the pH changer.