公开(公告)号：US11830755B2

公开(公告)日：2023-11-28

申请号：US17693623

申请日：2022-03-14

Applicant: TOTO LTD.

Inventor： Akihito Ono ,  Jumpei Uefuji ,  Tomoki Umetsu ,  Tatsuya Hayakawa

IPC: H01L21/683 ,  H01J37/32

CPC classification number: H01L21/6833 ,  H01J37/32724

Abstract: An electrostatic chuck includes a ceramic dielectric substrate and a base plate. The ceramic dielectric substrate includes a first major surface, a second major surface, a groove part, and a plurality of cooling gas holes. The groove part includes first and second circumferential grooves, and first and second radial-direction grooves. The plurality of cooling gas holes includes first and second holes. The first hole overlaps the first radial-direction groove. The second hole overlaps the second radial-direction groove. The base plate includes a gas inlet path that supplies the cooling gas to the first and second holes. The first circumferential groove includes first and second end portions. The second circumferential groove includes third and fourth end portions. The third end portion and the fourth end portion do not overlap the first end portion in the radial direction.

公开(公告)号：US11756820B2

公开(公告)日：2023-09-12

申请号：US17469159

申请日：2021-09-08

Applicant: TOTO LTD.

Inventor： Akihito Ono ,  Jumpei Uefuji

IPC: H01L21/683 ,  H01T23/00 ,  H01J37/32 ,  H05B3/28 ,  H05B1/02

CPC classification number: H01L21/6833 ,  H01J37/32724 ,  H05B3/283 ,  H05B1/0233 ,  H05B2203/005 ,  H05B2203/008 ,  H05B2203/016

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes first and second heater elements. The second heater element has a plurality of main zones separated from each other in a radial direction. The first heater element has a plurality of sub-zones separated from each other. A number of the sub-zones is larger than a number of the main zones. The main zones include a first main zone. The first main zone has a main heater line and a first main power feeding portion. The sub-zones include a first sub-zone overlapping the first main zone. The first sub-zone has a central region and an outer peripheral region. The first main power feeding portion is provided at a position where the first main power feeding portion overlaps the central region.

公开(公告)号：US10373854B2

公开(公告)日：2019-08-06

申请号：US15937126

申请日：2018-03-27

Applicant: TOTO LTD.

Inventor： Jumpei Uefuji ,  Hitoshi Sasaki ,  Kosuke Yamaguchi ,  Kengo Maehata ,  Yuichi Yoshii ,  Tetsuro Itoyama

IPC: H01L21/683 ,  H05B3/28 ,  H01L21/67 ,  H01L21/687

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, an electrode layer, a base plate, and a heater plate. The ceramic dielectric substrate has a first major surface where a processing object is placed. The electrode layer is provided in the ceramic dielectric substrate. The base plate supports the ceramic dielectric substrate. The heater plate is provided between the base plate and the first major surface. The heater plate includes a first heater element and a second heater element. The first heater element emits heat due to a current flowing. The second heater element emits heat due to a current flowing. When viewed along a direction perpendicular to the first major surface, bends of the first heater element is more than bends of the second heater element, and the first heater element includes a portion positioned at a gap of the second heater element.

公开(公告)号：US11776836B2

公开(公告)日：2023-10-03

申请号：US17469260

申请日：2021-09-08

Applicant: TOTO LTD.

Inventor： Akihito Ono ,  Jumpei Uefuji

IPC: H01L21/683 ,  H01T23/00 ,  H01J37/32 ,  H05B3/28

CPC classification number: H01L21/6833 ,  H01J37/32724 ,  H05B3/283 ,  H05B2203/007 ,  H05B2203/008 ,  H05B2203/016

Abstract: An electrostatic chuck includes a ceramic dielectric substrate; a base plate; and a heater unit which heats the ceramic dielectric substrate. The heater unit includes a first heater element. The first heater element has a plurality of sub-zones. The sub-zones include a first sub-zone. The first sub-zone includes a sub-heater line generating heat by allowing a current to flow, a first sub-power feeding portion feeding a power to the sub-heater line, and a second sub-power feeding portion feeding a power to the sub-heater line. The first sub-zone has a central region located centrally in the first sub-zone and an outer peripheral region located outside the central region when viewed along a Z-direction perpendicular to the first major surface. At least one of the first sub-power feeding portion and the second sub-power feeding portion is provided in the central region.

公开(公告)号：US20200286766A1

公开(公告)日：2020-09-10

申请号：US16810220

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Tetsuro Itoyama ,  Jumpei Uefuji

IPC: H01L21/683

Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.

公开(公告)号：US10964579B2

公开(公告)日：2021-03-30

申请号：US16810220

申请日：2020-03-05

Applicant: TOTO LTD.

Inventor： Tetsuro Itoyama ,  Jumpei Uefuji

IPC: H01T23/00 ,  H01L21/683

Abstract: According to the embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a porous part. The ceramic dielectric substrate has a first major surface placing a suction object, a second major surface on an opposite side to the first major surface, and a through hole provided from the second to first major surface. The base plate supports the ceramic dielectric substrate and includes a gas introduction path communicating with the through hole. The porous part is provided in the gas introduction path. The porous part includes sparse portions including pores and a dense portion having a higher density than the sparse portions. Each of the sparse portions extends in a first direction from the base plate toward the ceramic dielectric substrate. The dense portion is positioned between the sparse portions. The sparse portions include the pores and a wall portion provided between the pores.

公开(公告)号：US10923382B2

公开(公告)日：2021-02-16

申请号：US16131245

申请日：2018-09-14

Applicant: TOTO LTD.

Inventor： Jumpei Uefuji ,  Hitoshi Sasaki ,  Kosuke Yamaguchi ,  Kengo Maehata ,  Yuichi Yoshii

IPC: H01L21/683 ,  B32B18/00 ,  H01L21/67

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.