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公开(公告)号：US11538670B2
公开(公告)日：2022-12-27
申请号：US16664243
申请日：2019-10-25
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Jan Peter Engelstaedter , Pawel Ozimek , Krzysztof Ruda , Jakub Swiatnicki
IPC: H01J37/24 , H05H1/24 , H01J37/32 , C23C16/455 , C23C16/50 , H02M5/458 , H02M1/32 , H02M7/06 , H02M7/5387 , H02M1/00
Abstract: A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes: a power input port for connection to an electrical power delivering grid, at least two, preferably more than two, power output ports each for connection to one of the plasma process chambers, and a controller configured to control the power converter to deliver the bipolar output power to the power output ports, using one or more control parameters selected from a list comprising: power, voltage, current, excitation frequency, and threshold for protective measures, such that at least one of the control parameters at a first power output port is different from the corresponding control parameter at a different power output port.
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公开(公告)号：US12148601B2
公开(公告)日：2024-11-19
申请号：US17697965
申请日：2022-03-18
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Wojciech Gajewski , Krzysztof Ruda , Jakub Swiatnicki
Abstract: A method of plasma processing a substrate in a plasma chamber is provided. The method includes the steps of supplying a power supply signal to electrodes arranged within the plasma chamber in order to form a plasma in the plasma chamber, monitoring at least one parameter related to the plasma processing, determining a feature related to the at least one monitored parameter, and adjusting the power supply signal during the plasma processing to modify, in particular reduce, the feature. The modification of the feature eliminates or mitigates formation of crazing on the substrate.
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公开(公告)号：US20220115207A1
公开(公告)日：2022-04-14
申请号：US17553875
申请日：2021-12-17
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Jakub Swiatnicki , Krzysztof Ruda , Mateusz Wiosna , Grzegorz Toczylowski , Jialei Chen
IPC: H01J37/32
Abstract: A method adjusts an output power of a power supply supplying electrical power to a plasma in a plasma chamber. The method includes: connecting the power supply to at least one electrode in the plasma chamber; transporting one or more substrates relative to the electrode using a substrate carrier; maintaining the plasma by the electrical power; processing the one or more substrates with the plasma; and adjusting the output power based on a parameter related to a distance between a surface of the electrode facing a carrier-substrate-assembly and a surface of the substrate-carrier-assembly facing the electrode.
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Patent Agency Ranking
公开(公告)号：US11929233B2
公开(公告)日：2024-03-12
申请号：US17553875
申请日：2021-12-17
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Jakub Swiatnicki , Krzysztof Ruda , Mateusz Wiosna , Grzegorz Toczylowski , Jialei Chen
IPC: H01J37/32
CPC classification number: H01J37/32082 , H01J37/32568 , H01J37/32935
Abstract: A method adjusts an output power of a power supply supplying electrical power to a plasma in a plasma chamber. The method includes: connecting the power supply to at least one electrode in the plasma chamber; transporting one or more substrates relative to the electrode using a substrate carrier; maintaining the plasma by the electrical power; processing the one or more substrates with the plasma; and adjusting the output power based on a parameter related to a distance between a surface of the electrode facing a carrier-substrate-assembly and a surface of the substrate-carrier-assembly facing the electrode.
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公开(公告)号：US11430642B2
公开(公告)日：2022-08-30
申请号：US16664174
申请日：2019-10-25
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Jan Peter Engelstaedter , Krzysztof Ruda , Jakub Swiatnicki
Abstract: A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes a power input port for connection to an electrical power delivering grid, at least two power output ports each for connection to one of the plasma processing chambers, and a controller configured to control the power converter to deliver the bipolar output power to the power output ports, using at least one of control parameters including power, voltage, current, excitation frequency, and threshold for protective measures. The controller includes a virtual power supply for each power output port, and each virtual power supply includes a separate complete set of all fixed and time varying parameters and internal states associated with the operation of the individual power output port.
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公开(公告)号：US20220208532A1
公开(公告)日：2022-06-30
申请号：US17697965
申请日：2022-03-18
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Wojciech Gajewski , Krzysztof Ruda , Jakub Swiatnicki
Abstract: A method of plasma processing a substrate in a plasma chamber is provided. The method includes the steps of supplying a power supply signal to electrodes arranged within the plasma chamber in order to form a plasma in the plasma chamber, monitoring at least one parameter related to the plasma processing, determining a feature related to the at least one monitored parameter, and adjusting the power supply signal during the plasma processing to modify, in particular reduce, the feature. The modification of the feature eliminates or mitigates formation of crazing on the substrate.
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公开(公告)号：US20200066497A1
公开(公告)日：2020-02-27
申请号：US16664174
申请日：2019-10-25
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Jan Peter Engelstaedter , Krzysztof Ruda , Jakub Swiatnicki
IPC: H01J37/32
Abstract: A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes a power input port for connection to an electrical power delivering grid, at least two power output ports each for connection to one of the plasma processing chambers, and a controller configured to control the power converter to deliver the bipolar output power to the power output ports, using at least one of control parameters including power, voltage, current, excitation frequency, and threshold for protective measures. The controller includes a virtual power supply for each power output port, and each virtual power supply includes a separate complete set of all fixed and time varying parameters and internal states associated with the operation of the individual power output port.
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公开(公告)号：US20200058475A1
公开(公告)日：2020-02-20
申请号：US16664243
申请日：2019-10-25
Applicant: TRUMPF Huettinger Sp. z o. o.
Inventor： Jan Peter Engelstaedter , Pawel Ozimek , Krzysztof Ruda , Jakub Swiatnicki
IPC: H01J37/32 , H02M5/458 , C23C16/50 , C23C16/455
Abstract: A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes: a power input port for connection to an electrical power delivering grid, at least two, preferably more than two, power output ports each for connection to one of the plasma process chambers, and a controller configured to control the power converter to deliver the bipolar output power to the power output ports, using one or more control parameters selected from a list comprising: power, voltage, current, excitation frequency, and threshold for protective measures, such that at least one of the control parameters at a first power output port is different from the corresponding control parameter at a different power output port.
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