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    Fluorescent lamp and method of manufacturing same
    2.
    发明授权
    Fluorescent lamp and method of manufacturing same 失效
    荧光灯及其制造方法

    公开(公告)号：US07501764B2

    公开(公告)日：2009-03-10

    申请号：US10546182

    申请日：2004-02-18

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Akihiro Morimoto

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Akihiro Morimoto

    IPC分类号： H01J61/04 ,  H01J61/06

    CPC分类号： H01J61/0677 ,  H01J61/0672 ,  H01J61/16

    摘要： A cold cathode fluorescent tube where an electron emitting electrode is sealed in shows much deterioration in the luminance with time, thereby being not adequate for a long time use. The electrode emitting electrode is formed in such a shape that an electric field is not locally concentrated. By mixing a material of high heat conductivity, such as tungsten, as the material for the electron emitting electrode or using helium of high heat conductivity as the sealing gas, a long life of the cold cathode fluorescent tube is achieved.

    摘要翻译： 其中电子发射电极被密封的冷阴极荧光管显示出随时间的亮度的很大的劣化，从而不能长时间使用。 电极发射电极形成为电场不局部集中的形状。 通过将诸如钨的高导热性材料作为电子发射电极的材料或使用具有高导热性的氦气作为密封气体，可以实现冷阴极荧光管的长寿命。

    Rotary silicon wafer cleaning apparatus
    4.
    发明授权
    Rotary silicon wafer cleaning apparatus 有权
    旋转硅片清洗装置

    公开(公告)号：US07103990B2

    公开(公告)日：2006-09-12

    申请号：US10498800

    申请日：2003-09-11

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Takumi Fujita ,  Yukio Minami ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Takumi Fujita ,  Yukio Minami ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada

    IPC分类号： F26B5/08

    CPC分类号： H01L21/67034 ,  H01L21/02052

    摘要： It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.

    摘要翻译： 本发明的目的是提供一种旋转型硅晶片清洁装置，以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。 根据本发明，旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构，用于在后期化学清洗时用纯水清洗硅晶片，在外表面上进行干燥和氢终止处理 通过安装硅晶片干燥装置来执行硅晶片，所述硅晶片干燥装置包括附接到壳体的气体供应板，以供应氢气和含有大于0.05％的氢气的惰性气体的混合气体，混合气体供应 一端连接上述气体供给面板的气体混合器的管道，将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置， 在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基，从而喷出混合气体 在完成清洁之后，将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。

    Lead frame and lead frame material
    5.
    发明授权
    Lead frame and lead frame material 失效
    引线框架和引线框架材料

    公开(公告)号：US5530283A

    公开(公告)日：1996-06-25

    申请号：US518529

    申请日：1995-08-23

    申请人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamaji ,  Tsutomu Shinohara ,  Akihiro Morimoto ,  Yasuyuki Shirai

    发明人： Tadahiro Ohmi ,  Nobukazu Ikeda ,  Michio Yamaji ,  Tsutomu Shinohara ,  Akihiro Morimoto ,  Yasuyuki Shirai

    IPC分类号： H01L23/50 ,  H01L23/495

    CPC分类号： H01L23/49582 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L24/45 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01019 ,  H01L2924/01028 ,  H01L2924/01322

    摘要： An object of the present invention is to provide a lead frame and a material for lead frame which insure excellent bonding and enables substantial reduction of time for production because such processes as plating are not required and furthermore are excellent in abration resistance.The present invention is characterized in that a silver layer having a construction where amplitude of a refracted ray refracted on the (200) surface is 1/3 or more of the amplitude of refracted X ray refracted on the (111) surface comprises an outer lead section of the base material for the lead frame. The base material is preferably copper, copper-alloy, iron, or iron alloy. The silver layer is formed, for instance, by means of silver plating, and the thickness is preferably in a range from 8 m to 30 m. An intermediate layer may be provided between a surface of the base material and the silver layer.

    摘要翻译： 本发明的目的是提供一种引线框架和引线框架材料，其确保良好的接合，并且能够显着缩短生产时间，因为不需要电镀等工艺，并且耐磨性也优异。 本发明的特征在于，具有在（200）表面折射的折射线的振幅为（111）面折射的折射X射线的振幅的1/3以上的结构的银层包括外引线 用于引线框架的基材的截面。 基材优选为铜，铜合金，铁或铁合金。 银层例如通过镀银形成，并且厚度优选在8μm至30μm的范围内。 可以在基材的表面和银层之间设置中间层。

    Rotary silicon wafer cleaning apparatus
    8.
    发明申请
    Rotary silicon wafer cleaning apparatus 有权
    旋转硅片清洗装置

    公开(公告)号：US20050126030A1

    公开(公告)日：2005-06-16

    申请号：US10498800

    申请日：2003-09-11

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Takumi Fujita ,  Yukio Minami ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Takumi Fujita ,  Yukio Minami ,  Nobukazu Ikeda ,  Akihiro Morimoto ,  Koji Kawada

    IPC分类号： H01L21/304 ,  F26B17/24 ,  F26B17/30 ,  H01L20060101 ,  H01L21/00 ,  H01L21/02 ,  H01L21/30 ,  H01L21/302

    CPC分类号： H01L21/67034 ,  H01L21/02052

    摘要： It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments. According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.

    摘要翻译： 本发明的目的是提供一种旋转型硅晶片清洁装置，以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。 根据本发明，旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构，用于在后期化学清洗时用纯水清洗硅晶片，在外表面上进行干燥和氢终止处理 通过安装硅晶片干燥装置来执行硅晶片，所述硅晶片干燥装置包括附接到壳体的气体供应板，以供应氢气和含有大于0.05％的氢气的惰性气体的混合气体，混合气体供应 一端连接上述气体供给面板的气体混合器的管道，将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置， 在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基，从而喷出混合气体 在完成清洁之后，将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。

    Vacuum treatment apparatus and vapor deposition apparatus
    9.
    发明申请
    Vacuum treatment apparatus and vapor deposition apparatus 审中-公开
    真空处理装置和蒸镀装置

    公开(公告)号：US20060278162A1

    公开(公告)日：2006-12-14

    申请号：US10568706

    申请日：2004-08-19

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Akihiro Morimoto

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Akihiro Morimoto

    IPC分类号： C23C16/00

    CPC分类号： C23C14/564

    摘要： It has been found that an organic component is emitted from a member such as a crucible or a gasket constituting an apparatus for vacuum treatment and an element is contaminated with said organic component emitted, and, as a result, members of the apparatus for vacuum treatment are subjected to a treatment for reducing the emission of an organic component. For example, a crucible is made from a material having a reduced catalytic activity to a material for use in the vapor deposition in question and a gasket is used after a treatment for reducing the bleeding of an organic component or is made from a material containing a reduced amount of an organic component.

    摘要翻译： 已经发现，有机组分从诸如坩埚或构成真空处理装置的垫圈的构件发射，并且元件被所发射的有机组分污染，结果是真空处理装置的构件 经受用于减少有机组分的发射的处理。 例如，坩埚由对所使用的气相沉积中使用的材料具有降低的催化活性的材料制成，并且在用于减少有机组分的渗出的处理之后使用垫圈，或者由含有 减少有机成分的量。