公开(公告)号：US11262658B2

公开(公告)日：2022-03-01

申请号：US16860080

申请日：2020-04-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Yuan Chang ,  Chih-Chiang Tu ,  Ming-Ho Tsai ,  Ching-Hung Lai

IPC: G03F7/20 ,  G03F1/36 ,  G03F1/70 ,  G03F1/82

Abstract: A photomask includes a transparent substrate and a shielding pattern disposed on the transparent substrate. The shielding pattern includes shielding island structures. The shielding island structures are separated from and spaced apart from one another by dividing lanes. The dividing lanes expose the underlying transparent substrate. The photomask is configured for a light of a wavelength, and the dividing lanes reduce or hinder a transmission of the light of the wavelength.

公开(公告)号：US20210333705A1

公开(公告)日：2021-10-28

申请号：US16860080

申请日：2020-04-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Yuan Chang ,  Chih-Chiang Tu ,  Ming-Ho Tsai ,  Ching-Hung Lai

IPC: G03F1/36 ,  G03F1/82 ,  G03F1/70

Abstract: A photomask includes a transparent substrate and a shielding pattern disposed on the transparent substrate. The shielding pattern includes shielding island structures. The shielding island structures are separated from and spaced apart from one another by dividing lanes. The dividing lanes expose the underlying transparent substrate. The photomask is configured for a light of a wavelength, and the dividing lanes reduce or hinder a transmission of the light of the wavelength.