公开(公告)号：US20210333705A1

公开(公告)日：2021-10-28

申请号：US16860080

申请日：2020-04-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Yuan Chang ,  Chih-Chiang Tu ,  Ming-Ho Tsai ,  Ching-Hung Lai

IPC: G03F1/36 ,  G03F1/82 ,  G03F1/70

Abstract: A photomask includes a transparent substrate and a shielding pattern disposed on the transparent substrate. The shielding pattern includes shielding island structures. The shielding island structures are separated from and spaced apart from one another by dividing lanes. The dividing lanes expose the underlying transparent substrate. The photomask is configured for a light of a wavelength, and the dividing lanes reduce or hinder a transmission of the light of the wavelength.

公开(公告)号：US20180284595A1

公开(公告)日：2018-10-04

申请号：US15475137

申请日：2017-03-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ching-Hung Lai ,  Chih-Chung Huang ,  Chih-Chiang Tu ,  Chung-Hung Lin ,  Chi-Ming Tsai ,  Ming-Ho Tsai

IPC: G03F1/22 ,  G03F7/20

CPC classification number: G03F1/22 ,  G03F1/36 ,  G03F7/7015 ,  G03F7/70441

Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 μm2 to 60000 μm2. The second pattern has an area of 0.16 μm2 to 60000 μm2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.

公开(公告)号：US11262658B2

公开(公告)日：2022-03-01

申请号：US16860080

申请日：2020-04-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Che-Yuan Chang ,  Chih-Chiang Tu ,  Ming-Ho Tsai ,  Ching-Hung Lai

IPC: G03F7/20 ,  G03F1/36 ,  G03F1/70 ,  G03F1/82

Abstract: A photomask includes a transparent substrate and a shielding pattern disposed on the transparent substrate. The shielding pattern includes shielding island structures. The shielding island structures are separated from and spaced apart from one another by dividing lanes. The dividing lanes expose the underlying transparent substrate. The photomask is configured for a light of a wavelength, and the dividing lanes reduce or hinder a transmission of the light of the wavelength.

公开(公告)号：US10274817B2

公开(公告)日：2019-04-30

申请号：US15475137

申请日：2017-03-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ching-Hung Lai ,  Chih-Chung Huang ,  Chih-Chiang Tu ,  Chung-Hung Lin ,  Chi-Ming Tsai ,  Ming-Ho Tsai

IPC: G03F1/22 ,  G03F1/36 ,  G03F7/20

Abstract: A mask includes a transparent substrate, a first pattern, a second pattern, and a sub-resolution auxiliary feature. The first pattern and the second pattern are over the transparent substrate. The first pattern has an area of 0.16 μm2 to 60000 μm2. The second pattern has an area of 0.16 μm2 to 60000 μm2. The sub-resolution auxiliary feature is over the transparent substrate and connects the first pattern and the second pattern.