METHOD AND SYSTEM FOR THINNING WAFER THEREOF
    2.
    发明申请
    METHOD AND SYSTEM FOR THINNING WAFER THEREOF 有权
    用于减少其湿度的方法和系统

    公开(公告)号:US20150024606A1

    公开(公告)日:2015-01-22

    申请号:US13944257

    申请日:2013-07-17

    Abstract: Embodiments of a method for thinning a wafer are provided. The method includes placing a wafer on a support assembly and securing an etching mask to a backside of the wafer. The etching mask covers a peripheral portion of the wafer. The method further includes performing a wet etching process on the backside of the wafer to form a thinned wafer, and the thinned wafer includes peripheral portions having a first thickness and a central portion having a second thickness smaller than the first thickness. Embodiments of system for forming the thinned wafer are also provided.

    Abstract translation: 提供了一种用于薄化晶片的方法的实施例。 该方法包括将晶片放置在支撑组件上并将蚀刻掩模固定到晶片的背面。 蚀刻掩模覆盖晶片的周边部分。 该方法还包括在晶片的背面执行湿蚀刻处理以形成薄的晶片,并且薄化的晶片包括具有第一厚度的周边部分和具有小于第一厚度的第二厚度的中心部分。 还提供了用于形成薄化晶片的系统的实施例。

Patent Agency Ranking