公开(公告)号：US10295909B2

公开(公告)日：2019-05-21

申请号：US15903879

申请日：2018-02-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Hao Wang ,  Chia-Chi Chung ,  Han-Chih Chung ,  Yu-Xiang Lin ,  Yu-Shine Lin ,  Yu-Hen Wu ,  Han Wen Hsu

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L21/687 ,  H01L33/00 ,  H01L21/02

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.

公开(公告)号：US10739682B2

公开(公告)日：2020-08-11

申请号：US16693900

申请日：2019-11-25

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Hao Wang ,  Chia-Chi Chung ,  Han-Chih Chung ,  Yu-Xiang Lin ,  Yu-Shine Lin ,  Yu-Hen Wu ,  Han Wen Hsu

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L21/68 ,  H01L21/687 ,  H01L21/02 ,  H01L33/00

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.

公开(公告)号：US20200089120A1

公开(公告)日：2020-03-19

申请号：US16693900

申请日：2019-11-25

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Hao Wang ,  Chia-Chi Chung ,  Han-Chih Chung ,  Yu-Xiang Lin ,  Yu-Shine Lin ,  Yu-Hen Wu ,  Han Wen Hsu

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L21/687 ,  H01L33/00 ,  H01L21/02 ,  H01L21/68

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.

公开(公告)号：US10509323B2

公开(公告)日：2019-12-17

申请号：US16391521

申请日：2019-04-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Hao Wang ,  Chia-Chi Chung ,  Han-Chih Chung ,  Yu-Xiang Lin ,  Yu-Shine Lin ,  Yu-Hen Wu ,  Han Wen Hsu

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L21/687 ,  H01L33/00 ,  H01L21/02 ,  H01L21/68

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.

公开(公告)号：US20190250513A1

公开(公告)日：2019-08-15

申请号：US16391521

申请日：2019-04-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Hao Wang ,  Chia-Chi Chung ,  Han-Chih Chung ,  Yu-Xiang Lin ,  Yu-Shine Lin ,  Yu-Hen Wu ,  Han Wen Hsu

IPC: G03F7/20 ,  H01L33/00 ,  H01L21/687 ,  H01L21/67 ,  H01L21/02 ,  H01L21/027 ,  H01L21/68

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.

公开(公告)号：US20190094697A1

公开(公告)日：2019-03-28

申请号：US15903879

申请日：2018-02-23

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ying-Hao Wang ,  Chia-Chi Chung ,  Han-Chih Chung ,  Yu-Xiang Lin ,  Yu-Shine Lin ,  Yu-Hen Wu ,  Han Wen Hsu

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L21/02 ,  H01L21/687 ,  H01L33/00

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.