METAL LINE DESIGN FOR HYBRID-BONDING APPLICATION

    公开(公告)号:US20180269161A1

    公开(公告)日:2018-09-20

    申请号:US15462078

    申请日:2017-03-17

    Abstract: A hybrid-bonding structure and a method for forming a hybrid-bonding structure are provided. The hybrid-bonding structure includes a first semiconductor substrate, a first conductive line and a first dielectric dummy pattern. The first conductive line is formed over the first semiconductor substrate. A surface of the first conductive line is configured to hybrid-bond with a second conductive line over a second semiconductor substrate. The first dielectric dummy pattern is formed over the first semiconductor substrate and embedded in the first conductive line.

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