公开(公告)号：US20220028983A1

公开(公告)日：2022-01-27

申请号：US16935686

申请日：2020-07-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ting Fang ,  Chung-Hao Cai ,  Ruei-Ping Lin ,  Jason Yao ,  Chen-Ming Lee ,  Fu-Kai Yang ,  Mei-Yun Wang

IPC: H01L29/40 ,  H01L21/311 ,  H01L21/321 ,  H01L29/417 ,  H01L29/78 ,  H01L29/06

Abstract: A method according to the present disclosure includes receiving a workpiece that includes a gate structure, a first gate spacer feature, a second gate spacer feature, a gate-top dielectric feature over the gate structure, the first gate spacer feature and the second gate spacer feature, a first source/drain feature over a first source/drain region, a second source/drain feature over a second source/drain region, a first dielectric layer over the first source/drain feature, and a second dielectric layer over the second source/drain feature. The method further includes replacing a top portion of the first dielectric layer with a first hard mask layer, forming a second hard mask layer over the first hard mask layer while the second dielectric layer is exposed, etching the second dielectric layer to form a source/drain contact opening and to expose the second source/drain feature, and forming a source/drain contact over the second source/drain feature.