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公开(公告)号：US09026957B2
公开(公告)日：2015-05-05
申请号：US14188953
申请日：2014-02-25
Inventor： Chia-Chu Liu , Kuei Shun Chen , Chih-Yang Yeh , Te-Chih Huang , Wen-Hao Liu , Ying-Chou Cheng , Boren Luo , Tsong-Hua Ou , Yu-Po Tang , Wen-Chun Huang , Ru-Gun Liu , Shu-Chen Lu , Yu Lun Liu , Yao-Ching Ku , Tsai-Sheng Gau
CPC classification number: G06F17/5068 , G03F1/00 , G03F1/68
Abstract: An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is used to generate a gradating pattern. A photomask is formed having the gradating pattern.
Abstract translation: 提供了一种确定光掩模图案的前馈方法的实施例。 该方法包括提供与集成电路装置相关联的设计数据。 基于设计数据预测用于制造集成电路器件的涂层的厚度。 该预测用于生成渐变图案。 形成具有渐变图案的光掩模。
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公开(公告)号：US20140170537A1
公开(公告)日：2014-06-19
申请号：US14188953
申请日：2014-02-25
Inventor： George Liu , Kuei Shun Chen , Chih-Yang Yeh , Te-Chih Huang , Wen-Hao Liu , Ying-Chou Cheng , Boren Luo , Tsong-Hua Ou , Yu-Po Tang , Wen-Chun Huang , Ru-Gun Liu , Shu-Chen Lu , Yu Lun Liu , Yao-Ching Ku , Tsai-Sheng Gau
CPC classification number: G06F17/5068 , G03F1/00 , G03F1/68
Abstract: An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is used to generate a gradating pattern. A photomask is formed having the gradating pattern.
Abstract translation: 提供了一种确定光掩模图案的前馈方法的实施例。 该方法包括提供与集成电路装置相关联的设计数据。 基于设计数据预测用于制造集成电路器件的涂层的厚度。 该预测用于生成渐变图案。 形成具有渐变图案的光掩模。
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