公开(公告)号：US5376620A

公开(公告)日：1994-12-27

申请号：US41998

申请日：1993-04-02

申请人： Takaaki Abe ,  Yuji Akiyoshi ,  Hiroshi Shiraishi ,  Ikuo Shiraishi ,  Mikio Kojima ,  Takashi Hayama ,  Takaaki Kuwata

发明人： Takaaki Abe ,  Yuji Akiyoshi ,  Hiroshi Shiraishi ,  Ikuo Shiraishi ,  Mikio Kojima ,  Takashi Hayama ,  Takaaki Kuwata

IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/34 ,  C07D251/38 ,  C07D401/12

CPC分类号： C07D401/12 ,  A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/34 ,  C07D251/38

摘要： Disclosed are a sulfonamide compound represented by the following formula (I): ##STR1## wherein Y represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group, a cyano-lower alkyl group or --C(CH.sub.3).sub.2 (OR.sup.1) where R.sup.1 represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; Q represents a substituted or unsubstituted pyridyl group or --NR.sup.2 R.sup.3 where R.sup.2 represents a hydrogen atom, a lower alkyl group, a lower alkoxy group; and R.sup.3 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a phenyl group or a benzyl group; or R.sup.2 and R.sup.3 may be combined to form a cycloamino group; X represents an oxygen atom or a sulfur atom; and Z represents a nitrogen atom or --CH.dbd. group;processes for preparing the same and a herbicide containing the same as an active ingredient(s).

摘要翻译： 公开了由下式（I）表示的磺酰胺化合物：其中Y表示低级烷基，低级烯基，低级炔基，卤代低级烷基，氰基 - 低级烷基 基团或-C（CH 3）2（OR 1），其中R 1表示低级烷基，低级烯基，低级炔基，卤代低级烷基或氰基 - 低级烷基; Q表示取代或未取代的吡啶基或-NR2R3，其中R2表示氢原子，低级烷基，低级烷氧基; R3表示低级烷基，低级烯基，低级炔基，苯基或苄基。 或者R 2和R 3可以组合形成环氨基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团; 其制备方法和含有其作为活性成分的除草剂。

公开(公告)号：US5529977A

公开(公告)日：1996-06-25

申请号：US326830

申请日：1994-10-21

申请人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama

发明人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama

IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/30 ,  C07D251/38 ,  C07D521/00 ,  C07D251/34 ,  C07D251/16 ,  C07D403/12

CPC分类号： C07D231/12 ,  A01N43/54 ,  A01N43/66 ,  C07D233/56 ,  C07D239/60 ,  C07D249/08 ,  C07D251/30 ,  C07D251/38

摘要： Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 has the same meaning as defined above, hydroxy group, OK, a lower alkoxy group which may have a substituent, a lower alkenyloxy group, a lower alkynyloxy group, a cycloalkoxy group which may have a substituent, a phenoxy group, a benzyloxy group, a lower alkylthio group, a phenylthio group or an alkylsulfonylamino group when Z is --CH.dbd. group; R.sup.5 represents a lower alkoxy group; R.sup.6 represents a lower alkoxy group or a lower alkyl group; X represents oxygen atom or sulfur atom; and Z represents nitrogen atom or --CH.dbd. group.processes for preparing the same and a herbicide containing the same as an active ingredient(s).

摘要翻译： 公开了由下式（I）表示的嘧啶或三嗪化合物：其中R 1表示氰基，卤素原子，羟基或-O-R 7，其中R 7表示低级烷基，低级烯基 基，低级炔基，卤代低级烷基或氰基 - 低级烷基; R2表示氢原子或低级烷基; R3表示氢原子或低级烷基; R 4表示当Z为氮原子时，可以具有取代基，羟基，低级烷氧基或苄氧基的低级烷基或苯基，-NHSO 2 -R 8， 或1-咪唑基，-NHSO 2 -R 8，其中R8具有与上述相同的含义，羟基，OK，可具有取代基的低级烷氧基，低级链烯氧基，低级炔氧基，环烷氧基 当Z为-CH =基团时，可具有取代基，苯氧基，苄氧基，低级烷硫基，苯硫基或烷基磺酰基氨基; R5代表低级烷氧基; R6代表低级烷氧基或低级烷基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团。 其制备方法和含有其作为活性成分的除草剂。

公开(公告)号：US5387575A

公开(公告)日：1995-02-07

申请号：US894557

申请日：1992-06-05

申请人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama ,  Shohei Fukuda

发明人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama ,  Shohei Fukuda

IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/30 ,  C07D251/38 ,  C07D521/00 ,  C07D239/52 ,  A01N73/54

CPC分类号： C07D231/12 ,  A01N43/54 ,  A01N43/66 ,  C07D233/56 ,  C07D239/60 ,  C07D249/08 ,  C07D251/30 ,  C07D251/38

摘要： Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 has the same meaning as defined above, hydroxy group, OK, a lower alkoxy group which may have a substituent, a lower alkenyloxy group, a lower alkynyloxy group, a cycloalkoxy group which may have a substituent, a phenoxy group, a benzyloxy group, a lower alkylthio group, a phenylthio group or an alkylsulfonylamino group when Z is --CH.dbd. group; R.sup.5 represents a lower alkoxy group; R.sup.6 represents a lower alkoxy group or a lower alkyl group; X represents oxygen atom or sulfur atom; and Z represents nitrogen atom or --CH.dbd. group. processes for preparing the same and a herbicide containing the same as an active ingredient(s).

摘要翻译： 公开了由下式（I）表示的嘧啶或三嗪化合物：其中R 7表示低级烷基，低级烯基，低级炔基，卤代烷基， 低级烷基或氰基 - 低级烷基; R2代表氢原子或低级烷基; R3表示氢原子或低级烷基; R 4表示当Z为氮原子时，可以具有取代基，羟基，低级烷氧基或苄氧基的低级烷基或苯基，-NHSO 2 -R 8， 或1-咪唑基，-NHSO 2 -R 8，其中R8具有与上述相同的含义，羟基，OK，可具有取代基的低级烷氧基，低级链烯氧基，低级炔氧基，环烷氧基 当Z为-CH =基团时，可具有取代基，苯氧基，苄氧基，低级烷硫基，苯硫基或烷基磺酰基氨基; R5代表低级烷氧基; R6代表低级烷氧基或低级烷基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团。 其制备方法和含有其作为活性成分的除草剂。

公开(公告)号：US5389601A

公开(公告)日：1995-02-14

申请号：US93859

申请日：1993-07-20

申请人： Takaaki Abe ,  Yuji Akiyoshi ,  Hiroshi Shiraishi ,  Ikuo Shiraishi ,  Takashi Hayama

发明人： Takaaki Abe ,  Yuji Akiyoshi ,  Hiroshi Shiraishi ,  Ikuo Shiraishi ,  Takashi Hayama

IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/30 ,  C07D251/34 ,  C07D251/38

CPC分类号： A01N43/66 ,  A01N43/54 ,  C07D239/60 ,  C07D251/30 ,  C07D251/38

摘要： Disclosed are a 3-alkoxy-N-cyclolalkylsulfonylalkanoic amide compound represented by the formula (I): ##STR1## wherein R represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; X represents an oxygen atom or a sulfur atom; Z represents a --CH.dbd. group or a nitrogen atom; and n represents an integer of 2 to 9,a process for preparing the same and a herbicide containing the same as an active ingredient(s).

摘要翻译： 公开了由式（I）表示的3-烷氧基-N-环烷基磺酰基链烷酰胺化合物：其中R表示低级烷基，低级烯基，低级炔基，卤代低级烷基 或氰基 - 低级烷基; X表示氧原子或硫原子; Z表示-CH =基团或氮原子; n表示2〜9的整数，其制备方法和含有活性成分的除草剂。

公开(公告)号：US06879366B2

公开(公告)日：2005-04-12

申请号：US09801900

申请日：2001-03-09

申请人： Yutaka Takeishi ,  Ikuo Shiraishi

发明人： Yutaka Takeishi ,  Ikuo Shiraishi

IPC分类号： G02F1/1333 ,  G02F1/13 ,  G02F1/133 ,  G02F1/1345 ,  G09F9/00 ,  H05K1/18

CPC分类号： G02F1/13452 ,  G02F1/13306 ,  G02F1/133308 ,  H05K1/182 ,  H05K1/189

摘要： A signal processing circuit substrate is formed with a through-hole. A device having a variable value and including an value adjustment portion through which the variable value is adjusted is mounted on a first surface of the signal processing circuit substrate. The signal processing circuit substrate includes a flexible arch-shaped member having a height relative to the first surface of the signal processing circuit substrate. The device is electrically and mechanically fixed onto a lower surface of the member in a floating condition above the signal processing circuit substrate such that the value adjustment portion is in alignment with the through-hole so as to allow the value adjustment portion to be adjusted through the through-hole. The member is fixed at opposite edges onto the first surface of the signal processing circuit substrate.

摘要翻译： 信号处理电路基板形成有通孔。 具有可变值并且包括调整可变值的值调节部分的装置安装在信号处理电路基板的第一表面上。 信号处理电路基板包括具有相对于信号处理电路基板的第一表面的高度的柔性拱形部件。 该装置在信号处理电路基板上方的浮动状态下以电气和机械方式电气和机械地固定在构件的下表面上，使得值调节部分与通孔对准，以便允许调整部分通过 通孔。 该构件在相对边缘固定在信号处理电路基板的第一表面上。

公开(公告)号：US5270279A

公开(公告)日：1993-12-14

申请号：US915715

申请日：1992-07-28

申请人： Ikuo Shiraishi ,  Yasuhiko Ninagawa ,  Kazuhiko Tsuji ,  Yoshihiro Matsufuji

发明人： Ikuo Shiraishi ,  Yasuhiko Ninagawa ,  Kazuhiko Tsuji ,  Yoshihiro Matsufuji

IPC分类号： B01D53/60 ,  B01D53/74 ,  B01J20/20 ,  C01B31/08 ,  C01B31/10 ,  C01B31/14 ,  C10L5/00 ,  C10L10/00 ,  C10L10/08 ,  C10L10/14 ,  C01B17/60 ,  B01D53/34

CPC分类号： C01B31/14 ,  B01D53/60 ,  B01J20/20 ,  C01B31/10

摘要： This invention relates to a production process of formed activated coke for SOx and NOx removal which is employed in treatment systems for various flue gases and the like.The formed activated coke for SOx and NOx removal obtained in accordance with the process of this invention has excellent pressure resistance, abrasion resistance and impact strength and also superb SOx- and NOx-removing ability, so that the coke is suitable for use in moving-bed, SOx and NOx- removing systems.The formed activated coke for SOx and NOx removal can of course show excellent SOx- and NOx-removing effects when employed in conventional SOx- and NOx-removing processes and, moreover, owing to its characteristic high NOx-removing ability, is suited for the removal of NOx from low-SOx flue gas of a fluidized-bed combustion boiler or cogeneration power plant.According to the process of this invention, dried, formed activated coke prepared from coal as a raw material is reacted with SO.sub.3 gas at 100.degree.-300.degree. C., followed by heat treatment at 300.degree.-600.degree. C. in an inert atmosphere.

摘要翻译： PCT No.PCT / JP91 / 01715 Sec。 371日期：1992年7月28日 102（e）日期1992年7月28日PCT 1991年12月16日PCT PCT。 出版物WO92 / 11202 本发明涉及用于各种烟气等的处理系统中用于SOx和NOx去除的成形活性焦炭的生产方法。 根据本发明方法获得的形成的用于SOx和NOx去除的活化焦炭具有优异的耐压性，耐磨性和冲击强度，并且还具有极好的SOx和NOx去除能力，使得焦炭适用于移动 - 床，SOx和NOx去除系统。 用于SOx和NOx去除的成型活性焦炭当用于常规的SOx和NOx去除方法中当然可以显示出优异的SOx和NOx去除效果，此外，由于其特有的高NOx去除能力，适用于 从流化床燃烧锅炉或热电联产电厂的低SO x烟道气中除去NOx。 根据本发明的方法，将以煤为原料的干燥形成的活性焦炭在100-300℃与SO3气体反应，然后在惰性气氛中于300-600℃下热处理 。