公开(公告)号：US20100202181A1

公开(公告)日：2010-08-12

申请号：US12561531

申请日：2009-09-17

申请人： Takaki HASHIMOTO ,  Hidefumi Mukai ,  Yasunobu Kai ,  Toshiya Kotani

发明人： Takaki HASHIMOTO ,  Hidefumi Mukai ,  Yasunobu Kai ,  Toshiya Kotani

IPC分类号： G11C5/06

CPC分类号： G11C5/063 ,  G11C5/025

摘要： A semiconductor memory device includes a semiconductor substrate on which memory cells are formed. Interconnects are arranged along a first direction above the semiconductor substrate, and have regular intervals along a second direction perpendicular to the first direction. Interconnect contacts connect the interconnects and the semiconductor substrate, are arranged on three or more rows. The center of each of two of the interconnect contacts which are connected to the interconnects adjacent in the second direction deviate from each other along the first direction.

摘要翻译： 半导体存储器件包括形成有存储单元的半导体衬底。 互连件沿着半导体衬底上方的第一方向布置，并且沿着垂直于第一方向的第二方向具有规则的间隔。 互连触点连接互连和半导体衬底，布置在三行或更多行上。 连接到在第二方向相邻的互连件的两个互连触点中的每一个的中心沿着第一方向彼此偏离。

公开(公告)号：US20090220894A1

公开(公告)日：2009-09-03

申请号：US12390157

申请日：2009-02-20

申请人： Kazuya FUKUHARA ,  Takaki HASHIMOTO ,  Kazuyuki MASUKAWA ,  Yasunobu KAI

发明人： Kazuya FUKUHARA ,  Takaki HASHIMOTO ,  Kazuyuki MASUKAWA ,  Yasunobu KAI

IPC分类号： G03F7/20

CPC分类号： G03F1/00 ,  G03F1/36 ,  G03F7/70433

摘要： A semiconductor device manufacturing method includes applying illumination light to a photomask, and projecting diffracted light components from the photomask via a projection optical system to form a photoresist pattern on a substrate. The photomask includes a plurality of opening patterns which are arranged on each of a plurality of parallel lines at regular second intervals in a second direction and which have regular first intervals in a first direction perpendicular to the second direction. The plurality of opening patterns arranged on the adjacent ones of the plurality of parallel lines are displaced from each other half the second interval in the second direction. Moreover, the dimensions of the plurality of opening patterns and the complex amplitude transmittance of nontransparent region in the photomask are set so that three of the diffracted light components passing through the pupil of the projection optical system have equal amplitude.

摘要翻译： 一种半导体器件制造方法，包括将照明光施加到光掩模，以及经由投影光学系统从光掩模投射衍射光成分，以在基板上形成光刻胶图案。 光掩模包括多个开口图案，其以在第二方向上的规则的第二间隔布置在多条平行线中的每一条上，并且在垂直于第二方向的第一方向上具有规则的第一间隔。 布置在多条平行线上相邻的多个平行线上的多个开口图案在第二方向上相互偏移第二间隔的一半。 此外，设置光掩模中的多个开口图案的尺寸和非透明区域的复振幅透射率，使得通过投影光学系统的光瞳的三个衍射光分量具有相等的幅度。