公开(公告)号：US4902206A

公开(公告)日：1990-02-20

申请号：US251462

申请日：1988-09-30

申请人： Takao Nakazawa ,  Jisaburo Naito ,  Hiroyuki Horiki ,  Tutomu Kawashima

发明人： Takao Nakazawa ,  Jisaburo Naito ,  Hiroyuki Horiki ,  Tutomu Kawashima

IPC分类号： F04B43/113

CPC分类号： F04B43/1136

摘要： A bellows pump which is disclosed herein has two bellows made of a plastic material and provided with liquid inlet and outlet ports for transferring a liquid by expanding and contracting the bellows. The bellows pump comprises cylinder cases in each of which the bellows is vertically expandably and contractably contained and mounted at its access port side to a ceiling of said cylinder cases, gas pumping means for alternately feeding a compressed gas from a lower end thereof into the cylinder cases, a pair of rods passed through bottoms of the cylinder cases and fixed to the lower ends of the bellows, and adapted to be moved in response to the expansion and contraction of the bellows, and actuating means adapted to be operated in response to the up and down movement of the rods.

摘要翻译： 本文公开的波纹管泵具有由塑料材料制成的两个波纹管，并且设有用于通过膨胀和收缩波纹管传送液体的液体入口和出口。 波纹管泵包括气缸壳体，其中波纹管在其入口侧垂直地可膨胀和收缩地容纳并安装到所述气缸壳体的天花板上，气体泵送装置用于将压缩气体从其下端交替地供给到气缸 情况下，一对杆穿过气缸壳体的底部并固定到波纹管的下端，并且适于响应于波纹管的膨胀和收缩而移动，以及适于响应于 杆的上下运动。

公开(公告)号：US5487398A

公开(公告)日：1996-01-30

申请号：US262602

申请日：1994-06-20

申请人： Tadahiro Ohmi ,  Naomichi Yonekawa ,  Hiroyuki Horiki ,  Toshimitsu Kaji ,  Fumitomo Kunimoto ,  Takeo Tamaki

发明人： Tadahiro Ohmi ,  Naomichi Yonekawa ,  Hiroyuki Horiki ,  Toshimitsu Kaji ,  Fumitomo Kunimoto ,  Takeo Tamaki

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306 ,  B08B3/04

CPC分类号： H01L21/02052 ,  H01L21/67051 ,  Y10S134/902

摘要： To provide a cleaning method and a cleaning apparatus for decreasing the total cost by producing high-performance semiconductor using silicon wafers with cleaner surface, decreasing the semiconductor production cost, decreasing the consumption of chemical solutions and the cleaning time by using a new cleaning method and apparatus, simplifying the recovery of waste liquids, and decreasing equipment investment.A cleaning method having a plurality of chemical-solution-cleaning processes characterized by performing a chemical-solution-cleaning process for continuously feeding a chemical solution to the surface of an object to be cleaned from an upper part of the object surface by horizontally setting the object in a cleaning bath, closing the bath, and then rotating the object and an ultrapure-water-cleaning process for feeding ultrapure water in order for each chemical solution in the same cleaning bath; and thereafter drying the object after cleaning it.

摘要翻译： 为了提供清洁方法和清洁装置，通过使用具有更清洁表面的硅晶片生产高性能半导体来降低总成本，降低半导体制造成本，通过使用新的清洁方法减少化学溶液的消耗和清洁时间，以及 设备，简化废液回收，减少设备投资。 一种具有多个化学溶液清洗方法的清洗方法，其特征在于进行化学溶液清洗处理，用于通过水平设定所述化学溶液清洗工序，从所述物体表面的上部连续地供给化学溶液到待清洁物体的表面 在清洁浴中，关闭浴缸，然后旋转物体，并进行超纯水清洗过程，以提供超纯水，以使每个化学溶液在同一个清洗槽中; 然后在清洁物体之后干燥物体。