公开(公告)号：US20100140512A1

公开(公告)日：2010-06-10

申请号：US12603872

申请日：2009-10-22

申请人： Takashi SUGANUMA ,  Masato MORIYA ,  Tamotsu ABE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

发明人： Takashi SUGANUMA ,  Masato MORIYA ,  Tamotsu ABE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC分类号： G21K5/00

CPC分类号： G03F7/70891 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70591 ,  G03F7/7085 ,  H05G2/005

摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.

摘要翻译： 可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。 该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。

公开(公告)号：US20110180734A1

公开(公告)日：2011-07-28

申请号：US13081899

申请日：2011-04-07

申请人： Masato MORIYA ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Hiroshi SOMEYA ,  Takayuki YABU ,  Akira SUMITANI ,  Osamu WAKABAYASHI

发明人： Masato MORIYA ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Hiroshi SOMEYA ,  Takayuki YABU ,  Akira SUMITANI ,  Osamu WAKABAYASHI

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。