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公开(公告)号:US06908906B2
公开(公告)日:2005-06-21
申请号:US10637300
申请日:2003-08-07
IPC分类号: A61K31/7068 , A61P35/00 , C07H19/06
CPC分类号: C07H19/06
摘要: The present invention provides crystalline forms and compositions thereof, of a pyrimidine nucleoside derivative of formula (I) having anti-tumour activity, wherein formula (I) is:
摘要翻译: 本发明提供具有抗肿瘤活性的式(I)嘧啶核苷衍生物的结晶形式及其组合物,其中式(I)为:
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公开(公告)号:US06156382A
公开(公告)日:2000-12-05
申请号:US857658
申请日:1997-05-16
IPC分类号: C23C16/08 , C23C16/02 , C23C16/14 , H01L21/28 , H01L21/285 , H01L21/768
CPC分类号: H01L21/76838 , C23C16/02 , C23C16/0281 , C23C16/14 , H01L21/28556
摘要: A multiple step chemical vapor deposition process for depositing a tungsten layer on a substrate. A first step of the deposition process includes a nucleation step in which WF.sub.6 and SiH.sub.4 are introduced into a deposition chamber. Next, the flow of WF.sub.6 and SiH.sub.4 are stopped and diborane is introduced into the chamber for between 5-25 seconds. Finally, during a bulk deposition step, the WF.sub.6 is reintroduced into the chamber along with H.sub.2 and B.sub.2 H.sub.6 flows to deposit a tungsten layer on the substrate. In a preferred embodiment, the bulk deposition step also introduces nitrogen into the process gas.
摘要翻译: 用于在基底上沉积钨层的多步化学气相沉积工艺。 沉积工艺的第一步包括将WF 6和SiH 4引入沉积室的成核步骤。 接下来,停止WF6和SiH4的流动,并将乙硼烷引入室中5-25秒。 最后,在大量沉积步骤期间,将WF6与H 2和B 2 H 6流一起重新引入室中,以在衬底上沉积钨层。 在优选的实施方案中,本体沉积步骤还将氮气引入工艺气体中。
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