Image display device
    1.
    发明申请
    Image display device 审中-公开
    图像显示装置

    公开(公告)号:US20060098136A1

    公开(公告)日:2006-05-11

    申请号:US11311154

    申请日:2005-12-20

    IPC分类号: G02F1/1333

    摘要: A rectangular rear substrate which constitutes an envelope of an image display device is fitted with a reinforcing frame which reinforces the envelope. The reinforcing frame has a pair of first frame portions individually extending substantially parallel to long sides of the rear substrate and a pair of second frame portions extending substantially parallel to short sides of the rear substrate and connecting the first frame portions. Each of the second frame portions meets a relationship ΔH/H=13 to 33%, where H is a length of each long side of the rear substrate and ΔH is a distance between each short side of the rear substrate and each of the second frame portions.

    摘要翻译: 构成图像显示装置的封套的矩形后基板装配有加固信封的加强框架。 加强框架具有大致平行于后基板的长边大致平行的一对第一框架部分和大致平行于后基板的短边延伸并连接第一框架部分的一对第二框架部分。 每个第二框架部分满足DeltaH / H = 13至33%的关系,其中H是后基板的每个长边的长度,DeltaH是后基板的每个短边与每个第二框架之间的距离 部分。

    Polishing head and polishing apparatus

    公开(公告)号:US20050124269A1

    公开(公告)日:2005-06-09

    申请号:US11001047

    申请日:2004-12-02

    CPC分类号: B24B37/30

    摘要: A polishing head includes a head body, a first recessed portion formed in the lower surface of the head body, a support plate which can be moved up and down in the first recessed portion, a first film-like member in which a first space is formed between the upper surface of the support plate and the head body, a second recessed portion formed in a lower surface of the support plate, a second film-like member, in which a second space is formed between the second film-like member and the support plate, and which holds a wafer on the lower, a communicating hole which is formed in the support plate to communicate the first space with the second space, and a gas supply device which increases pressures in the first and second spaces with a fluid to equal pressures to bring the object into press contact with the polishing pad.

    Retainer and wafer polishing apparatus
    3.
    发明授权
    Retainer and wafer polishing apparatus 失效
    保持器和晶片抛光装置

    公开(公告)号:US07094133B2

    公开(公告)日:2006-08-22

    申请号:US10985048

    申请日:2004-11-10

    IPC分类号: B24B29/00

    CPC分类号: B24B37/32

    摘要: When a wafer is pressed on a rotating polishing pad and its surface is polished, a retainer retains the periphery of the wafer to prevent the wafer from being detached from the polishing pad. The retainer includes a first ring which surrounds the wafer and contacts the polishing pad and a second ring which is provided outside the first ring in the radial direction of the wafer and contacts the polishing pad. The second ring has wear resistance that is higher than that of the first ring.

    摘要翻译: 当晶片被压在旋转的抛光垫上并且其表面被抛光时,保持器保持晶片的周边以防止晶片与抛光垫分离。 保持器包括围绕晶片并接触抛光垫的第一环和在晶片的径向方向上设置在第一环的外侧并与抛光垫接触的第二环。 第二环的耐磨性高于第一环的耐磨性。

    Retainer and wafer polishing apparatus

    公开(公告)号:US20060099893A1

    公开(公告)日:2006-05-11

    申请号:US10985048

    申请日:2004-11-10

    IPC分类号: B24B29/00

    CPC分类号: B24B37/32

    摘要: When a wafer is pressed on a rotating polishing pad and its surface is polished, a retainer retains the periphery of the wafer to prevent the wafer from being detached from the polishing pad. The retainer includes a first ring which surrounds the wafer and contacts the polishing pad and a second ring which is provided outside the first ring in the radial direction of the wafer and contacts the polishing pad. The second ring has wear resistance that is higher than that of the first ring.

    Polishing head and polishing apparatus
    5.
    发明授权
    Polishing head and polishing apparatus 有权
    抛光头和抛光装置

    公开(公告)号:US06976908B2

    公开(公告)日:2005-12-20

    申请号:US11001047

    申请日:2004-12-02

    CPC分类号: B24B37/30

    摘要: A polishing head includes a head body, a first recessed portion formed in the lower surface of the head body, a support plate which can be moved up and down in the first recessed portion, a first film-like member in which a first space is formed between the upper surface of the support plate and the head body, a second recessed portion formed in a lower surface of the support plate, a second film-like member, in which a second space is formed between the second film-like member and the support plate, and which holds a wafer on the lower, a communicating hole which is formed in the support plate to communicate the first space with the second space, and a gas supply device which increases pressures in the first and second spaces with a fluid to equal pressures to bring the object into press contact with the polishing pad.

    摘要翻译: 抛光头包括头体,形成在头本体的下表面中的第一凹部,可在第一凹部中上下移动的支撑板,第一空间为第一空间 形成在支撑板的上表面和头本体之间,形成在支撑板的下表面中的第二凹部,第二膜状构件,在第二膜状构件和第二膜状构件之间形成有第二空间, 支撑板,并且其在下部保持晶片;形成在支撑板中以使第一空间与第二空间连通的连通孔;以及气体供应装置,其利用流体增加第一和第二空间中的压力 以使物体与抛光垫压力接触的相等压力。

    Viscoelasticity measuring device
    6.
    发明授权
    Viscoelasticity measuring device 失效
    粘弹性测量装置

    公开(公告)号:US06668662B2

    公开(公告)日:2003-12-30

    申请号:US10055893

    申请日:2002-01-28

    IPC分类号: G01D116

    摘要: The invention provides a viscoelasticity measuring device which is capable of imparting a desired displacement profile to a sample under conditions close to that of actual use. The viscoelasticity measuring device is composed of a presser to impart displacements to a sample; a rod to convey the displacements to the presser; a control jig kept in contact with an upper end portion of the rod and adapted to move to impart a desired displacement to the rod; a load cell which detects a load exerted to the sample to detect a stress generated in the sample; and a displacement sensor to detect the displacement in the sample; the displacements imparted of the sample being defined in accordance with a configuration and a moving speed of the control jig.

    摘要翻译: 本发明提供了一种粘弹性测量装置,该装置能够在接近于实际使用的条件下将样品赋予期望的位移曲线。 粘弹性测量装置由将压力赋予样品的压头构成; 用于将位移传送到压脚的杆; 控制夹具与杆的上端部分保持接触并且适于移动以赋予杆所需的位移; 负载传感器,其检测施加到样品的负载以检测在样品中产生的应力; 以及位移传感器,以检测样品中的位移; 根据控制夹具的结构和移动速度来定义样品的位移。

    Electrostatic actuator having urging members with varying rigidities
    7.
    发明授权
    Electrostatic actuator having urging members with varying rigidities 有权
    静电致动器具有具有变化刚性的推动构件

    公开(公告)号:US08866363B2

    公开(公告)日:2014-10-21

    申请号:US13421142

    申请日:2012-03-15

    IPC分类号: H02N1/00 B81B3/00

    摘要: According to one embodiment, an electrostatic actuator includes a substrate, an electrode unit, a film body unit, and an urging unit. The electrode unit is provided on the substrate. The film body unit is provided to oppose the electrode unit and is conductive. The urging unit is configured to support the film body unit and includes a connection unit connected to the substrate and an elastic unit provided between the connection unit and the film body unit. A contacting state and a separated state are possible for the electrode unit and the film body unit according to a voltage applied to the electrode unit. The elastic unit has a branch portion between one end of the elastic unit connected to the connection unit and multiple one other ends of the elastic unit connected to the film body unit.

    摘要翻译: 根据一个实施例,静电致动器包括基板,电极单元,膜体单元和推压单元。 电极单元设置在基板上。 膜体单元设置成与电极单元相对并且是导电的。 推压单元被配置为支撑胶片主体单元,并且包括连接到基板的连接单元和设置在连接单元和胶片主体单元之间的弹性单元。 根据施加到电极单元的电压,电极单元和膜体单元的接触状态和分离状态是可能的。 弹性单元在连接到连接单元的弹性单元的一端和连接到胶片主体单元的弹性单元的多个另一端之间具有分支部分。

    Electrostatic actuator including a plurality of urging units with varying rigities
    8.
    发明授权
    Electrostatic actuator including a plurality of urging units with varying rigities 失效
    静电致动器包括具有不同精度的多个推动单元

    公开(公告)号:US08749113B2

    公开(公告)日:2014-06-10

    申请号:US12954806

    申请日:2010-11-26

    IPC分类号: H02N1/00 H02K5/00

    摘要: According to one embodiment, an electrostatic actuator includes an electrode unit, a conductive film body unit, a plurality of first urging units, and a plurality of second urging units. The electrode unit is provided on a substrate. The conductive film body unit is provided opposing the electrode unit. The plurality of first urging units are provided at a first circumferential edge portion of the conductive film body unit to support the film body unit. The plurality of second urging units are provided at a second circumferential edge portion opposing the first circumferential edge portion to support the film body unit. The electrode unit and the conductive film body unit contact or separate by the electrode unit being set to a voltage having a prescribed value. The plurality of first urging units have mutually different rigidities, and the plurality of second urging units have mutually different rigidities.

    摘要翻译: 根据一个实施例,静电致动器包括电极单元,导电膜主体单元,多个第一推动单元和多个第二推动单元。 电极单元设置在基板上。 导电膜体单元设置成与电极单元相对。 多个第一推动单元设置在导电膜主体单元的第一圆周边缘部分处以支撑胶片主体单元。 多个第二推动单元设置在与第一周缘部相对的第二周缘部,以支撑胶片主体单元。 由电极单元接触或分离的电极单元和导电膜主体单元被设定为具有规定值的电压。 多个第一推动单元具有相互不同的刚性,并且多个第二推动单元具有相互不同的刚性。