公开(公告)号：US06870709B2

公开(公告)日：2005-03-22

申请号：US10101009

申请日：2002-03-19

申请人： Takeaki Shimanouchi ,  Ryousuke Koishi ,  Takahiro Imamura

发明人： Takeaki Shimanouchi ,  Ryousuke Koishi ,  Takahiro Imamura

IPC分类号： G11B5/54 ,  G11B5/60 ,  G11B21/21 ,  G11B5/56

CPC分类号： G11B5/54 ,  G11B5/6005

摘要： A head slider includes a front rail having an air bearing surface and a step surface lower than the air bearing surface, provided on a disk faced surface in the vicinity of an air inflow end, a transducer provided in the vicinity of an air outflow end, and a groove for generating a negative pressure by expanding air once compressed by the front rail. The head slider further includes a piezoelectric actuator mounted on a head slider back surface on the opposite side of the disk faced surface excluding the vicinity of the air outflow end. By the piezoelectric actuator, the front rail and the neighboring portion are deformed in the direction toward the recording medium or away from the recording medium, and the positive pressure generated at the air bearing surface is regulated, whereby the floating amount of the head slider can be regulated.

摘要翻译： 磁头滑块包括设置在空气流入端附近的盘面上的空气轴承表面和比空气轴承表面低的台阶表面的前轨，设置在空气流出端附近的换能器， 以及用于通过由前轨压缩而膨胀的空气来产生负压的槽。 磁头滑动器还包括安装在除了空气流出端附近的磁盘面对面的相对侧的磁头滑块后表面上的压电致动器。 通过压电致动器，前轨和相邻部分在朝向记录介质的方向或远离记录介质的方向上变形，并且调节在空气轴承表面处产生的正压，由此头滑动器的浮动量 被监管。

公开(公告)号：US20090120363A1

公开(公告)日：2009-05-14

申请号：US12226616

申请日：2007-05-02

申请人： Ryousuke Koishi ,  Hiroshi Fujimoto

发明人： Ryousuke Koishi ,  Hiroshi Fujimoto

IPC分类号： C23C16/455

CPC分类号： C23C16/4401 ,  C23C16/045 ,  C23C16/45578 ,  H01J37/3244 ,  H01J37/32477

摘要： Peeling off of a deposited film formed on the outer surface of a gas supply pipe is effectively prevented, and adhesion of a deposited film which has been peeled off to the inner surface of a container or to a nozzle-sealed surface can be prevented as much as possible.A gas supply pipe 4 for plasma treatment which is inserted in a container 3 held in a plasma treatment chamber 1 to form a deposited film on the inner surface of the container 3 by the supply of a gas for plasma treatment to the inside of the container 3, wherein a supply pipe main body 5 constituting the entire gas supply pipe 4 is formed of a material having a thermal expansion coefficient of 10×10−6/° C. or less. As a result, the possibility that a deposited film formed on the outer surface of the gas supply pipe 4 is peeled off by thermal expansion or thermal shrinkage of the gas supply pipe 4 is reduced.

摘要翻译： 有效地防止了形成在气体供给管的外表面上的沉积膜的剥离，并且可以防止已经被剥离的沉积膜粘附到容器的内表面或喷嘴密封表面上 尽可能。 一种用于等离子体处理的气体供给管4，其被插入容纳在等离子体处理室1中的容器3中，以通过向容器内部供应用于等离子体处理的气体而在容器3的内表面上形成沉积膜 如图3所示，构成整个气体供给管4的供给管主体5由热膨胀系数为10×10 -6 /℃以下的材料形成。 结果，形成在气体供给管4的外表面的沉积膜被气体供给管4的热膨胀或热收缩剥离的可能性降低。

公开(公告)号：US20100319620A1

公开(公告)日：2010-12-23

申请号：US12517269

申请日：2008-05-30

申请人： Ryousuke Koishi ,  Toshiaki Gonda ,  Yoshihiro Takahashi

发明人： Ryousuke Koishi ,  Toshiaki Gonda ,  Yoshihiro Takahashi

IPC分类号： C23C16/511 ,  C23C16/00 ,  C23C16/458

CPC分类号： C23C16/045 ,  C23C16/4588 ,  C23C16/54

摘要： [Problems] An object is to provide a deposition apparatus which can drastically reduce the time of the deposition of a container despite using an existing vacuum deposition apparatus.[Means for Solving Problems] In the deposition apparatus, a rotator (14) which can be rotated on a rotation axis is provided, a plurality of deposition units are arranged toward a circumference direction on the rotator (14), and a microwave oscillator (34) is arranged on a position facing the periphery of the rotator (14). Pressure in a container (25) and a treatment chamber (24) is preliminary reduced by a vacuum apparatus while a deposition unit (15) is rotated to the container deposition position from the container supply position of a chamber body (16) of the deposition unit (15). The pressure in the container and the treatment chamber is mainly reduced after the deposition unit is set to be close to the oscillator (34) at the container deposition position. Then, the container is deposited by the microwave oscillator (34).

摘要翻译： 本发明的目的是提供一种沉积设备，尽管使用现有的真空沉积设备，其可以大大减少容器沉积的时间。 解决问题的手段在沉积装置中，设置有能够沿旋转轴旋转的旋转体（14），在旋转体（14）上朝向圆周方向配置多个沉积单元，并且配置微波振荡器 34）布置在面向旋转体（14）的周边的位置。 容器（25）和处理室（24）中的压力由真空装置预先减少，同时沉积单元（15）从沉积物的室主体（16）的容器供应位置旋转到容器沉积位置 单位（15）。 在容器沉积位置将沉积单元设置为靠近振荡器（34）之后，容器和处理室中的压力主要减小。 然后，容器通过微波振荡器（34）沉积。

公开(公告)号：US20100163367A1

公开(公告)日：2010-07-01

申请号：US12445893

申请日：2008-04-21

申请人： Ryousuke Koishi ,  Toshiaki Gonda

发明人： Ryousuke Koishi ,  Toshiaki Gonda

IPC分类号： B65G47/84

CPC分类号： B65G47/846

摘要： [Problems] To decrease the area for installing a container conveyer passage that has container hand-over devices on the way of the conveyer passage.[Means for Solution] A container conveyer device including a conveyer passage that has a container feed position d where containers are received and a container discharge position i where the containers are handed over, and for conveying the containers from the container feed position d up to the container discharge position i, the container conveyer device, further, having container hand-over positions f, h where the containers that are once taken out from the conveyer passage are returned back again to the conveyer passage on the way of the container conveyer passage. A conveyer wheel 4 includes an inner conveyer passage 9 and an outer conveyer passage 10 that rotate about a rotary shaft, and conveyer hand-over means 5, 6 that hand over the containers between the inner conveyer passage 9 and the outer conveyer passage 10, and works to return the containers back to the outer conveyer passage 10 at the hand-over position h after the containers are taken out from the inner conveyer passage 9 at the container hand-over position f.

摘要翻译： [问题]减少在输送通道的路上安装容器移交装置的容器输送通道的区域。 [解决方案]一种容器输送装置，包括具有容器进料位置d的输送通道和容器移出的容器排出位置i，并且将容器从容器进给位置d输送到 容器排放位置i，容器输送装置还具有容器移交位置f，h，其中一旦从输送通道取出的容器在容器输送通道的路径上再次返回到输送通道 。 输送轮4包括内部输送通道9和围绕旋转轴旋转的外部输送通道10以及在内部输送通道9和外部输送通道10之间移送容器的输送器切换装置5,6， 并且在容器移交位置f从容器从内部输送通道9取出容器之后，在转接位置h将作业返回到外部输送通道10。