摘要:
A metal back-attached phosphor screen comprises a metal back layer that has a high-reflectance, high-resistance layer consisting of an In-, Sn- or Bi-oxide layer. The metal back layer of the metal back-attached phosphor screen may have a laminate structure including a high-reflectance layer formed on a phosphor layer side and a high-resistance layer formed on that layer. The high-reflectance layer may be formed of Al, In, Sn or Bi. The high-resistance layer may be formed of an Al-, In-, Sn-, Bi- or Si-oxide or nitride. A high-brightness metal back-attached phosphor screen is provided that prevents the destruction or the deterioration of an electron emission element and a phosphor screen by discharging.
摘要:
A transfer film comprising a base film (11), a parting-agent layer (12), a protective film (13), and a metal film (14), the latter three being formed on the base film (11) in order, wherein the protective film (13) contains a softening agent such as a phosphate, an aliphatic monobasic acid ester, an aliphatic dibasic acid ester, or a dihydric alcohol ester. By using such a transfer film, a metal back layer is formed. Since the transfer layer of the transfer film has a surface resistivity of as high as 102-108 Ω/, the surface resistivity of the formed metal back layer is high, and discharge is suppressed.
摘要:
A transfer film comprising a base film (11), a parting-agent layer (12), a protective film (13), and a metal film (14), the latter three being formed on the base film (11) in order, wherein the protective film (13) contains a softening agent such as a phosphate, an aliphatic monobasic acid ester, an aliphatic dibasic acid ester, or a dihydric alcohol ester. By using such a transfer film, a metal back layer is formed. Since the transfer layer of the transfer film has a surface resistivity of as high as 102–108 Ω/, the surface resistivity of the formed metal back layer is high, and discharge is suppressed.
摘要:
A transfer film comprising a base film (11), a parting-agent layer (12), a protective film (13), and a metal film (14), the latter three being formed on the base film (11) in order, wherein the protective film (13) contains a softening agent such as a phosphate, an aliphatic monobasic acid ester, an aliphatic dibasic acid ester, or a dihydric alcohol ester. By using such a transfer film, a metal back layer is formed. Since the transfer layer of the transfer film has a surface resistivity of as high as 102-108 Ω/, the surface resistivity of the formed metal back layer is high, and discharge is suppressed.