-
公开(公告)号：US07067691B2
公开(公告)日：2006-06-27
申请号：US11016770
申请日：2004-12-21
CPC分类号： C07C67/08 , C07C69/653
摘要： A process for producing an α-substituted acrylic acid ester represented by the formula [1], wherein each of R1 and R2 is independently a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, includes reacting an α-substituted acrylic acid anhydride represented by the formula [7], with 1,1-bis(trifluoromethyl)-1,3-diol represented by the formula [2].
摘要翻译： 由式[1]表示的α-取代的丙烯酸酯的制备方法，其中R 1和R 2各自独立地为氢原子，甲基， 乙基，正丙基，异丙基，正丁基，仲丁基，叔丁基，氟甲基，二氟甲基，三氟甲基或全氟乙基，包括使由α-取代的丙烯酸酐 式[7]与由式[2]表示的1,1-双（三氟甲基）-1,3-二醇组成。
-
公开(公告)号：US20050165249A1
公开(公告)日：2005-07-28
申请号：US11016770
申请日：2004-12-21
CPC分类号： C07C67/08 , C07C69/653
摘要： A process for producing an α-substituted acrylic acid ester represented by the formula [1], wherein each of R1 and R2 is independently a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, includes reacting an α-substituted acrylic acid anhydride represented by the formula [7], with 1,1-bis(trifluoromethyl)-1,3-diol represented by the formula [2].
摘要翻译： 由式[1]表示的α-取代的丙烯酸酯的制备方法，其中R 1和R 2各自独立地为氢原子，甲基， 乙基，正丙基，异丙基，正丁基，仲丁基，叔丁基，氟甲基，二氟甲基，三氟甲基或全氟乙基，包括使由α-取代的丙烯酸酐 式[7]与由式[2]表示的1,1-双（三氟甲基）-1,3-二醇组成。
-
3.发明授权Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom 失效含有六氟甲醇基的可聚合的丙烯酸酯化合物和由其制备的聚合物公开(公告)号：US07750178B2
公开(公告)日：2010-07-06
申请号：US10563961
申请日：2004-02-05
申请人： Satoru Miyazawa , Satoru Kobayashi , Takeo Komata , Kei Matsunaga
发明人： Satoru Miyazawa , Satoru Kobayashi , Takeo Komata , Kei Matsunaga
IPC分类号： C07C69/52
CPC分类号： C08F20/28 , C07C69/653
摘要： The present invention relates to a polymerizable acrylate compound represented by the general formula (1): (in the formula, R1 represents a hydrogen atom, halogen atom, hydrocarbon group or fluorine-containing alkyl group, R2 and R3 may be different or identical, and each of them independently is a hydrogen atom, fluorine atom, hydrocarbon group optionally branched, fluorine-containing alkyl group, aromatic group, or cyclic structure containing an aliphatic group and may contain oxygen or carbonyl bond) and a polymer compound obtained by using the same.
摘要翻译： 本发明涉及由通式（1）表示的可聚合丙烯酸酯化合物：（式中，R1表示氢原子，卤素原子，烃基或含氟烷基，R2和R3可以不同或相同， 并且它们各自独立地为氢原子，氟原子，任选支化的烃基，含氟烷基，芳族基团或含有脂族基团的环状结构，并且可以含有氧或羰基键）和通过使用 相同。
-
4.发明申请Novel polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom 失效含有六氟甲醇基的新型可聚合丙烯酸酯化合物和由其制备的聚合物公开(公告)号：US20060217507A1
公开(公告)日：2006-09-28
申请号：US10563961
申请日：2004-02-05
申请人： Satoru Miyazawa , Satoru Kobayashi , Takeo Komata , Kei Matsunaga
发明人： Satoru Miyazawa , Satoru Kobayashi , Takeo Komata , Kei Matsunaga
IPC分类号： C08F214/18 , C07C69/52
CPC分类号： C08F20/28 , C07C69/653
摘要： The present invention relates to a polymerizable acrylate compound represented by the general formula (1): (in the formula, R1 represents a hydrogen atom, halogen atom, hydrocarbon group or fluorine-containing alkyl group, R2 and R3 may be different or identical, and each of them independently is a hydrogen atom, fluorine atom, hydrocarbon group optionally branched, fluorine-containing alkyl group, aromatic group, or cyclic structure containing an aliphatic group and may contain oxygen or carbonyl bond) and a polymer compound obtained by using the same.
摘要翻译： 本发明涉及由通式（1）表示的可聚合丙烯酸酯化合物：（式中，R 1表示氢原子，卤素原子，烃基或含氟烷基，R R 2和R 3可以不同或相同，它们各自独立地是氢原子，氟原子，任选支化的烃基，含氟烷基，芳族基团 ，或含有脂族基团的环状结构，并且可以含有氧或羰基键）和通过使用它们得到的高分子化合物。
-
公开(公告)号：US07385079B2
公开(公告)日：2008-06-10
申请号：US10995335
申请日：2004-11-24
申请人： Takeo Komata , Shinya Akiba , Satoru Miyazawa , Takahisa Tada , Yusuke Kuramoto , Seiji Murata
发明人： Takeo Komata , Shinya Akiba , Satoru Miyazawa , Takahisa Tada , Yusuke Kuramoto , Seiji Murata
IPC分类号： C07C69/52
CPC分类号： C07C67/08 , C07C2602/42 , C07C69/533 , C07C69/54
摘要： A process for producing an α-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an α-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein R1 represents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R2, R3 and R4 is a CF3C(CF3)(OH)CH2— group, and each of the other two of R2, R3 and R4 is a hydrogen.
摘要翻译： 由式[3]表示的α-取代的丙烯酸降冰片烷基化合物的制备方法包括使由式[1]表示的α-取代的丙烯酸酐与由式[2]表示的取代的降冰片烷基酯反应。 其中R 1表示氢原子，甲基，乙基，正丙基，异丙基，正丁基，仲丁基，叔丁基，氟甲基，二氟甲基， 三氟甲基或全氟乙基，其中R 2，R 3和R 4之一是CF 3 N C（CF 3）（OH）CH 2 - 基团，R 2，R 3，R 3， R 4和R 4是氢。
-
6.发明申请公开(公告)号：US20050131248A1
公开(公告)日：2005-06-16
申请号：US10995335
申请日：2004-11-24
申请人： Takeo Komata , Shinya Akiba , Satoru Miyazawa , Takahisa Tada , Yusuke Kuramoto , Seiji Murata
发明人： Takeo Komata , Shinya Akiba , Satoru Miyazawa , Takahisa Tada , Yusuke Kuramoto , Seiji Murata
CPC分类号： C07C67/08 , C07C2602/42 , C07C69/533 , C07C69/54
摘要： A process for producing an α-substituted acrylic norbornanyl compound represented by the formula [3] includes reacting an α-substituted acrylic acid anhydride represented by the formula [1] with a substituted norbornanyl alcohol represented by the formula [2]. wherein R1 represents a hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, or perfluoroethyl group, and wherein one of R2, R3 and R4 is a CF3C(CF3)(OH)CH2— group, and each of the other two of R2, R3 and R4 is a hydrogen.
摘要翻译： 由式[3]表示的α-取代的丙烯酸降冰片烷基化合物的制备方法包括使由式[1]表示的α-取代的丙烯酸酐与由式[2]表示的取代的降冰片烷基酯反应。 其中R 1表示氢原子，甲基，乙基，正丙基，异丙基，正丁基，仲丁基，叔丁基，氟甲基，二氟甲基， 三氟甲基或全氟乙基，其中R 2，R 3和R 4之一是CF 3 N C（CF 3）（OH）CH 2 - 基团，R 2，R 3，R 3， R 4和R 4是氢。
-
7.发明授权公开(公告)号：US06858760B2
公开(公告)日：2005-02-22
申请号：US10781844
申请日：2004-02-20
IPC分类号： C07C33/44 , C07C35/29 , C07C35/52 , C07C43/196 , C07C69/533 , C07C69/54 , C07C69/653 , C08F32/02 , C08G61/08 , G03F7/004 , G03F7/039 , C07C35/22
CPC分类号： G03F7/0395 , C07C33/44 , C07C35/29 , C07C43/196 , C07C69/653 , C07C2602/42 , G03F7/0046 , G03F7/0397 , Y02P20/55 , Y10S430/108
摘要： A fluorine-containing cyclic compound is represented by the formula 1: wherein each of R1, R2 and R3 independently represents a hydrogen, alkyl group, fluorine, fluoroalkyl group or hexafluorocarbinol group, wherein at least one of the hexafluorocarbinol groups may partly or totally be protected with a protecting group, and wherein the protecting group is (a) a straight-chain, branched or cyclic hydrocarbon group having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group and optionally contains a fluorine atom, oxygen atom, nitrogen atom or carbonyl bond.
摘要翻译： 含氟环状化合物由式1表示：其中R 1，R 2和R 3各自独立地表示氢，烷基，氟，氟代烷基或六氟甲醇基，其中至少一个六氟甲醇基可部分或全部为 保护基保护，其中保护基为（a）碳原子数为1-25的直链，支链或环状烃基或（b）芳族烃基，并且任选地含有氟原子，氧原子 ，氮原子或羰基键。
-
8.发明授权Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same 有权含氟环状化合物，可聚合的含氟单体，含氟聚合物，包含它们的抗蚀剂材料，以及与其形成图案的方法公开(公告)号：US07781602B2
公开(公告)日：2010-08-24
申请号：US11941433
申请日：2007-11-16
申请人： Haruhiko Komoriya , Shinichi Sumida , Katsunori Kawamura , Satoru Kobayashi , Satoru Miyazawa , Kazuhiko Maeda
发明人： Haruhiko Komoriya , Shinichi Sumida , Katsunori Kawamura , Satoru Kobayashi , Satoru Miyazawa , Kazuhiko Maeda
IPC分类号： C07D313/00 , C08F214/26 , C08F18/20
CPC分类号： G03F7/0397 , C07D307/93 , G03F7/0046 , G03F7/0392
摘要： The present invention relates to a novel fluorine-containing cyclic compound that is derived from a norbornadiene and hexafluoroacetone and has an oxacyclopentane structure. This compound may be represented by the following formula (1) or (2). Furthermore, the present invention relates to a fluorine-containing polymer compound prepared by a polymerization or copolymerization using this fluorine-containing cyclic compound or its derivative. By using such fluorine-containing polymer compound, it is possible to provide a superior resist material and a fine pattern forming process using the same.
摘要翻译： 本发明涉及一种衍生自降冰片二烯和六氟丙酮并具有氧环戊烷结构的新型含氟环状化合物。 该化合物可以由下式（1）或（2）表示。 此外，本发明涉及通过使用该含氟环状化合物或其衍生物的聚合或共聚制备的含氟聚合物。 通过使用这样的含氟聚合物化合物，可以提供优异的抗蚀剂材料和使用其的精细图案形成方法。
-
公开(公告)号：US07569323B2
公开(公告)日：2009-08-04
申请号：US11492957
申请日：2006-07-26
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
IPC分类号： G03F7/30
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有环状全氟烷基的α-三氟甲基丙烯酸/降冰片烯共聚物作为侧基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有效地实施浸渍光刻。
-
公开(公告)号：US07005228B2
公开(公告)日：2006-02-28
申请号：US10178638
申请日：2002-06-25
申请人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
发明人： Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A ternary copolymer comprising units of α-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of α-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
摘要翻译： 包含其上取代有酸不稳定基团的α-三氟甲基丙烯酸羧酸酯单元的三元共聚物，其上取代有粘合剂基团的α-三氟甲基丙烯酸羧酸酯单元和具有六氟醇垂饰的苯乙烯单元对VUV辐射是高度透明的并且耐等离子体蚀刻。 使用聚合物作为基础树脂的抗蚀剂组合物对于低于200nm的高能辐射敏感，具有优异的灵敏度，并且适用于光刻微处理。
-
-
-
-
-
-
-
-
-
搜索结果
37 条记录 (耗时 0.027 秒)
