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1.发明授权公开(公告)号：US08536550B2
公开(公告)日：2013-09-17
申请号：US12478083
申请日：2009-06-04
申请人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
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公开(公告)号：US20090224181A1
公开(公告)日：2009-09-10
申请号：US12382108
申请日：2009-03-09
申请人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G01J3/10
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus in which debris staying and accumulating within a chamber can be prevented from contaminating the chamber and deteriorating the performance of important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译： 可以防止残留在室内积聚的碎片的极紫外光源装置污染室，劣化重要的光学部件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。
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公开(公告)号：US20120228527A1
公开(公告)日：2012-09-13
申请号：US13477940
申请日：2012-05-22
申请人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G21K5/02
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。
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公开(公告)号：US08212228B2
公开(公告)日：2012-07-03
申请号：US12382108
申请日：2009-03-09
申请人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。
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5.发明申请公开(公告)号：US20090301517A1
公开(公告)日：2009-12-10
申请号：US12478083
申请日：2009-06-04
申请人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
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公开(公告)号：US08481983B2
公开(公告)日：2013-07-09
申请号：US12385245
申请日：2009-04-02
申请人： Masato Moriya , Hiroshi Komori , Takeshi Asayama
发明人： Masato Moriya , Hiroshi Komori , Takeshi Asayama
IPC分类号： G21K5/04
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.
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公开(公告)号：US20090250641A1
公开(公告)日：2009-10-08
申请号：US12385245
申请日：2009-04-02
申请人： Masato Moriya , Hiroshi Komori , Takeshi Asayama
发明人： Masato Moriya , Hiroshi Komori , Takeshi Asayama
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.
摘要翻译： 能够防止在室内移动的碎屑减少EUV收集镜等的光学元件的反射率或透射率的极端紫外线光源装置，能够长时间稳定地产生极紫外光。 该装置包括：目标供给单元，用于将目标供给到室内的预定位置; 用于将激光束施加到所述靶以产生第一等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集从第一等离子体辐射的极紫外光; 气体供应单元，用于将气体供应到所述室中; 用于激发气体以在产生第一等离子体的区域周围产生第二等离子体的激励单元; 以及排气单元，用于排出室并将从第一等离子体发射的碎屑喷射到室外。
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公开(公告)号：US08586954B2
公开(公告)日：2013-11-19
申请号：US13419177
申请日：2012-03-13
申请人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
发明人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
摘要翻译： 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。
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公开(公告)号：US08610095B2
公开(公告)日：2013-12-17
申请号：US12695630
申请日：2010-01-28
摘要： An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material.A target generating unit 120 injects molten tin in a droplet shape as a target 201 into a chamber 101. A protective coating provided with an erosion resistance property to tin is configured on a section that comes into contact with tin in a molten state for each face of a nozzle part 121 and a tank part 122. Alternatively, a part that comes into contact with tin in a molten state is made of a material provided with an erosion resistance property and a heat resistance property.
摘要翻译： 根据本发明的极紫外光源装置抑制与熔融状态的目标材料接触的表面被目标材料侵蚀，与目标材料反应并被目标材料切割。 目标产生单元120将作为目标201的液滴形状的熔融锡注入到室101中。对于每个面，在与熔融状态的锡接触的部分上配置具有对锡的耐侵蚀性的保护涂层 喷嘴部分121和罐部分122.或者，与熔融状态的锡接触的部分由具有耐腐蚀性和耐热性的材料制成。
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公开(公告)号：US08158959B2
公开(公告)日：2012-04-17
申请号：US12705287
申请日：2010-02-12
申请人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
发明人： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
摘要翻译： 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。
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