公开(公告)号：US20090224181A1

公开(公告)日：2009-09-10

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G01J3/10

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus in which debris staying and accumulating within a chamber can be prevented from contaminating the chamber and deteriorating the performance of important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 可以防止残留在室内积聚的碎片的极紫外光源装置污染室，劣化重要的光学部件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US20120228527A1

公开(公告)日：2012-09-13

申请号：US13477940

申请日：2012-05-22

申请人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G21K5/02

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US08212228B2

公开(公告)日：2012-07-03

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US08536550B2

公开(公告)日：2013-09-17

申请号：US12478083

申请日：2009-06-04

申请人： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

发明人： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

IPC分类号： B08B7/00

CPC分类号： B08B7/00 ,  B08B7/0035 ,  B08B13/00

摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。

公开(公告)号：US20090301517A1

公开(公告)日：2009-12-10

申请号：US12478083

申请日：2009-06-04

申请人： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

发明人： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

IPC分类号： B08B7/00

CPC分类号： B08B7/00 ,  B08B7/0035 ,  B08B13/00

摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。

公开(公告)号：US08507883B2

公开(公告)日：2013-08-13

申请号：US12559977

申请日：2009-09-15

申请人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20100090132A1

公开(公告)日：2010-04-15

申请号：US12559977

申请日：2009-09-15

申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US08395133B2

公开(公告)日：2013-03-12

申请号：US12560864

申请日：2009-09-16

申请人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20100078577A1

公开(公告)日：2010-04-01

申请号：US12560864

申请日：2009-09-16

申请人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00 ,  H01S3/10

CPC分类号： H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20120119118A1

公开(公告)日：2012-05-17

申请号：US13359315

申请日：2012-01-26

申请人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

发明人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

IPC分类号： G21K5/00

CPC分类号： G03F7/70975 ,  G03F7/70033

摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.

摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。 该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光 具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。