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    Novel 2-substituted-4,6-diamino-s-triazine/isocyanuric acid adduct, process for synthesis of said adduct and process for curing polyepoxy resin with said adduct
    2.
    发明授权
    Novel 2-substituted-4,6-diamino-s-triazine/isocyanuric acid adduct, process for synthesis of said adduct and process for curing polyepoxy resin with said adduct 失效
    新的2-取代-4,6-二氨基-s-三嗪/异氰脲酸加合物，合成所述加合物的方法和用所述加合物固化聚环氧树脂的方法

    公开(公告)号：US4658009A

    公开(公告)日：1987-04-14

    申请号：US839189

    申请日：1986-03-13

    申请人： Kazuo Kamagata ,  Toshiaki Yamada ,  Natsuo Sawa

    发明人： Kazuo Kamagata ,  Toshiaki Yamada ,  Natsuo Sawa

    IPC分类号： C07D251/18 ,  C07D251/32 ,  C07D401/12 ,  C07D403/12 ,  C08G59/00 ,  C08G59/40 ,  C08G59/50 ,  C08G59/56 ,  C07D403/00

    CPC分类号： C07D401/12 ,  C07D251/18 ,  C07D251/32 ,  C07D403/12 ,  C08G59/5086 ,  C08G59/56

    摘要： Disclosed is a 2-substituted-4,6-diamino-s-triazine/isocyanuric acid adduct represented by the following formula: ##STR1## wherein R stands for an alkyl group having 2 to 20 carbon atoms, an unsubstituted or cyano group-substituted aryl group, or a group of the formula R.sup.1 --CH.sub.2 CH.sub.2 -- in which R.sup.1 stands for an alkoxy group having up to 20 carbon atoms, an acyloxy group, an amino group, an N-substituted amino group, a benzotriazolyl group or a 2-alkylimidazolyl-(4)-dithiocarbonyl group, or by the following formula: ##STR2## wherein R.sup.2 stands for an alkylene group which may have an intervening imino or phenylene group.When this adduct is used for curing a polyepoxy resin, a cured product having good heat resistance, insulating property and adhesion and an excellent migration-preventing effect is formed.

    摘要翻译： 公开了由下式表示的2-取代-4,6-二氨基-s-三嗪/异氰脲酸加合物：其中R代表具有2-20个碳原子的烷基，未取代或氰基 基团取代的芳基或式R1-CH2CH2-基团，其中R1代表具有至多20个碳原子的烷氧基，酰氧基，氨基，N-取代氨基，苯并三唑基或 2-烷基咪唑基 - （4） - 二硫代羰基，或通过下式：其中R 2表示可以具有中间亚氨基或亚苯基的亚烷基。 当该加合物用于固化聚环氧树脂时，形成具有良好的耐热性，绝缘性和粘附性以及良好的防迁移效果的固化产物。

    Process for synthesis of 2-vinyl-4,6-diamino-S-triazine
    7.
    发明授权
    Process for synthesis of 2-vinyl-4,6-diamino-S-triazine 失效
    合成2-乙烯基-4,6-二氨基-S-三嗪的方法

    公开(公告)号：US4579946A

    公开(公告)日：1986-04-01

    申请号：US690248

    申请日：1985-01-10

    申请人： Natsuo Sawa ,  Takeshi Masuda

    发明人： Natsuo Sawa ,  Takeshi Masuda

    IPC分类号： C07D251/18

    CPC分类号： C07D251/18

    摘要： Disclosed is a process for the synthesis of 2-vinyl-4,6-diamino-S-triazine having the following structural formula: ##STR1## which comprises heating an imidazolyl-S-triazine compound represented by the following general formula: ##STR2## wherein R.sub.1 stands for a hydrogen atom, a methyl group or an ethyl group, and R.sub.2 stands for a hydrogen atom or a methyl group, or an isocyanuric acid-addition product thereof under reduced pressure in the presence of a polymerization inhibitor.According to this process, 2-vinyl-4,6-diamino-S-triazine can be manufactured at a low cost on an industrial scale.

    摘要翻译： 公开了一种合成具有以下结构式的2-乙烯基-4,6-二氨基-S-三嗪的方法：包括加热由以下通式表示的咪唑基-S-三嗪化合物： 其中R1表示氢原子，甲基或乙基，R2表示氢原子或甲基，或者在阻聚剂存在下，在减压下代表异氰脲酸加成产物。 根据该方法，2-乙烯基-4,6-二氨基-S-三嗪可以以工业规模低成本制造。

    Imidazole-isocyanuric acid adducts
    8.
    发明授权
    Imidazole-isocyanuric acid adducts 失效
    咪唑 - 异氰脲酸加合物

    公开(公告)号：US4189577A

    公开(公告)日：1980-02-19

    申请号：US885948

    申请日：1978-03-13

    申请人： Natsuo Sawa ,  Tadao Nomoto ,  Keiko Iuchi ,  Toshihiro Suzuki ,  Shunichi Kawata

    发明人： Natsuo Sawa ,  Tadao Nomoto ,  Keiko Iuchi ,  Toshihiro Suzuki ,  Shunichi Kawata

    IPC分类号： C07D233/54 ,  C07D233/58 ,  C07D233/61 ,  C07D251/32 ,  C07D403/06 ,  C07D521/00 ,  C08G59/00 ,  C08G59/40 ,  C08G59/50 ,  C08G59/68 ,  C08K5/00 ,  C08K5/34 ,  C08K5/3467 ,  C07D251/30

    CPC分类号： C07D233/56 ,  C07D231/12 ,  C07D233/64 ,  C07D249/08 ,  C07D251/32 ,  C08G59/5086 ,  C08G59/686

    摘要： An imidazole-isocyanuric acid adduct having the following formula is disclosed: ##STR1## wherein R.sub.1 is a member selected from the group consisting of a hydrogen atom, a .beta.-cyanoethyl group and a .beta.-[3,5-diamino-s-triazinyl-(1)]-ethyl group, R.sub.2 stands for a monovalent hydrocarbon group having up to 17 carbon atoms, R.sub.3 is a member selected from the group consisting of a hydrogen atom and an alkyl group having up to 4 carbon atoms, with the proviso that when R.sub.1 is a hydrogen atom, R.sub.2 is a methyl or phenyl group and R.sub.3 is a hydrogen atom and when R.sub.1 is a .beta.-cyanoethyl group, R.sub.2 is a phenyl group and R.sub.3 is a hydrogen atom, and n is a number of from 0 to 2.This adduct has peculiar characteristics not possessed by ordinary salts. Namely, the adduct is stable in water, and it decomposes in a solvent or under heating. The adduct is valuable as a curing agent for epoxy resins, and it can be utilized for purification of imidazoles.

    摘要翻译： 公开了具有下式的咪唑 - 异氰脲酸加合物：其中R 1是选自氢原子，β-氰基乙基和β-[3,5-二氨基-s-三嗪基 - （1）] - 乙基，R 2表示具有至多17个碳原子的一价烃基，R 3是选自氢原子和具有至多4个碳原子的烷基的成员，条件是 当R1是氢原子时，R2是甲基或苯基，R3是氢原子，当R1是β-氰基乙基时，R2是苯基，R3是氢原子，n是从 该加合物具有普通盐不具有的特有特征。 即，加合物在水中稳定，在溶剂中或加热下分解。 加合物作为环氧树脂的固化剂是有价值的，可用于咪唑的纯化。

    2-Tolyl-4,5-dihydroxymethyl imidazole
    9.
    发明授权
    2-Tolyl-4,5-dihydroxymethyl imidazole 失效
    2-甲苯基-4,5-二羟甲基咪唑

    公开(公告)号：US4122277A

    公开(公告)日：1978-10-24

    申请号：US802972

    申请日：1977-06-02

    申请人： Natsuo Sawa ,  Kyoko Gohda

    发明人： Natsuo Sawa ,  Kyoko Gohda

    IPC分类号： C07D233/54 ,  C07D233/64

    CPC分类号： C07D233/64

    摘要： A process for producing C-methylol imidazoles which comprises reacting imidazole compounds containing an aryl group at the 2-position with formaldehyde in a reaction medium having a pH of at least 7 whereby the formaldehyde adds to the carbon atom of the imidazole ring. The products are either monomethylol imidazoles or dimethlol imidazoles depending upon the starting imidazole compounds. Most of the C-methylol imidazoles thus obtained are new compounds.

    摘要翻译： 一种制备C-羟甲基咪唑的方法，其包括在2-位含有芳基的咪唑化合物与甲醛在pH至少为7的反应介质中反应，由此甲醛加入到咪唑环的碳原子上。 取决于起始咪唑化合物，产物是单羟甲基咪唑或二甲基咪唑。 由此获得的大多数C-羟甲基咪唑是新的化合物。

    Method of rust-preventing for copper and copper alloy
    10.
    发明授权
    Method of rust-preventing for copper and copper alloy 失效
    铜和铜合金防锈方法

    公开(公告)号：US3933531A

    公开(公告)日：1976-01-20

    申请号：US482165

    申请日：1974-06-24

    申请人： Natsuo Sawa ,  Masahiro Hoda

    发明人： Natsuo Sawa ,  Masahiro Hoda

    IPC分类号： C23F11/14 ,  C23F11/00

    CPC分类号： C23F11/149 ,  Y10T428/31678

    摘要： Copper and copper alloys are prevented from rust by surface-treating the copper and copper alloys with at least one compound selected from the class consisting of alkylimidazoles represented by the following formula: ##SPC1##Wherein R is a long straight chain alkyl group of 5-21 carbon atoms and R' is hydrogen atom or a lower alkyl group, and their acid addition salts. The compound is used as it is, or in a solution, by dipping, spraying, coating or directly contacting with copper or copper alloy. The surface -treated copper and copper alloy can well withstand tarnishing in an atmosphere containing sulfur compound gas.

    摘要翻译： 通过用至少一种选自下式表示的烷基咪唑的化合物对铜和铜合金进行表面处理来防止铜和铜合金生锈：