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公开(公告)号：US20060244143A1
公开(公告)日：2006-11-02
申请号：US11351635
申请日：2006-02-10
申请人： Tania Bhatia , Neil Baldwin , John Holowczak
发明人： Tania Bhatia , Neil Baldwin , John Holowczak
IPC分类号： H01L23/48
CPC分类号： C04B41/52 , C04B41/009 , C04B41/89 , C25D5/54 , C25D13/02 , C04B41/4531 , C04B41/5025 , C04B41/4517 , C04B41/4523 , C04B41/5096 , C04B41/0072 , C04B41/4564 , C04B41/51 , C04B41/522 , C04B41/5024 , C04B41/5027 , C04B35/565 , C04B35/584 , C04B35/597
摘要： The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sightprocess, particularly, electrophoretic deposition (EPD) process.
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公开(公告)号：US20060029733A1
公开(公告)日：2006-02-09
申请号：US10914925
申请日：2004-08-09
申请人： Tania Bhatia , Neil Baldwin , Robert Barth , Xia Tang , John Holowczak
发明人： Tania Bhatia , Neil Baldwin , Robert Barth , Xia Tang , John Holowczak
CPC分类号： C23C26/00 , C04B41/009 , C04B41/52 , C04B41/89 , C23C24/00 , C23C24/08 , C25D13/22 , F01D5/288 , F05D2230/30 , F05D2230/90 , F05D2300/222 , F05D2300/611 , C04B41/4529 , C04B41/5096 , C04B41/51 , C04B41/522 , C04B41/0072 , C04B41/4517 , C04B41/4564 , C04B41/5024 , C04B41/4568 , C04B41/5027 , C04B41/4531 , C04B35/565 , C04B35/584
摘要： Non-line-of-sight process for coating complexed shaped structures of Si-based substrates with protective barrier layers.
摘要翻译： 用于涂覆具有保护性阻挡层的Si基衬底的复合形状结构的非视距工艺。
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公开(公告)号：US20060027923A1
公开(公告)日：2006-02-09
申请号：US10914905
申请日：2004-08-09
申请人： Tania Bhatia , Neil Baldwin , John Holowczak
发明人： Tania Bhatia , Neil Baldwin , John Holowczak
IPC分类号： H01L23/48
CPC分类号： C04B41/52 , C04B41/009 , C04B41/89 , C25D5/54 , C25D13/02 , C04B41/4531 , C04B41/5025 , C04B41/4517 , C04B41/4523 , C04B41/5096 , C04B41/0072 , C04B41/4564 , C04B41/51 , C04B41/522 , C04B41/5024 , C04B41/5027 , C04B35/565 , C04B35/584 , C04B35/597
摘要： The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sight process, particularly, electrophoretic deposition (EPD) process.
摘要翻译： 本发明涉及用于在经受高温，水性环境的制品和结构中复杂形状的基于硅的基底上的保护涂层的方法，包括非视线工艺，特别是电泳沉积（ EPD）过程。
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公开(公告)号：US07422671B2
公开(公告)日：2008-09-09
申请号：US10914925
申请日：2004-08-09
申请人： Tania Bhatia , Neil Baldwin , Robert A. Barth , Xia Tang , John E. Holowczak
发明人： Tania Bhatia , Neil Baldwin , Robert A. Barth , Xia Tang , John E. Holowczak
IPC分类号： C25D13/02
CPC分类号： C23C26/00 , C04B41/009 , C04B41/52 , C04B41/89 , C23C24/00 , C23C24/08 , C25D13/22 , F01D5/288 , F05D2230/30 , F05D2230/90 , F05D2300/222 , F05D2300/611 , C04B41/4529 , C04B41/5096 , C04B41/51 , C04B41/522 , C04B41/0072 , C04B41/4517 , C04B41/4564 , C04B41/5024 , C04B41/4568 , C04B41/5027 , C04B41/4531 , C04B35/565 , C04B35/584
摘要： Non-line-of-sight process for coating complexed shaped structures of Si-based substrates with protective barrier layers.
摘要翻译： 用于涂覆具有保护性阻挡层的Si基衬底的复合形状结构的非视距工艺。
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公开(公告)号：US07538045B2
公开(公告)日：2009-05-26
申请号：US11351635
申请日：2006-02-10
申请人： Tania Bhatia , Neil Baldwin , John E. Holowczak
发明人： Tania Bhatia , Neil Baldwin , John E. Holowczak
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： C04B41/52 , C04B41/009 , C04B41/89 , C25D5/54 , C25D13/02 , C04B41/4531 , C04B41/5025 , C04B41/4517 , C04B41/4523 , C04B41/5096 , C04B41/0072 , C04B41/4564 , C04B41/51 , C04B41/522 , C04B41/5024 , C04B41/5027 , C04B35/565 , C04B35/584 , C04B35/597
摘要： The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sightprocess, particularly, electrophoretic deposition (EPD) process.
摘要翻译： 本发明涉及用于在经受高温水溶液环境的制品和结构中复杂形状的基于硅的基底上的保护涂层的沉积方法，包括非视线工艺，特别是电泳沉积（EPD ）过程。
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公开(公告)号：US20050003212A1
公开(公告)日：2005-01-06
申请号：US10444008
申请日：2003-05-22
申请人： Ellen Sun , Gary Linsey , John Holowczak , Neil Baldwin , Harry Eaton
发明人： Ellen Sun , Gary Linsey , John Holowczak , Neil Baldwin , Harry Eaton
CPC分类号： C04B41/009 , C04B41/52 , C04B41/89 , C23C28/042 , C23C28/30 , C23C28/324 , C23C28/34 , C23C28/341 , C23C28/345 , C23C28/3455 , F01D5/288 , C04B41/5071 , C04B41/5096 , C04B41/4596 , C04B41/522 , C04B41/5027 , C04B41/5024 , C04B35/565 , C04B35/584 , C04B35/806 , C04B35/597
摘要： An article comprises a silicon based substrate, a bond layer and a protective top layer. The top layer is selected from the group consisting of rare earth disilicates, yttrium disilicates, rare earth monosilicates, yttrium monosilicates, silica and mixtures thereof. The protective layer described above is used in combination with a bond layer provided between the protective layer and the silicon based substrate which functions as oxygen getter and includes an oxygen gettering agent. By oxygen gettering agent is meant a refractory metal oxide former which forms an oxide at operational condition of (high temperature and aqueous environment) having a melting point of greater than 1500° C. wherein the negative free energy of formation of the refractory metal oxide from the refractory metal is more than 100 Kcal/mole. Suitable oxygen gettering agents include silicon and other refractory metals. An oxygen gettering agent may also be added to the protective layer.
摘要翻译： 一种制品包括硅基衬底，接合层和保护顶层。 顶层选自二氯硅酸稀土，二硅酸钇，一硅酸稀土，一硅酸钇，二氧化硅及其混合物。 上述保护层与设置在保护层和作为氧气吸气剂的硅基底物之间的接合层组合使用，并且包括吸氧剂。 氧吸气剂是指在熔点大于1500℃的（高温和水性环境）的操作条件下形成氧化物的难熔金属氧化物，其中难熔金属氧化物的负自由能由 难熔金属超过100千卡/摩尔。 合适的吸氧剂包括硅和其它难熔金属。 还可以将氧吸气剂加入到保护层中。
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