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公开(公告)号:US20140125198A1
公开(公告)日:2014-05-08
申请号:US13670735
申请日:2012-11-07
IPC分类号: H01L41/02
CPC分类号: H01L27/20 , H01L41/29 , H03H9/0542 , H03H9/175
摘要: A semiconductor device comprises a semiconductor wafer; a piezoelectric resonator formed on the wafer, and an active circuit also formed on the wafer. The active circuit (e.g., a frequency divider) is electrically connected to the piezoelectric resonator.
摘要翻译: 半导体器件包括半导体晶片; 形成在晶片上的压电谐振器和还形成在晶片上的有源电路。 有源电路(例如,分频器)电连接到压电谐振器。
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公开(公告)号:US20190386627A1
公开(公告)日:2019-12-19
申请号:US16551757
申请日:2019-08-27
摘要: A method of forming a resonator includes forming top and bottom dielectric structures over a substrate. A piezoelectric layer is formed between the top and bottom dielectric structures. A bottom electrode is formed between the piezoelectric layer and the bottom dielectric structure, and a top electrode is formed between the piezoelectric layer and the top dielectric structure. A metal layer is formed over the top dielectric structure and is patterned, thereby forming a first contact pad making electrical contact to the top electrode, a second contact pad making electrical contact with the bottom electrode, and a mass bias located over the top dielectric structure.
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公开(公告)号:US20150340405A1
公开(公告)日:2015-11-26
申请号:US14816266
申请日:2015-08-03
CPC分类号: H01L27/20 , H01L41/29 , H03H9/0542 , H03H9/175
摘要: A semiconductor device comprises a semiconductor wafer; a piezoelectric resonator formed on the wafer, and an active circuit also formed on the wafer. The active circuit (e.g., a frequency divider) is electrically connected to the piezoelectric resonator.
摘要翻译: 半导体器件包括半导体晶片; 形成在晶片上的压电谐振器和还形成在晶片上的有源电路。 有源电路(例如,分频器)电连接到压电谐振器。
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公开(公告)号:US20160105156A1
公开(公告)日:2016-04-14
申请号:US14970676
申请日:2015-12-16
IPC分类号: H03H3/02
CPC分类号: H03H3/02 , H01L23/3107 , H01L23/3171 , H01L23/49838 , H03H9/02102 , H03H9/02149 , H03H9/1007 , H03H9/1057 , H03H9/175 , Y10T29/42 , Y10T29/49171 , Y10T29/49172
摘要: An integrated resonator apparatus includes a piezoelectric resonator and an acoustic Bragg reflector formed adjacent the piezoelectric resonator. The integrated resonator apparatus also includes a mass bias formed over the Bragg reflector on a side of the piezoelectric resonator opposite the piezoelectric resonator.
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