公开(公告)号：US06504233B1

公开(公告)日：2003-01-07

申请号：US09340794

申请日：1999-06-28

申请人： Thomas Bert Gorczyca ,  Margaret Ellen Lazzeri ,  Frederic Francis Ahlgren

发明人： Thomas Bert Gorczyca ,  Margaret Ellen Lazzeri ,  Frederic Francis Ahlgren

IPC分类号： H01L2358

CPC分类号： H01L21/76232 ,  H01L21/306

摘要： A semiconductor processing component includes a quartz body characterized by silicon oxide filled micro cracks. The component is utilized as a processing component in a semiconductor furnace system. The quartz body is prepared by cleaning the component to remove a build up silicon layer and to expose micro cracks in the surface of the component and to etch the micro cracks into trenches. A silicon layer is applied onto the processing component body and at least a portion of the silicon is oxidized to silica to fill the trenches in the surface of the component body.

公开(公告)号：US06709608B2

公开(公告)日：2004-03-23

申请号：US10199273

申请日：2002-07-22

申请人： Thomas Bert Gorczyca ,  Margaret Ellen Lazzeri ,  Frederic Francis Ahlgren

发明人： Thomas Bert Gorczyca ,  Margaret Ellen Lazzeri ,  Frederic Francis Ahlgren

IPC分类号： C03C1500

CPC分类号： H01L21/76232 ,  H01L21/306

摘要： A semiconductor processing component includes a quartz body characterized by silicon oxide filled micro cracks. The component is utilized as a processing component in a semiconductor furnace system. The quartz body is prepared by cleaning the component to remove a build up silicon layer and to expose micro cracks in the surface of the component and to etch the micro cracks into trenches. A silicon layer is applied onto the processing component body and at least a portion of the silicon is oxidized to silica to fill the trenches in the surface of the component body.

摘要翻译： 半导体处理部件包括以氧化硅填充的微裂纹为特征的石英体。 该部件用作半导体炉系统中的处理部件。 通过清洁组件以除去积聚硅层并暴露组件表面中的微裂纹并将微裂纹蚀刻成沟槽来制备石英体。 将硅层施加到处理部件主体上，并且硅的至少一部分被氧化成二氧化硅以填充部件主体的表面中的沟槽。

公开(公告)号：US07846405B2

公开(公告)日：2010-12-07

申请号：US10851867

申请日：2004-05-21

申请人： William Steven Lanier ,  Frederic Francis Ahlgren ,  Theodore Paul Kircher

发明人： William Steven Lanier ,  Frederic Francis Ahlgren ,  Theodore Paul Kircher

IPC分类号： B01D53/56 ,  C01B21/20

CPC分类号： B01D53/8625 ,  B01D53/8696 ,  B01D2251/2062 ,  B01D2257/404 ,  F01N3/206 ,  F01N9/00 ,  F01N11/00 ,  Y10T436/12

摘要： A method for monitoring and/or controlling performance of a selective catalytic reduction (SCR) emission control system includes injecting a quantity of a pollution neutralizing gas into a combustion gas stream containing a pollutant gas. The method also includes passing the stream over a catalyst bed to facilitate a reaction of the pollution neutralizing gas with the pollutant gas to produce an effluent and measuring a ratio of the pollution neutralizing gas to the pollutant gas in the effluent.

摘要翻译： 用于监测和/或控制选择性催化还原（SCR）排放控制系统的性能的方法包括将一定数量的污染中和气体注入含有污染气体的燃烧气体流中。 该方法还包括使流过催化剂床，以促进污染中和气体与污染气体的反应，以产生污水并测量污染中和气体与污水中污染气体的比例。

公开(公告)号：US06875515B2

公开(公告)日：2005-04-05

申请号：US10063754

申请日：2002-05-10

申请人： Thomas Francis McNulty ,  David Charles Pender ,  Victor Lien-Kong Lou ,  Robert Arthur Giddings ,  Frederic Francis Ahlgren

发明人： Thomas Francis McNulty ,  David Charles Pender ,  Victor Lien-Kong Lou ,  Robert Arthur Giddings ,  Frederic Francis Ahlgren

IPC分类号： C03C17/04 ,  C03B32/02 ,  C03C10/00 ,  C03C10/14 ,  C03C17/23 ,  C30B35/00 ,  B32B9/00 ,  C09D1/00

CPC分类号： C30B35/002 ,  C03B32/02 ,  C03C10/0009 ,  C03C17/23 ,  C03C2217/213 ,  C03C2217/24

摘要： A fused quartz article, such as a muffle tube or crucible, with enhanced creep resistance. The enhanced creep resistance is the result of controlled devitrification of the fused quartz article. Controlled devitrification is achieved by coating the article with a colloidal silica slurry doped with metal cations, such as barium, strontium, and calcium. The metal cations in the slurry promote nucleation and growth of cristobalite crystals into the fused quartz at temperatures in the range from about 1000° C. to about 1600° C. The cristobalite has significantly higher viscosity, and therefore greater creep resistance at elevated temperatures, than fused quartz. Methods for applying a doped coating to a fused quartz article and improving the creep resistance of a fused quartz article are also disclosed.

摘要翻译： 熔融石英制品，如马弗管或坩埚，具有增强的抗蠕变性。 增强的抗蠕变性是熔融石英制品的控制失透的结果。 通过用掺杂有金属阳离子如钡，锶和钙的胶体二氧化硅浆料涂覆制品来实现控制失透。 浆料中的金属阳离子在约1000℃至约1600℃的温度范围促进方英石晶体的成核和生长成熔融石英。方英石具有显着较高的粘度，因此在升高的温度下具有较高的抗蠕变性， 比熔融石英。 还公开了将掺杂涂层施加到熔融石英制品并提高熔融石英制品的抗蠕变性的方法。

公开(公告)号：US06739155B1

公开(公告)日：2004-05-25

申请号：US09636286

申请日：2000-08-10

申请人： Robert Arthur Giddings ,  Frederic Francis Ahlgren

发明人： Robert Arthur Giddings ,  Frederic Francis Ahlgren

IPC分类号： C03B3702

CPC分类号： C03B5/1675 ,  C03B3/00 ,  C03B5/021 ,  C03B5/12 ,  C03B5/425 ,  C03B17/04 ,  Y02P40/57

摘要： A crucible for melting a silica for fusion of said silica into a desired shape. The crucible having a main body with inner and outer surfaces comprised of a refractory material. In addition, at least a portion of the inner surface includes a barrier layer comprised of a material selected from rhenium, osmium, iridium, and mixtures thereof. An inlet tube to the crucible being provided to supply an oxidizing gas to a melt zone.

摘要翻译： 一种用于熔化二氧化硅以将所述二氧化硅熔融成所需形状的坩埚。 该坩埚具有内表面和外表面由耐火材料构成的主体。 此外，内表面的至少一部分包括由选自铼，锇，铱及其混合物的材料构成的阻挡层。 提供到坩埚的入口管以将氧化气体供应到熔融区。

公开(公告)号：US5900381A

公开(公告)日：1999-05-04

申请号：US918456

申请日：1997-08-26

申请人： Victor Lien Kong Lou ,  Matthew John Curran ,  Frederic Francis Ahlgren ,  Mohan Rajaram

发明人： Victor Lien Kong Lou ,  Matthew John Curran ,  Frederic Francis Ahlgren ,  Mohan Rajaram

IPC分类号： C03B20/00 ,  C01B33/12 ,  C03C14/00 ,  C04B35/14 ,  C03C3/06 ,  C04B35/78

CPC分类号： C03C14/004 ,  C04B35/14

摘要： An opaque silica comprises silica and at least one second phase solid material. The at least one second phase solid material is essentially uniformly dispersed in the silica. A cut surface formed through the silica is free from surface defects since the at least one second phase solid material forms an opaque silica that is free from porosity.

摘要翻译： 不透明的二氧化硅包括二氧化硅和至少一种第二相固体材料。 至少一种第二相固体材料基本均匀地分散在二氧化硅中。 通过二氧化硅形成的切割表面没有表面缺陷，因为至少一个第二相固体材料形成不含孔隙的不透明二氧化硅。