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    Method for Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus
    1.
    发明申请
    Method for Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus 审中-公开
    用于可变数据平版印刷设备的缓冲液的直接应用方法

    公开(公告)号：US20130340638A1

    公开(公告)日：2013-12-26

    申请号：US14015754

    申请日：2013-08-30

    申请人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen ,  Lars-Erik Swartz ,  Jurgen Daniel

    发明人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen ,  Lars-Erik Swartz ,  Jurgen Daniel

    IPC分类号： B41F7/24

    CPC分类号： B41F7/24 ,  B41F7/30 ,  B41F7/32 ,  B41F7/34 ,  B41N3/08 ,  B41P2227/70

    摘要： Methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system without a form roller. Dampening fluid in liquid form is converted to vapor phase, and directed to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. Controlling the temperatures of elements of the delivery subsystem prevents unwanted condensation of the dampening fluid vapor on those elements. Generation and delivery of the vapor can be controlled in a feedback arrangement as a function of measured layer thickness formed on the reimageable surface to obtain a desired dampening fluid layer thickness formed on the reimageable surface.

    摘要翻译： 公开了用于将润版流体施加到可变数据光刻系统中的成像构件的可再成像表面的方法，而无需成形辊。 液体形式的阻尼液转化为气相，并引导到可再成像的表面。 阻尼流体直接在可再成像的表面上回流到液相。 控制输送子系统元件的温度可防止阻尼流体蒸汽在这些元件上的不必要的冷凝。 蒸汽的产生和输送可以以反映布置来控制，作为形成在可再成像表面上的测量层厚度的函数，以获得形成在可再成像表面上的期望的阻尼流体层厚度。

    Method for Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus
    2.
    发明申请
    Method for Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus 审中-公开
    用于可变数据平版印刷设备的缓冲液的直接应用方法

    公开(公告)号：US20130033687A1

    公开(公告)日：2013-02-07

    申请号：US13204526

    申请日：2011-08-05

    申请人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen ,  Lars-Erik Swartz ,  Jurgen Daniel

    发明人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen ,  Lars-Erik Swartz ,  Jurgen Daniel

    IPC分类号： G03B27/52

    CPC分类号： B41F7/24 ,  B41F7/30 ,  B41F7/32 ,  B41F7/34 ,  B41N3/08 ,  B41P2227/70

    摘要： A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.

    摘要翻译： 公开了一种用于将润版流体施加到可变数据光刻系统中的成像构件的可再成像表面的系统和相应方法，而没有成形辊。 在一个实施例中，该系统包括用于将润湿流体从液相转化为分散流体相的子系统，并且用于将包含分散流体相的润版液的分散流体的流动引导到可再成像的表面。 阻尼流体直接在可再成像的表面上回流到液相。 在另一个实施例中，连续的润版液体带可以直接施加到可再成像的表面。 该实施例包括具有端口的主体结构，该端口用于将连续流体带中的阻尼流体直接传送到可再成像的表面，以及与主体结构相关联的机构，用于当可再成像的表面处于可再成像的表面时，将夹带的空气层剥离在可再成像的表面上 运动。

    Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus
    3.
    发明申请
    Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus 审中-公开
    缓冲液直接应用于可变数据平版印刷设备

    公开(公告)号：US20130033686A1

    公开(公告)日：2013-02-07

    申请号：US13204515

    申请日：2011-08-05

    申请人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen ,  Lars-Erik Schwartz ,  Jurgen Daniel

    发明人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen ,  Lars-Erik Schwartz ,  Jurgen Daniel

    IPC分类号： G03B27/52

    CPC分类号： B41F7/30 ,  B41C1/1033 ,  B41F7/32 ,  B41F7/34 ,  B41P2227/70

    摘要： A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.

    摘要翻译： 公开了一种用于将润版流体施加到可变数据光刻系统中的成像构件的可再成像表面的系统和相应方法，而没有成形辊。 在一个实施例中，该系统包括用于将润湿流体从液相转化为分散流体相的子系统，并且用于将包含分散流体相的润版液的分散流体的流动引导到可再成像的表面。 阻尼流体直接在可再成像的表面上回流到液相。 在另一个实施例中，连续的润版液体带可以直接施加到可再成像的表面。 该实施例包括具有端口的主体结构，该端口用于将连续流体带中的阻尼流体直接传送到可再成像的表面，以及与主体结构相关联的机构，用于当可再成像的表面处于可再成像的表面时，将夹带的空气层剥离在可再成像的表面上 运动。

    Variable Data Lithography System
    4.
    发明申请
    Variable Data Lithography System 审中-公开
    可变数据光刻系统

    公开(公告)号：US20120103212A1

    公开(公告)日：2012-05-03

    申请号：US13095714

    申请日：2011-04-27

    申请人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen

    发明人： Timothy Stowe ,  Ashish Pattekar ,  Eric Peeters ,  David Biegelsen

    IPC分类号： B41L25/00

    CPC分类号： B41C1/1041 ,  B41F7/02 ,  B41F7/26 ,  B41F31/002 ,  B41F31/045 ,  B41N1/003 ,  B41N3/08 ,  B41P2227/70

    摘要： A variable data lithography system includes an improved imaging member, a dampening solution subsystem, a patterning subsystem, an inking subsystem, and an image transfer subsystem. The imaging member comprises a reimageable surface layer comprising a polymer, the reimageable surface having a surface roughness Ra in the range of 0.10-4.0 μm peak-to-valley, and peak-to-valley nearest neighbor average distances finer than 20 μm. A structural mounting layer may be provided to which the reimageable surface layer is attached, either directly or with intermediate layers therebetween. The relatively rough surface facilitates retention of dampening solution and improves inking uniformity and transfer. The reimageable surface layer may be comprised of polydimethylsiloxane (silicone), and may optionally have particulate radiation sensitive material disbursed therein to promote absorption, and hence heating, from an optical source.

    摘要翻译： 可变数据光刻系统包括改进的成像构件，阻尼溶液子系统，图案化子系统，着墨子系统和图像传输子系统。 成像构件包括可重复成像的表面层，其包含聚合物，可再成像表面具有峰谷的0.10-4.0μm范围内的表面粗糙度Ra和小于20μm的峰谷最近相邻平均距离。 可以提供结构安装层，可重新成像的表面层直接或间接连接到中间层。 相对粗糙的表面有助于润湿溶液的保留，并改善着墨均匀性和转印。 可再成像的表面层可以由聚二甲基硅氧烷（硅氧烷）组成，并且可以任选地具有分散在其中的颗粒状辐射敏感材料，以促进从光源的吸收并因此加热。

    Cleaning Subsystem for a Variable Data Lithography System
    6.
    发明申请
    Cleaning Subsystem for a Variable Data Lithography System 审中-公开
    用于可变数据光刻系统的清洁子系统

    公开(公告)号：US20120103217A1

    公开(公告)日：2012-05-03

    申请号：US13095737

    申请日：2011-04-27

    申请人： Timothy Stowe ,  Eric Peeters ,  Martin Sheridan ,  Ashish Pattekar ,  Gregory Anderson

    发明人： Timothy Stowe ,  Eric Peeters ,  Martin Sheridan ,  Ashish Pattekar ,  Gregory Anderson

    IPC分类号： B41F35/00

    CPC分类号： B41F35/02 ,  B41C1/1033 ,  B41F7/00 ,  B41F31/002 ,  B41F31/005 ,  B41F31/02 ,  B41N1/003 ,  B41N1/12 ,  B41N1/22 ,  B41N3/006 ,  B41P2227/70 ,  B41P2235/21 ,  B41P2235/22 ,  B41P2235/23 ,  B41P2235/26 ,  B41P2235/50

    摘要： An cleaning subsystem for a variable data lithography system includes a first cleaning member having a conformable adhesive surface disposed for physical contact with an imaging member such that residual ink remaining on the imaging member, such as following transfer of an inked latent image from the imaging member to a substrate, adheres to the conformable adhesive surface and is thereby removed from the imaging member. The cleaning subsystem may further include a second cleaning member, in physical contact with the first cleaning member, having a relatively hard, smooth surface such that residual ink removed from the imaging member and adhering to the adhesive surface of the first cleaning member may split onto the second cleaning member.

    摘要翻译： 用于可变数据光刻系统的清洁子系统包括第一清洁构件，其具有被设置用于与成像构件物理接触的适形粘合剂表面，使得残留在成像构件上的残留墨水，例如从成像构件转移墨水潜像 粘合到基底上，粘附到适形的粘合剂表面上，从而从成像构件上除去。 清洁子系统还可以包括与第一清洁构件物理接触的第二清洁构件，具有相对硬的光滑的表面，使得从成像构件移除并附着到第一清洁构件的粘合表面上的残余墨可分裂成 第二清洁构件。

    Method of Ink Rheology Control in a Variable Data Lithography System
    7.
    发明申请
    Method of Ink Rheology Control in a Variable Data Lithography System 审中-公开
    可变数据光刻系统中油墨流变控制的方法

    公开(公告)号：US20120103218A1

    公开(公告)日：2012-05-03

    申请号：US13095757

    申请日：2011-04-27

    申请人： Timothy Stowe ,  Ashish Pattekar ,  Dave Biegelsen ,  Eric Peeters ,  James Larson

    发明人： Timothy Stowe ,  Ashish Pattekar ,  Dave Biegelsen ,  Eric Peeters ,  James Larson

    IPC分类号： B41F1/18

    CPC分类号： B41M1/06 ,  B41F7/00 ,  B41F31/005 ,  B41N3/08 ,  B41P2227/70

    摘要： Methods for controlling the rheology of ink applied to an imaging surface of a variable data lithography system include applying ink in a layer with a first complex viscoelastic modulus such that said ink layer readily separates in regions over the imaging surface covered by a dampening solution and into regions over the imaging surface at which dampening solution has been removed, increasing the complex viscoelastic modulus of the ink to a second complex viscoelastic modulus while the ink is over the imaging surface, thereby increasing the level of at least one of ink cohesive energy and ink tack prior to the transfer of said ink to said substrate at said image transfer subsystem.

    摘要翻译： 用于控制施加到可变数据光刻系统的成像表面的油墨的流变性的方法包括将油墨施加在具有第一复合粘弹性模量的层中，使得所述油墨层容易地在被润版溶液覆盖的成像表面上的区域中分离并进入 在成像表面上的已经去除了润版液的区域，当油墨在成像表面上方时，将油墨的复合粘弹性模量提高到第二复合粘弹性模量，从而提高油墨粘结能和油墨中的至少一种的水平 在所述图像传送子系统将所述油墨转移到所述基板之前的粘着。

    Ink Rheology Control Subsystem for a Variable Data Lithography System
    8.
    发明申请
    Ink Rheology Control Subsystem for a Variable Data Lithography System 审中-公开
    用于可变数据光刻系统的油墨流变控制子系统

    公开(公告)号：US20120103213A1

    公开(公告)日：2012-05-03

    申请号：US13095745

    申请日：2011-04-27

    申请人： Timothy Stowe ,  Ashish Pattekar ,  Dave Biegelsen ,  Eric Peeters ,  James Larson

    发明人： Timothy Stowe ,  Ashish Pattekar ,  Dave Biegelsen ,  Eric Peeters ,  James Larson

    IPC分类号： B41L25/00

    CPC分类号： B41F7/00 ,  B41C1/1033 ,  B41F31/002 ,  B41F31/005 ,  B41F31/02 ,  B41F35/02 ,  B41N1/003 ,  B41N1/12 ,  B41N1/22 ,  B41N3/006 ,  B41P2235/21 ,  B41P2235/22 ,  B41P2235/23 ,  B41P2235/26 ,  B41P2235/50

    摘要： A subsystem for controlling the rheology of ink applied to an imaging surface of a variable data lithography system comprises an ink reservoir, an ink application subsystem for applying ink from the ink reservoir over the imaging surface at a first ink temperature, and an ink complex viscoelastic modulus control subsystem for modifying the complex viscoelastic modulus of the ink from a first value at the ink reservoir to a second value prior to transfer of the ink from the imaging surface to a substrate. The ink complex viscoelastic modulus control subsystem may comprise a partial curing stage, such as a photo-curing stage. The ink may optionally include photoinitiators to assist with the partial curing. Alternatively, the ink complex viscoelastic modulus control subsystem may consist of an ink pre-heating subsystem and/or a post-application cooling system.

    摘要翻译： 用于控制施加到可变数据光刻系统的成像表面的油墨的流变学的子系统包括墨水储存器，用于在第一墨水温度下从墨水储存器在成像表面上施加墨水的墨水应用子系统和油墨复合物粘弹性 模数控制子系统，用于在将油墨从成像表面转移到基底之前将油墨的复合粘弹性模量从油墨储存器的第一值改变为第二值。 油墨复合物粘弹性模量控制子系统可以包括部分固化阶段，例如光固化阶段。 油墨可以任选地包括光引发剂以辅助部分固化。 或者，油墨复合物粘弹性模量控制子系统可以由油墨预热子系统和/或后应用冷却系统组成。