公开(公告)号：US20220037167A1

公开(公告)日：2022-02-03

申请号：US17443358

申请日：2021-07-26

Applicant: Tokyo Electron Limited

Inventor： Takashi YABUTA ,  Hidetoshi NAKAO ,  Masatoshi KASAHARA ,  Daisuke SAIKI

IPC: H01L21/67 ,  B01F3/04 ,  B01F3/22 ,  H01L21/306

Abstract: A substrate processing apparatus includes: at least one processing part for etching a polysilicon film or an amorphous silicon film formed on a substrate using an alkaline chemical liquid; a reservoir configured to recover and store the chemical liquid used in the at least one processing part; processing lines configured to supply the chemical liquid stored in the reservoir to the at least one processing part; a circulation line configured to take out the chemical liquid from the reservoir and to return the same to the reservoir; and a first gas supply line connected to the circulation line and configured to supply an inert gas to the circulation line. The circulation line includes an ejection port configured to eject a mixed fluid of the inert gas supplied by the first gas supply line and the chemical liquid taken out from the reservoir into the chemical liquid stored in the reservoir.

公开(公告)号：US20240238848A1

公开(公告)日：2024-07-18

申请号：US18410113

申请日：2024-01-11

Applicant: Tokyo Electron Limited

Inventor： Takafumi KINOSHITA ,  Yuki ITO ,  Daisuke SAIKI ,  Tomoyuki HASHIMOTO ,  Yoshifumi AMANO ,  Kazuhiro AIURA ,  Akira FUJITA ,  Shuhei TAKAHASHI

IPC: B08B3/02 ,  H01L21/67

CPC classification number: B08B3/022 ,  H01L21/67051 ,  B08B2203/02

Abstract: A substrate processing apparatus includes a support unit, a supply unit, an annular member, a rotation unit, a cover member, and an annular flow regulation member disposed above the cover member. The annular member includes an inclined surface inclined downward toward a center of the annular member in a radial direction. The flow regulation member includes a base portion and a protrusion which faces a circumferential portion of the substrate supported on the support unit and protrudes from the base portion toward the circumferential portion of the substrate. The protrusion overlaps the support unit when viewed in a vertical direction. A lower surface of the protrusion is positioned above an upper surface of the substrate supported on the support unit and positioned below an upper surface of the annular member. An inner circumferential surface of the protrusion is inclined radially outward from an upper side to a lower side.